Rippling Effect on the Electrical Properties of Boron Nitride Monolayer: Density Functional Theory

We performed a systematic study on mechanical properties of boron nitride monolayer. We found that applying mechanical deformation on boron nitride monolayer induced pattern of ripples. The induced rippling in the boron nitride monolayer created different bending levels in the forbidden zone, which...

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Veröffentlicht in:Semiconductors (Woodbury, N.Y.) N.Y.), 2021-08, Vol.55 (8), p.696-703
Hauptverfasser: Talla, J. A., Almahmoud, E. A., Abu-Farsakh, H.
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creator Talla, J. A.
Almahmoud, E. A.
Abu-Farsakh, H.
description We performed a systematic study on mechanical properties of boron nitride monolayer. We found that applying mechanical deformation on boron nitride monolayer induced pattern of ripples. The induced rippling in the boron nitride monolayer created different bending levels in the forbidden zone, which in turn significantly tune the electronic properties of the monolayer. We also found that the band gap of boron nitride monolayer decreased dramatically with increasing the bending angles. In other words, the combined effect of applying bending and uniaxial stress on the boron nitride monolayer significantly decreases the band gap. We believe that the ability to precisely control sharp local curvatures of boron nitride sheet brings forward opportunities for strain-assisted modification of chemical reactivity and local electronic structure in the boron nitride monolayer. Such modification may be of great interest to band gap engineered devices.
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fullrecord <record><control><sourceid>gale_proqu</sourceid><recordid>TN_cdi_proquest_journals_2641881566</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><galeid>A697940948</galeid><sourcerecordid>A697940948</sourcerecordid><originalsourceid>FETCH-LOGICAL-c285t-a34dd12dd40c319888476f03a6e6342ac7a05b864a5c21c8493e699a86b669863</originalsourceid><addsrcrecordid>eNp1kMtOwzAQRSMEEqXwAewssU7xK47NrpQWkHgJyjpynUnrKrWDnS7697gqEguEZjGve0ZXk2WXBI8IYfz6g2DBSkkFJVhiIulRNiBY4VzwUh3va8Hy_f40O4txjTEhsuCDbPFuu661bommTQOmR96hfgVo2qYmWKNb9BZ8B6G3EJFv0K0PSfJi07IG9Oydb_UOwg26Axdtv0OzrTO99S6R8xX4sDvPThrdRrj4ycPsczadTx7yp9f7x8n4KTdUFn2uGa9rQuuaY8OIklLyUjSYaQGCcapNqXGxkILrwlBiJFcMhFJaioUQSgo2zK4Od7vgv7YQ-2rttyH5iBUVnEhJCrFXjQ6qpW6hsq7xfdAmRQ0ba7yDxqb5WKhScay4TAA5ACb4GAM0VRfsRoddRXC1_3315_eJoQcmJq1bQvi18j_0DSmdhIg</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2641881566</pqid></control><display><type>article</type><title>Rippling Effect on the Electrical Properties of Boron Nitride Monolayer: Density Functional Theory</title><source>SpringerLink Journals - AutoHoldings</source><creator>Talla, J. A. ; Almahmoud, E. A. ; Abu-Farsakh, H.</creator><creatorcontrib>Talla, J. A. ; Almahmoud, E. A. ; Abu-Farsakh, H.</creatorcontrib><description>We performed a systematic study on mechanical properties of boron nitride monolayer. We found that applying mechanical deformation on boron nitride monolayer induced pattern of ripples. The induced rippling in the boron nitride monolayer created different bending levels in the forbidden zone, which in turn significantly tune the electronic properties of the monolayer. We also found that the band gap of boron nitride monolayer decreased dramatically with increasing the bending angles. In other words, the combined effect of applying bending and uniaxial stress on the boron nitride monolayer significantly decreases the band gap. We believe that the ability to precisely control sharp local curvatures of boron nitride sheet brings forward opportunities for strain-assisted modification of chemical reactivity and local electronic structure in the boron nitride monolayer. Such modification may be of great interest to band gap engineered devices.