Effect of oxygen flow on the optical properties of hafnium oxide thin films by dual-ion beam sputtering deposition
Hafnium oxide (HfO 2 ) is an important high-refractive-index material used in the optical thin films. Dual beam ion sputtering is one of the most important methods for preparing HfO 2 films. This study systematically investigated the optical, structural, and compositional properties of HfO 2 films b...
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| Veröffentlicht in: | Applied physics. A, Materials science & processing Materials science & processing, 2022-12, Vol.128 (12), Article 1097 |
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| creator | Fang, Shaobo Ma, Chong Liu, Weiming He, Junbo Wang, Cheng Chen, Gang Liu, Dingquan Zhang, Rongjun |
| description | Hafnium oxide (HfO
2
) is an important high-refractive-index material used in the optical thin films. Dual beam ion sputtering is one of the most important methods for preparing HfO
2
films. This study systematically investigated the optical, structural, and compositional properties of HfO
2
films by dual ion beam sputtering deposition. The influence and mechanism of the oxygen flow of the assist ion source and vacuum chamber to prepare hafnium oxide film with higher refractive index, lower extinction coefficient, and lower surface roughness were researched. Based on microstructure measurements obtained by atomic force microscopy, scanning electron microscopy and X-ray diffraction, it was found that the film with 15 sccm oxygen flow rate in assisted ion source and zero in vacuum chamber had the smallest root mean square roughness and highest degree of crystallization. Results of optical studies showed that the film exhibited the highest refractive index and lowest extinction coefficient, whereas the oxygen flow rate of the assist ion source and vacuum chamber were 15 sccm and zero, respectively. The film was polycrystalline and comprised monoclinic, tetragonal, and orthorhombic phases. We believe this study was important for choosing proper oxygen flow parameters for the fabrication of hafnium oxide film with different applications. |
| doi_str_mv | 10.1007/s00339-022-06224-2 |
| format | Article |
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2
) is an important high-refractive-index material used in the optical thin films. Dual beam ion sputtering is one of the most important methods for preparing HfO
2
films. This study systematically investigated the optical, structural, and compositional properties of HfO
2
films by dual ion beam sputtering deposition. The influence and mechanism of the oxygen flow of the assist ion source and vacuum chamber to prepare hafnium oxide film with higher refractive index, lower extinction coefficient, and lower surface roughness were researched. Based on microstructure measurements obtained by atomic force microscopy, scanning electron microscopy and X-ray diffraction, it was found that the film with 15 sccm oxygen flow rate in assisted ion source and zero in vacuum chamber had the smallest root mean square roughness and highest degree of crystallization. Results of optical studies showed that the film exhibited the highest refractive index and lowest extinction coefficient, whereas the oxygen flow rate of the assist ion source and vacuum chamber were 15 sccm and zero, respectively. The film was polycrystalline and comprised monoclinic, tetragonal, and orthorhombic phases. We believe this study was important for choosing proper oxygen flow parameters for the fabrication of hafnium oxide film with different applications.</description><identifier>ISSN: 0947-8396</identifier><identifier>EISSN: 1432-0630</identifier><identifier>DOI: 10.1007/s00339-022-06224-2</identifier><language>eng</language><publisher>Berlin/Heidelberg: Springer Berlin Heidelberg</publisher><subject>Applied physics ; Characterization and Evaluation of Materials ; Condensed Matter Physics ; Crystallization ; Deposition ; Flow velocity ; Hafnium oxide ; Ion beam sputtering ; Ion beams ; Ion sources ; Machines ; Manufacturing ; Materials science ; Microscopy ; Nanotechnology ; Optical and Electronic Materials ; Optical properties ; Orthorhombic phase ; Oxide coatings ; Oxygen ; Physics ; Physics and Astronomy ; Processes ; Refractivity ; Surface roughness ; Surfaces and Interfaces ; Thin Films ; Vacuum chambers</subject><ispartof>Applied physics. A, Materials science & processing, 2022-12, Vol.128 (12), Article 1097</ispartof><rights>The Author(s), under exclusive licence to Springer-Verlag GmbH, DE part of Springer Nature 2022. Springer