Conformal coating of powders by magnetron sputtering

Applying a thin film coating to powder under vacuum conditions requires mechanical agitation of the powder to achieve a uniform coating on the surfaces of the powder particles. In this work, we develop a piston-crank mechanism for agitating powder, using mathematic descriptions of system behavior (d...

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Veröffentlicht in:Surface & coatings technology 2022-04, Vol.436, p.128242, Article 128242
Hauptverfasser: Priedeman, Jonathan L., Thompson, Gregory B.
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description Applying a thin film coating to powder under vacuum conditions requires mechanical agitation of the powder to achieve a uniform coating on the surfaces of the powder particles. In this work, we develop a piston-crank mechanism for agitating powder, using mathematic descriptions of system behavior (dynamics, forces, and stresses) as well as operational experience to improve the design. The viability of the system is demonstrated by applying tungsten onto spherical copper powder to produce uniform, conformal coatings. The capability of the agitation system is compared to coatings produced using alternative agitation methods, revealing that the piston-crank mechanism produces a larger coating volume per energy input than these other techniques. [Display omitted] •A piston-crank mechanism can be used to agitate powders in a vacuum.•Process scalability is improved fourfold over previous conformal coating methods.•Mechanical design aspects are specified.
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subjects Agitation
Coatings
Design
Magnetron sputtering
Powder
Spherical powders
Thin film coatings
Thin films
title Conformal coating of powders by magnetron sputtering
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