RETRACTED ARTICLE: Porous NiO via pulsed electrodeposition towards enhanced electrochromic properties
Herein, a facile pulse electrodeposition procedure with a 1 s off-time between pulses is reported for a successful fabrication of porous nickel oxide (NiO) films on an indium tin oxide substrate. Large transmittance modulation of 39.2% at 550 nm, fast switching speed (coloring and bleaching of 5.2 s...
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| Veröffentlicht in: | Journal of applied electrochemistry 2022, Vol.52 (9), p.1343-1351 |
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| container_title | Journal of applied electrochemistry |
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| creator | Pham, Nguyen Sy Phan, Phuong Thi Que Le, Vinh Xuan |
| description | Herein, a facile pulse electrodeposition procedure with a 1 s off-time between pulses is reported for a successful fabrication of porous nickel oxide (NiO) films on an indium tin oxide substrate. Large transmittance modulation of 39.2% at 550 nm, fast switching speed (coloring and bleaching of 5.2 s and 2.3 s), high coloration efficiency of 20.01 cm
2
C
−1
, and long-term stability over 750 cycles were achieved. In comparison to the NiO films synthesized by continuous electrodeposition, the porous morphology of the NiO fabricated by pulsed electrodeposition facilitates charge transfer and electrolyte infiltration, as well as reduces the expansion/shrinkage of the NiO lattice during OH
−
insertion/extraction, resulting in an outstanding electrochromic performance. These results show that pulsed electrodeposition is a promising method for manufacturing NiO films with enhanced EC performance.
Graphical abstract |
| doi_str_mv | 10.1007/s10800-022-01716-8 |
| format | Article |
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2
C
−1
, and long-term stability over 750 cycles were achieved. In comparison to the NiO films synthesized by continuous electrodeposition, the porous morphology of the NiO fabricated by pulsed electrodeposition facilitates charge transfer and electrolyte infiltration, as well as reduces the expansion/shrinkage of the NiO lattice during OH
−
insertion/extraction, resulting in an outstanding electrochromic performance. These results show that pulsed electrodeposition is a promising method for manufacturing NiO films with enhanced EC performance.
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2
C
−1
, and long-term stability over 750 cycles were achieved. In comparison to the NiO films synthesized by continuous electrodeposition, the porous morphology of the NiO fabricated by pulsed electrodeposition facilitates charge transfer and electrolyte infiltration, as well as reduces the expansion/shrinkage of the NiO lattice during OH
−
insertion/extraction, resulting in an outstanding electrochromic performance. These results show that pulsed electrodeposition is a promising method for manufacturing NiO films with enhanced EC performance.
Graphical abstract</description><subject>Chemistry</subject><subject>Chemistry and Materials Science</subject><subject>Electrochemistry</subject><subject>Electrodeposition</subject><subject>Industrial Chemistry/Chemical Engineering</subject><subject>Physical Chemistry</subject><subject>Research Article</subject><issn>0021-891X</issn><issn>1572-8838</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2022</creationdate><recordtype>article</recordtype><recordid>eNp9kEFLwzAYhoMoOKd_wFPAc_VLUtPU25hTB8PJqOAtpOlX17E1NWkV_73RCd48vZfnfV54CTlncMkAsqvAQAEkwHkCLGMyUQdkxK4znigl1CEZAXCWqJy9HJOTEDYAkHOZjgiuZsVqMi1mt3SyKubTxeyGPjnvhkAfmyV9bwzthm3AiuIWbe9dhZ0LTd-4lvbuw_gqUGzXprV_iF17t2ss7bzr0PcNhlNyVJtoOfvNMXm-mxXTh2SxvJ9PJ4vEMpmqxAqQmZHIDHIhVCrSvBalVCzLsxLS2mBaxZ0USwNoOUgpayOQg7CpACzFmFzsvXH6bcDQ640bfBsnNZc5UyxaZaT4nrLeheCx1p1vdsZ_agb6-069v1PHO_XPnVrFktiXQoTbV_R_6n9aX0rkeCA</recordid><startdate>2022</startdate><enddate>2022</enddate><creator>Pham, Nguyen Sy</creator><creator>Phan, Phuong Thi Que</creator><creator>Le, Vinh Xuan</creator><general>Springer Netherlands</general><general>Springer Nature B.V</general><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>2022</creationdate><title>RETRACTED ARTICLE: Porous NiO via pulsed electrodeposition towards enhanced electrochromic properties</title><author>Pham, Nguyen Sy ; Phan, Phuong Thi Que ; Le, Vinh Xuan</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c1648-c3067a6e1ae23384349f3b681797b04fae4dced4eba0ec20666fa3e203c430eb3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2022</creationdate><topic>Chemistry</topic><topic>Chemistry and Materials Science</topic><topic>Electrochemistry</topic><topic>Electrodeposition</topic><topic>Industrial Chemistry/Chemical Engineering</topic><topic>Physical Chemistry</topic><topic>Research Article</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Pham, Nguyen Sy</creatorcontrib><creatorcontrib>Phan, Phuong Thi Que</creatorcontrib><creatorcontrib>Le, Vinh Xuan</creatorcontrib><collection>CrossRef</collection><jtitle>Journal of applied electrochemistry</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Pham, Nguyen Sy</au><au>Phan, Phuong Thi Que</au><au>Le, Vinh Xuan</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>RETRACTED ARTICLE: Porous NiO via pulsed electrodeposition towards enhanced electrochromic properties</atitle><jtitle>Journal of applied electrochemistry</jtitle><stitle>J Appl Electrochem</stitle><date>2022</date><risdate>2022</risdate><volume>52</volume><issue>9</issue><spage>1343</spage><epage>1351</epage><pages>1343-1351</pages><issn>0021-891X</issn><eissn>1572-8838</eissn><abstract>Herein, a facile pulse electrodeposition procedure with a 1 s off-time between pulses is reported for a successful fabrication of porous nickel oxide (NiO) films on an indium tin oxide substrate. Large transmittance modulation of 39.2% at 550 nm, fast switching speed (coloring and bleaching of 5.2 s and 2.3 s), high coloration efficiency of 20.01 cm
2
C
−1
, and long-term stability over 750 cycles were achieved. In comparison to the NiO films synthesized by continuous electrodeposition, the porous morphology of the NiO fabricated by pulsed electrodeposition facilitates charge transfer and electrolyte infiltration, as well as reduces the expansion/shrinkage of the NiO lattice during OH
−
insertion/extraction, resulting in an outstanding electrochromic performance. These results show that pulsed electrodeposition is a promising method for manufacturing NiO films with enhanced EC performance.
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| subjects | Chemistry Chemistry and Materials Science Electrochemistry Electrodeposition Industrial Chemistry/Chemical Engineering Physical Chemistry Research Article |
| title | RETRACTED ARTICLE: Porous NiO via pulsed electrodeposition towards enhanced electrochromic properties |
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