Nature or its licensor (e.g. a society or other partner) holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c319t-a42e066a6353c59041cbd5fd4bcd0fb8bb393c6424069061b9c3934729ccdf1f3</citedby><cites>FETCH-LOGICAL-c319t-a42e066a6353c59041cbd5fd4bcd0fb8bb393c6424069061b9c3934729ccdf1f3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://link.springer.com/content/pdf/10.1007/s00339-022-06224-2$$EPDF$$P50$$Gspringer$$H</linktopdf><linktohtml>$$Uhttps://link.springer.com/10.1007/s00339-022-06224-2$$EHTML$$P50$$Gspringer$$H</linktohtml><link.rule.ids>314,776,780,27901,27902,41464,42533,51294</link.rule.ids></links><search><creatorcontrib>Fang, Shaobo</creatorcontrib><creatorcontrib>Ma, Chong</creatorcontrib><creatorcontrib>Liu, Weiming</creatorcontrib><creatorcontrib>He, Junbo</creatorcontrib><creatorcontrib>Wang, Cheng</creatorcontrib><creatorcontrib>Chen, Gang</creatorcontrib><creatorcontrib>Liu, Dingquan</creatorcontrib><creatorcontrib>Zhang, Rongjun</creatorcontrib><title>Effect of oxygen flow on the optical properties of hafnium oxide thin films by dual-ion beam sputtering deposition</title><title>Applied physics. A, Materials science & processing</title><addtitle>Appl. Phys. A</addtitle><description>Hafnium oxide (HfO
2
) is an important high-refractive-index material used in the optical thin films. Dual beam ion sputtering is one of the most important methods for preparing HfO
2
films. This study systematically investigated the optical, structural, and compositional properties of HfO
2
films by dual ion beam sputtering deposition. The influence and mechanism of the oxygen flow of the assist ion source and vacuum chamber to prepare hafnium oxide film with higher refractive index, lower extinction coefficient, and lower surface roughness were researched. Based on microstructure measurements obtained by atomic force microscopy, scanning electron microscopy and X-ray diffraction, it was found that the film with 15 sccm oxygen flow rate in assisted ion source and zero in vacuum chamber had the smallest root mean square roughness and highest degree of crystallization. Results of optical studies showed that the film exhibited the highest refractive index and lowest extinction coefficient, whereas the oxygen flow rate of the assist ion source and vacuum chamber were 15 sccm and zero, respectively. The film was polycrystalline and comprised monoclinic, tetragonal, and orthorhombic phases. We believe this study was important for choosing proper oxygen flow parameters for the fabrication of hafnium oxide film with different applications.</description><subject>Applied physics</subject><subject>Characterization and Evaluation of Materials</subject><subject>Condensed Matter Physics</subject><subject>Crystallization</subject><subject>Deposition</subject><subject>Flow velocity</subject><subject>Hafnium oxide</subject><subject>Ion beam sputtering</subject><subject>Ion beams</subject><subject>Ion sources</subject><subject>Machines</subject><subject>Manufacturing</subject><subject>Materials science</subject><subject>Microscopy</subject><subject>Nanotechnology</subject><subject>Optical and Electronic Materials</subject><subject>Optical properties</subject><subject>Orthorhombic phase</subject><subject>Oxide coatings</subject><subject>Oxygen</subject><subject>Physics</subject><subject>Physics and Astronomy</subject><subject>Processes</subject><subject>Refractivity</subject><subject>Surface roughness</subject><subject>Surfaces and Interfaces</subject><subject>Thin Films</subject><subject>Vacuum chambers</subject><issn>0947-8396</issn><issn>1432-0630</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2022</creationdate><recordtype>article</recordtype><recordid>eNp9kE1PxCAQhonRxHX1D3gi8YxSoLQczWb9SEy86JkUCrts2lKBRvffS62JN-cymZn3mYEXgOsC3xYYV3cRY0oFwoQgzAlhiJyAVcHoXFJ8ClZYsArVVPBzcBHjAedghKxA2FprdILeQv913JkB2s5_Qj_AtDfQj8nppoNj8KMJyZk4C_eNHdzUZ8C1JutchlzXR6iOsJ2aDrmMK9P0MI5TSia4YQdbM_roUh5dgjPbdNFc_eY1eH_Yvm2e0Mvr4_Pm_gVpWoiEGkYM5rzhtKS6FJgVWrWlbZnSLbaqVooKqjkjDHOBeaGEzg1WEaF1awtL1-Bm2Ztf_zGZmOTBT2HIJyWpaF3WVVlWWUUWlQ4-xmCsHIPrm3CUBZazt3LxVmZv5Y-3kmSILlAc58-Z8Lf6H-obysF9mg</recordid><startdate>20221201</startdate><enddate>20221201</enddate><creator>Fang, Shaobo</creator><creator>Ma, Chong</creator><creator>Liu, Weiming</creator><creator>He, Junbo</creator><creator>Wang, Cheng</creator><creator>Chen, Gang</creator><creator>Liu, Dingquan</creator><creator>Zhang, Rongjun</creator><general>Springer Berlin Heidelberg</general><general>Springer Nature B.V</general><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20221201</creationdate><title>Effect