Facile and Fast Interfacial Engineering Using a Frustrated Interfacial Self‐Assembly of Block Copolymers for Sub‐10‐nm Block Copolymer Nanopatterning

A requisite for successful nanopatterning is a precise interface control to meet the adequate surface energies. In block copolymer (BCP) nanopatterning, the interfaces need to be neutralized, promoting both blocks to wet the substrate, and thus realizing the perpendicular orientation of BCPs. Howeve...

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Veröffentlicht in:	Advanced functional materials 2022-08, Vol.32 (31), p.n/a
Hauptverfasser:	Kim, Seong Eun, Kim, Dong Hyup, Kim, So Youn
Format:	Artikel
Sprache:	eng
Schlagworte:	Assembly Block copolymers Control methods directed self‐assembly interfacial self‐assembly Materials science nanopatterning Substrates
Online-Zugang:	Volltext
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