Investigation and process control of the grating fill-factor and sidewall angle impacts on 2-D metamaterial infrared mirrors
We report the first study of the effects of grating fill-factor variation and sidewall angle on 2-D subwavelength grating shortwave infrared mirrors, and the first development of a geometry compensation approach to correct for the grating fill-factor patterning error caused by EBL proximity effect a...
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| Veröffentlicht in: | Optical materials express 2022-11, Vol.12 (11), p.4199 |
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| container_title | Optical materials express |
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| creator | Mao, Haifeng Dong, Xianshan Liu, Yihui Silva, K. K. M. B. Dilusha Faraone, Lorenzo |
| description | We report the first study of the effects of grating fill-factor variation and sidewall angle on 2-D subwavelength grating shortwave infrared mirrors, and the first development of a geometry compensation approach to correct for the grating fill-factor patterning error caused by EBL proximity effect and a plasma etching process based on CHF 3 passivation to control grating sidewall angle. Mirrors with a large grating air-hole diameter-to-pitch ratio of 0.954 and vertical sidewall angle of 89.8° are demonstrated with an average reflectivity of 99% over an ultrabroad wavelength range of 560 nm (1.92-2.48 µm), which represents an unprecedented fractional bandwidth of 26%. |
| doi_str_mv | 10.1364/OME.471630 |
| format | Article |
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| language | eng |
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| source | DOAJ Directory of Open Access Journals; Elektronische Zeitschriftenbibliothek - Frei zugängliche E-Journals |
| subjects | Error correction Metamaterials Plasma etching Proximity effect (electricity) Short wave radiation |
| title | Investigation and process control of the grating fill-factor and sidewall angle impacts on 2-D metamaterial infrared mirrors |
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