of oxygen flow on the optical properties of hafnium oxide thin films by dual-ion beam sputtering deposition</title><author>Fang, Shaobo ; Ma, Chong ; Liu, Weiming ; He, Junbo ; Wang, Cheng ; Chen, Gang ; Liu, Dingquan ; Zhang, Rongjun</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c319t-a42e066a6353c59041cbd5fd4bcd0fb8bb393c6424069061b9c3934729ccdf1f3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2022</creationdate><topic>Applied physics</topic><topic>Characterization and Evaluation of Materials</topic><topic>Condensed Matter Physics</topic><topic>Crystallization</topic><topic>Deposition</topic><topic>Flow velocity</topic><topic>Hafnium oxide</topic><topic>Ion beam sputtering</topic><topic>Ion beams</topic><topic>Ion sources</topic><topic>Machines</topic><topic>Manufacturing</topic><topic>Materials science</topic><topic>Microscopy</topic><topic>Nanotechnology</topic><topic>Optical and Electronic Materials</topic><topic>Optical properties</topic><topic>Orthorhombic phase</topic><topic>Oxide coatings</topic><topic>Oxygen</topic><topic>Physics</topic><topic>Physics and Astronomy</topic><topic>Processes</topic><topic>Refractivity</topic><topic>Surface roughness</topic><topic>Surfaces and Interfaces</topic><topic>Thin Films</topic><topic>Vacuum chambers</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Fang, Shaobo</creatorcontrib><creatorcontrib>Ma, Chong</creatorcontrib><creatorcontrib>Liu, Weiming</creatorcontrib><creatorcontrib>He, Junbo</creatorcontrib><creatorcontrib>Wang, Cheng</creatorcontrib><creatorcontrib>Chen, Gang</creatorcontrib><creatorcontrib>Liu, Dingquan</creatorcontrib><creatorcontrib>Zhang, Rongjun</creatorcontrib><collection>CrossRef</collection><jtitle>Applied physics. A, Materials science & processing</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Fang, Shaobo</au><au>Ma, Chong</au><au>Liu, Weiming</au><au>He, Junbo</au><au>Wang, Cheng</au><au>Chen, Gang</au><au>Liu, Dingquan</au><au>Zhang, Rongjun</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Effect of oxygen flow on the optical properties of hafnium oxide thin films by dual-ion beam sputtering deposition</atitle><jtitle>Applied physics. A, Materials science & processing</jtitle><stitle>Appl. Phys. A</stitle><date>2022-12-01</date><risdate>2022</risdate><volume>128</volume><issue>12</issue><artnum>1097</artnum><issn>0947-8396</issn><eissn>1432-0630</eissn><abstract>Hafnium oxide (HfO
2
) is an important high-refractive-index material used in the optical thin films. Dual beam ion sputtering is one of the most important methods for preparing HfO
2
films. This study systematically investigated the optical, structural, and compositional properties of HfO
2
films by dual ion beam sputtering deposition. The influence and mechanism of the oxygen flow of the assist ion source and vacuum chamber to prepare hafnium oxide film with higher refractive index, lower extinction coefficient, and lower surface roughness were researched. Based on microstructure measurements obtained by atomic force microscopy, scanning electron microscopy and X-ray diffraction, it was found that the film with 15 sccm oxygen flow rate in assisted ion source and zero in vacuum chamber had the smallest root mean square roughness and highest degree of crystallization. Results of optical studies showed that the film exhibited the highest refractive index and lowest extinction coefficient, whereas the oxygen flow rate of the assist ion source and vacuum chamber were 15 sccm and zero, respectively. The film was polycrystalline and comprised monoclinic, tetragonal, and orthorhombic phases. We believe this study was important for choosing proper oxygen flow parameters for the fabrication of hafnium oxide film with different applications.</abstract><cop>Berlin/Heidelberg</cop><pub>Springer Berlin Heidelberg</pub><doi>10.1007/s00339-022-06224-2</doi></addata></record> |
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| subjects | Applied physics Characterization and Evaluation of Materials Condensed Matter Physics Crystallization Deposition Flow velocity Hafnium oxide Ion beam sputtering Ion beams Ion sources Machines Manufacturing Materials science Microscopy Nanotechnology Optical and Electronic Materials Optical properties Orthorhombic phase Oxide coatings Oxygen Physics Physics and Astronomy Processes Refractivity Surface roughness Surfaces and Interfaces Thin Films Vacuum chambers |
| title | Effect of oxygen flow on the optical properties of hafnium oxide thin films by dual-ion beam sputtering deposition |
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