Microstructure and mechanical properties of Cr films deposited with different peak powers by high-power impulse magnetron sputtering
For high-power impulse magnetron sputtering (HIPIMS), the peak power applied to the target is of great importance for regulating the ionization degree of the metal target and ion/atom flux ratio. In this work, chromium (Cr) films were deposited on 316-L stainless steel substrates and silicon (100) w...
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| Veröffentlicht in: | Rare metals 2023, Vol.42 (1), p.327-335 |
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| creator | Wang, Yu Wu, Bao-Hua Jiang, Fan Ma, Dong-Lin Yu, Yan Sun, Hong Huang, Nan Leng, Yong-Xiang |
| description | For high-power impulse magnetron sputtering (HIPIMS), the peak power applied to the target is of great importance for regulating the ionization degree of the metal target and ion/atom flux ratio. In this work, chromium (Cr) films were deposited on 316-L stainless steel substrates and silicon (100) wafers with different peak powers by HIPIMS. The relationship between peak target power and properties of Cr films was explored in detail. The resulting structure and mechanical properties of deposited Cr films were characterized by X-ray diffraction (XRD), transmission electron microscope (TEM), atomic force microscopy (AFM), indentation hardness and scratch tester. The results indicate that the ionization degree of metal target and ion/atom flux ratio increase with the increase in peak power but without the loss of deposition rate at the same time. At low ionization degree, the deposited Cr film has low compressive residual stress and low hardness but good adhesion strength. When the ionization degree of target metal increases with increasing peak power, Cr film exhibits finer size and smoother surface with improved hardness but decreased adhesion strength. |
| doi_str_mv | 10.1007/s12598-017-0897-6 |
| format | Article |
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In this work, chromium (Cr) films were deposited on 316-L stainless steel substrates and silicon (100) wafers with different peak powers by HIPIMS. The relationship between peak target power and properties of Cr films was explored in detail. The resulting structure and mechanical properties of deposited Cr films were characterized by X-ray diffraction (XRD), transmission electron microscope (TEM), atomic force microscopy (AFM), indentation hardness and scratch tester. The results indicate that the ionization degree of metal target and ion/atom flux ratio increase with the increase in peak power but without the loss of deposition rate at the same time. At low ionization degree, the deposited Cr film has low compressive residual stress and low hardness but good adhesion strength. When the ionization degree of target metal increases with increasing peak power, Cr film exhibits finer size and smoother surface with improved hardness but decreased adhesion strength.</description><identifier>ISSN: 1001-0521</identifier><identifier>EISSN: 1867-7185</identifier><identifier>DOI: 10.1007/s12598-017-0897-6</identifier><language>eng</language><publisher>Beijing: Nonferrous Metals Society of China</publisher><subject>Adhesive strength ; Biomaterials ; Chemistry and Materials Science ; Chromium ; Compressive properties ; Compressive strength ; Energy ; Hardness ; Indentation ; Ionization ; Magnetron sputtering ; Materials Engineering ; Materials Science ; Mechanical properties ; Metallic Materials ; Nanoscale Science and Technology ; Physical Chemistry ; Residual stress ; Silicon substrates ; Stainless steels</subject><ispartof>Rare metals, 2023, Vol.42 (1), p.327-335</ispartof><rights>The Nonferrous Metals Society of China and Springer-Verlag Berlin Heidelberg 2017</rights><rights>The Nonferrous Metals Society of China and Springer-Verlag Berlin Heidelberg 2017.