</description><identifier>ISSN: 1063-7826</identifier><identifier>EISSN: 1090-6479</identifier><identifier>DOI: 10.1134/S1063782621080182</identifier><language>eng</language><publisher>Moscow: Pleiades Publishing</publisher><subject>Analysis ; Bending ; Boron ; Boron nitride ; Density functional theory ; Density functionals ; Electric properties ; Electrical properties ; Electronic properties ; Electronic structure ; Energy gap ; Magnetic Materials ; Magnetism ; Mechanical properties ; Monolayers ; Physics ; Physics and Astronomy ; Silicones</subject><ispartof>Semiconductors (Woodbury, N.Y.), 2021-08, Vol.55 (8), p.696-703</ispartof><rights>Pleiades Publishing, Ltd. 2021. ISSN 1063-7826, Semiconductors, 2021, Vol. 55, No. 8, pp. 696–703. © Pleiades Publishing, Ltd., 2021. ISSN 1063-7826, Semiconductors, 2021. © Pleiades Publishing, Ltd., 2021.</rights><rights>COPYRIGHT 2021 Springer</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c285t-a34dd12dd40c319888476f03a6e6342ac7a05b864a5c21c8493e699a86b669863</citedby><cites>FETCH-LOGICAL-c285t-a34dd12dd40c319888476f03a6e6342ac7a05b864a5c21c8493e699a86b669863</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://link.springer.com/content/pdf/10.1134/S1063782621080182$$EPDF$$P50$$Gspringer$$H</linktopdf><linktohtml>$$Uhttps://link.springer.com/10.1134/S1063782621080182$$EHTML$$P50$$Gspringer$$H</linktohtml><link.rule.ids>314,776,780,27901,27902,41464,42533,51294</link.rule.ids></links><search><creatorcontrib>Talla, J. A.</creatorcontrib><creatorcontrib>Almahmoud, E. A.</creatorcontrib><creatorcontrib>Abu-Farsakh, H.</creatorcontrib><title>Rippling Effect on the Electrical Properties of Boron Nitride Monolayer: Density Functional Theory</title><title>Semiconductors (Woodbury, N.Y.)</title><addtitle>Semiconductors</addtitle><description>We performed a systematic study on mechanical properties of boron nitride monolayer. We found that applying mechanical deformation on boron nitride monolayer induced pattern of ripples. The induced rippling in the boron nitride monolayer created different bending levels in the forbidden zone, which in turn significantly tune the electronic properties of the monolayer. We also found that the band gap of boron nitride monolayer decreased dramatically with increasing the bending angles. In other words, the combined effect of applying bending and uniaxial stress on the boron nitride monolayer significantly decreases the band gap. We believe that the ability to precisely control sharp local curvatures of boron nitride sheet brings forward opportunities for strain-assisted modification of chemical reactivity and local electronic structure in the boron nitride monolayer. Such modification may be of great interest to band gap engineered devices.</description><subject>Analysis</subject><subject>Bending</subject><subject>Boron</subject><subject>Boron nitride</subject><subject>Density functional theory</subject><subject>Density functionals</subject><subject>Electric properties</subject><subject>Electrical properties</subject><subject>Electronic properties</subject><subject>Electronic structure</subject><subject>Energy gap</subject><subject>Magnetic Materials</subject><subject>Magnetism</subject><subject>Mechanical properties</subject><subject>Monolayers</subject><subject>Physics</subject><subject>Physics and Astronomy</subject><subject>Silicones</subject><issn>1063-7826</issn><issn>1090-6479</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2021</creationdate><recordtype>article</recordtype><recordid>eNp1kMtOwzAQRSMEEqXwAewssU7xK47NrpQWkHgJyjpynUnrKrWDnS7697gqEguEZjGve0ZXk2WXBI8IYfz6g2DBSkkFJVhiIulRNiBY4VzwUh3va8Hy_f40O4txjTEhsuCDbPFuu661bommTQOmR96hfgVo2qYmWKNb9BZ8B6G3EJFv0K0PSfJi07IG9Oydb_UOwg26Axdtv0OzrTO99S6R8xX4sDvPThrdRrj4ycPsczadTx7yp9f7x8n4KTdUFn2uGa9rQuuaY8OIklLyUjSYaQGCcapNqXGxkILrwlBiJFcMhFJaioUQSgo2zK4Od7vgv7YQ-2rttyH5iBUVnEhJCrFXjQ6qpW6hsq7xfdAmRQ0ba7yDxqb5WKhScay4TAA5ACb4GAM0VRfsRoddRXC1_3315_eJoQcmJq1bQvi18j_0DSmdhIg</recordid><startdate>20210801</startdate><enddate>20210801</enddate><creator>Talla, J. A.</creator><creator>Almahmoud, E. A.</creator><creator>Abu-Farsakh, H.