Reactive sputtering deposition of Co3O4 films and an evaluation of its use as an electrochemical sensor for ascorbic acid

Co 3 O 4 films have been deposited using reactive DC magnetron sputtering onto fluorine-doped tin oxide (FTO) and fused silica (SiO 2 ). X-ray diffraction measurements confirmed the spinel Co 3 O 4 phase. The surface roughness of the films were 4 nm and 20 nm for SiO 2 and FTO substrates, respective...

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