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c316t-94e85207a0aed703184193b99fe4222440db0a898a9b54f62c8f25eb5d6883443</citedby><cites>FETCH-LOGICAL-c316t-94e85207a0aed703184193b99fe4222440db0a898a9b54f62c8f25eb5d6883443</cites><orcidid>0000-0001-6823-1233</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://link.springer.com/content/pdf/10.1007/s12598-017-0897-6$$EPDF$$P50$$Gspringer$$H</linktopdf><linktohtml>$$Uhttps://link.springer.com/10.1007/s12598-017-0897-6$$EHTML$$P50$$Gspringer$$H</linktohtml><link.rule.ids>314,776,780,27901,27902,41464,42533,51294</link.rule.ids></links><search><creatorcontrib>Wang, Yu</creatorcontrib><creatorcontrib>Wu, Bao-Hua</creatorcontrib><creatorcontrib>Jiang, Fan</creatorcontrib><creatorcontrib>Ma, Dong-Lin</creatorcontrib><creatorcontrib>Yu, Yan</creatorcontrib><creatorcontrib>Sun, Hong</creatorcontrib><creatorcontrib>Huang, Nan</creatorcontrib><creatorcontrib>Leng, Yong-Xiang</creatorcontrib><title>Microstructure and mechanical properties of Cr films deposited with different peak powers by high-power impulse magnetron sputtering</title><title>Rare metals</title><addtitle>Rare Met</addtitle><description>For high-power impulse magnetron sputtering (HIPIMS), the peak power applied to the target is of great importance for regulating the ionization degree of the metal target and ion/atom flux ratio. In this work, chromium (Cr) films were deposited on 316-L stainless steel substrates and silicon (100) wafers with different peak powers by HIPIMS. The relationship between peak target power and properties of Cr films was explored in detail. The resulting structure and mechanical properties of deposited Cr films were characterized by X-ray diffraction (XRD), transmission electron microscope (TEM), atomic force microscopy (AFM), indentation hardness and scratch tester. The results indicate that the ionization degree of metal target and ion/atom flux ratio increase with the increase in peak power but without the loss of deposition rate at the same time. At low ionization degree, the deposited Cr film has low compressive residual stress and low hardness but good adhesion strength. When the ionization degree of target metal increases with increasing peak power, Cr film exhibits finer size and smoother surface with improved hardness but decreased adhesion strength.</description><subject>Adhesive strength</subject><subject>Biomaterials</subject><subject>Chemistry and Materials Science</subject><subject>Chromium</subject><subject>Compressive properties</subject><subject>Compressive strength</subject><subject>Energy</subject><subject>Hardness</subject><subject>Indentation</subject><subject>Ionization</subject><subject>Magnetron sputtering</subject><subject>Materials Engineering</subject><subject>Materials Science</subject><subject>Mechanical properties</subject><subject>Metallic Materials</subject><subject>Nanoscale Science and Technology</subject><subject>Physical Chemistry</subject><subject>Residual stress</subject><subject>Silicon substrates</subject><subject>Stainless steels</subject><issn>1001-0521</issn><issn>1867-7185</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2023</creationdate><recordtype>article</recordtype><recordid>eNp1kEFP5DAMhSu0SLDAD-AWiXMWJ03S5IhG7IIE4gLnKG2dmcC0DUkqxH1_OB0GiRMn2_J7tt5XVecM_jCA5jIzLo2mwBoK2jRUHVTHTKuGNkzLX0sPwChIzo6q3zk_AwihFBxX_-9Dl6Zc0tyVOSFxY08G7DZuDJ3bkpimiKkEzGTyZJWID9shkx7jlEPBnryFsiF98B4TjoVEdC8kTm-YMmnfySasN_RzJGGI8zYjGdx6xJKmkeQ4l4IpjOvT6tC7ZXn2VU-qp7_Xj6sbevfw73Z1dUe7mqlCjUAtOTQOHPYN1EwLZurWGI-Ccy4E9C04bbQzrRRe8U57LrGVvdK6FqI-qS72d5dYrzPmYp-nOY3LS8sbKbVhQtWLiu1VOzA5obcxhcGld8vA7mDbPWy7wLY72FYtHr735LgLhOn78s-mDzi3hF8</recordid><startdate>2023</startdate><enddate>2023</enddate><creator>Wang, Yu</creator><creator>Wu, Bao-Hua</creator><creator>Jiang, Fan</creator><creator>Ma, Dong-Lin</creator><creator>Yu, Yan</creator><creator>Sun, Hong</creator><creator>Huang, Nan</creator><creator>Leng, Yong-Xiang</creator><general>Nonferrous Metals Society of China</general><general>Springer Nature B.V</general><scope>AAYXX</scope><scope>CITATION</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><orcidid>https://orcid.org/0000-0001-6823-1233</orcidid></search><sort><creationdate>2023</creationdate><title>Microstructure and mechanical properties of Cr films deposited with different peak