Investigation and process control of the grating fill-factor and sidewall angle impacts on 2-D metamaterial infrared mirrors

We report the first study of the effects of grating fill-factor variation and sidewall angle on 2-D subwavelength grating shortwave infrared mirrors, and the first development of a geometry compensation approach to correct for the grating fill-factor patterning error caused by EBL proximity effect a...

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Veröffentlicht in:	Optical materials express 2022-11, Vol.12 (11), p.4199
Hauptverfasser:	Mao, Haifeng, Dong, Xianshan, Liu, Yihui, Silva, K. K. M. B. Dilusha, Faraone, Lorenzo
Format:	Artikel
Sprache:	eng
Schlagworte:	Error correction Metamaterials Plasma etching Proximity effect (electricity) Short wave radiation
Online-Zugang:	Volltext
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