</creator><general>Pleiades Publishing</general><general>Springer</general><general>Springer Nature B.V</general><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20210801</creationdate><title>Rippling Effect on the Electrical Properties of Boron Nitride Monolayer: Density Functional Theory</title><author>Talla, J. A. ; Almahmoud, E. A. ; Abu-Farsakh, H.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c285t-a34dd12dd40c319888476f03a6e6342ac7a05b864a5c21c8493e699a86b669863</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2021</creationdate><topic>Analysis</topic><topic>Bending</topic><topic>Boron</topic><topic>Boron nitride</topic><topic>Density functional theory</topic><topic>Density functionals</topic><topic>Electric properties</topic><topic>Electrical properties</topic><topic>Electronic properties</topic><topic>Electronic structure</topic><topic>Energy gap</topic><topic>Magnetic Materials</topic><topic>Magnetism</topic><topic>Mechanical properties</topic><topic>Monolayers</topic><topic>Physics</topic><topic>Physics and Astronomy</topic><topic>Silicones</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Talla, J. A.</creatorcontrib><creatorcontrib>Almahmoud, E. A.</creatorcontrib><creatorcontrib>Abu-Farsakh, H.</creatorcontrib><collection>CrossRef</collection><jtitle>Semiconductors (Woodbury, N.Y.)</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Talla, J. A.</au><au>Almahmoud, E. A.</au><au>Abu-Farsakh, H.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Rippling Effect on the Electrical Properties of Boron Nitride Monolayer: Density Functional Theory</atitle><jtitle>Semiconductors (Woodbury, N.Y.)</jtitle><stitle>Semiconductors</stitle><date>2021-08-01</date><risdate>2021</risdate><volume>55</volume><issue>8</issue><spage>696</spage><epage>703</epage><pages>696-703</pages><issn>1063-7826</issn><eissn>1090-6479</eissn><abstract>We performed a systematic study on mechanical properties of boron nitride monolayer. We found that applying mechanical deformation on boron nitride monolayer induced pattern of ripples. The induced rippling in the boron nitride monolayer created different bending levels in the forbidden zone, which in turn significantly tune the electronic properties of the monolayer. We also found that the band gap of boron nitride monolayer decreased dramatically with increasing the bending angles. In other words, the combined effect of applying bending and uniaxial stress on the boron nitride monolayer significantly decreases the band gap. We believe that the ability to precisely control sharp local curvatures of boron nitride sheet brings forward opportunities for strain-assisted modification of chemical reactivity and local electronic structure in the boron nitride monolayer. Such modification may be of great interest to band gap engineered devices.</abstract><cop>Moscow</cop><pub>Pleiades Publishing</pub><doi>10.1134/S1063782621080182</doi><tpages>8</tpages></addata></record>
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subjects Analysis
Bending
Boron
Boron nitride
Density functional theory
Density functionals
Electric properties
Electrical properties
Electronic properties
Electronic structure
Energy gap
Magnetic Materials
Magnetism
Mechanical properties
Monolayers
Physics
Physics and Astronomy
Silicones
title Rippling Effect on the Electrical Properties of Boron Nitride Monolayer: Density Functional Theory
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-29T13%3A24%3A09IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-gale_proqu&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Rippling%20Effect%20on%20the%20Electrical%20Properties%20of%20Boron%20Nitride%20Monolayer:%20Density%20Functional%20Theory&rft.jtitle=Semiconductors%20(Woodbury,%20N.Y.)&rft.au=Talla,%20J.%20A.&rft.date=2021-08-01&rft.volume=55&rft.issue=8&rft.spage=696&rft.epage=703&rft.pages=696-703&rft.issn=1063-7826&rft.eissn=1090-6479&rft_id=info:doi/10.1134/S1063782621080182&rft_dat=%3Cgale_proqu%3EA697940948%3C/gale_proqu%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=2641881566&rft_id=info:pmid/&rft_galeid=A697940948&rfr_iscdi=true