powers by high-power impulse magnetron sputtering</title><author>Wang, Yu ; Wu, Bao-Hua ; Jiang, Fan ; Ma, Dong-Lin ; Yu, Yan ; Sun, Hong ; Huang, Nan ; Leng, Yong-Xiang</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c316t-94e85207a0aed703184193b99fe4222440db0a898a9b54f62c8f25eb5d6883443</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2023</creationdate><topic>Adhesive strength</topic><topic>Biomaterials</topic><topic>Chemistry and Materials Science</topic><topic>Chromium</topic><topic>Compressive properties</topic><topic>Compressive strength</topic><topic>Energy</topic><topic>Hardness</topic><topic>Indentation</topic><topic>Ionization</topic><topic>Magnetron sputtering</topic><topic>Materials Engineering</topic><topic>Materials Science</topic><topic>Mechanical properties</topic><topic>Metallic Materials</topic><topic>Nanoscale Science and Technology</topic><topic>Physical Chemistry</topic><topic>Residual stress</topic><topic>Silicon substrates</topic><topic>Stainless steels</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Wang, Yu</creatorcontrib><creatorcontrib>Wu, Bao-Hua</creatorcontrib><creatorcontrib>Jiang, Fan</creatorcontrib><creatorcontrib>Ma, Dong-Lin</creatorcontrib><creatorcontrib>Yu, Yan</creatorcontrib><creatorcontrib>Sun, Hong</creatorcontrib><creatorcontrib>Huang, Nan</creatorcontrib><creatorcontrib>Leng, Yong-Xiang</creatorcontrib><collection>CrossRef</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Rare metals</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Wang, Yu</au><au>Wu, Bao-Hua</au><au>Jiang, Fan</au><au>Ma, Dong-Lin</au><au>Yu, Yan</au><au>Sun, Hong</au><au>Huang, Nan</au><au>Leng, Yong-Xiang</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Microstructure and mechanical properties of Cr films deposited with different peak powers by high-power impulse magnetron sputtering</atitle><jtitle>Rare metals</jtitle><stitle>Rare Met</stitle><date>2023</date><risdate>2023</risdate><volume>42</volume><issue>1</issue><spage>327</spage><epage>335</epage><pages>327-335</pages><issn>1001-0521</issn><eissn>1867-7185</eissn><abstract>For high-power impulse magnetron sputtering (HIPIMS), the peak power applied to the target is of great importance for regulating the ionization degree of the metal target and ion/atom flux ratio. In this work, chromium (Cr) films were deposited on 316-L stainless steel substrates and silicon (100) wafers with different peak powers by HIPIMS. The relationship between peak target power and properties of Cr films was explored in detail. The resulting structure and mechanical properties of deposited Cr films were characterized by X-ray diffraction (XRD), transmission electron microscope (TEM), atomic force microscopy (AFM), indentation hardness and scratch tester. The results indicate that the ionization degree of metal target and ion/atom flux ratio increase with the increase in peak power but without the loss of deposition rate at the same time. At low ionization degree, the deposited Cr film has low compressive residual stress and low hardness but good adhesion strength. When the ionization degree of target metal increases with increasing peak power, Cr film exhibits finer size and smoother surface with improved hardness but decreased adhesion strength.</abstract><cop>Beijing</cop><pub>Nonferrous Metals Society of China</pub><doi>10.1007/s12598-017-0897-6</doi><tpages>9</tpages><orcidid>https://orcid.org/0000-0001-6823-1233</orcidid></addata></record> |
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| subjects | Adhesive strength Biomaterials Chemistry and Materials Science Chromium Compressive properties Compressive strength Energy Hardness Indentation Ionization Magnetron sputtering Materials Engineering Materials Science Mechanical properties Metallic Materials Nanoscale Science and Technology Physical Chemistry Residual stress Silicon substrates Stainless steels |
| title | Microstructure and mechanical properties of Cr films deposited with different peak powers by high-power impulse magnetron sputtering |
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