The Damage Threshold of Multilayer Film Induced by Femtosecond and Picosecond Laser Pulses
Laser-induced damage threshold (LIDT) is an essential factor in measuring the anti-laser damage of optical films. The damage threshold and morphology of the Ta2O5/SiO2 multilayer film prepared by electron beam evaporation were studied by femtosecond (50 fs) and picosecond (30 ps) laser irradiations....
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| Veröffentlicht in: | Coatings (Basel) 2022-02, Vol.12 (2), p.251 |
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| creator | Wang, Yunzhe Cheng, Xiangzheng Shao, Junfeng Zheng, Changbin Chen, Anmin Zhang, Luwei |
| description | Laser-induced damage threshold (LIDT) is an essential factor in measuring the anti-laser damage of optical films. The damage threshold and morphology of the Ta2O5/SiO2 multilayer film prepared by electron beam evaporation were studied by femtosecond (50 fs) and picosecond (30 ps) laser irradiations. The results showed that the LIDT of the film was 1.7 J·cm−2 under the femtosecond laser. The damage morphology developed from surface damage to a clear layered structure, and the outline has become more transparent and regular with an increase in the laser fluence. Under the picosecond laser irradiation, the LIDT of the film was 2.0 J·cm−2. The damage morphology developed from small range to thin film layer separation, and the outline changed from blurry to clear with an increase in laser fluence. Therefore, the LIDT of the film decreased with a decrease in the laser pulse width. |
| doi_str_mv | 10.3390/coatings12020251 |
| format | Article |
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The damage threshold and morphology of the Ta2O5/SiO2 multilayer film prepared by electron beam evaporation were studied by femtosecond (50 fs) and picosecond (30 ps) laser irradiations. The results showed that the LIDT of the film was 1.7 J·cm−2 under the femtosecond laser. The damage morphology developed from surface damage to a clear layered structure, and the outline has become more transparent and regular with an increase in the laser fluence. Under the picosecond laser irradiation, the LIDT of the film was 2.0 J·cm−2. The damage morphology developed from small range to thin film layer separation, and the outline changed from blurry to clear with an increase in laser fluence. Therefore, the LIDT of the film decreased with a decrease in the laser pulse width.</description><identifier>ISSN: 2079-6412</identifier><identifier>EISSN: 2079-6412</identifier><identifier>DOI: 10.3390/coatings12020251</identifier><language>eng</language><publisher>Basel: MDPI AG</publisher><subject>Defects ; Dielectric properties ; Electron beams ; Experiments ; Femtosecond pulsed lasers ; Fluence ; Glass substrates ; Ion beams ; Laser damage ; Lasers ; Morphology ; Multilayers ; Pulse duration ; Silicon dioxide ; Tantalum ; Tantalum oxides ; Thin films ; Yield point</subject><ispartof>Coatings (Basel), 2022-02, Vol.12 (2), p.251</ispartof><rights>2022 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). 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The damage threshold and morphology of the Ta2O5/SiO2 multilayer film prepared by electron beam evaporation were studied by femtosecond (50 fs) and picosecond (30 ps) laser irradiations. The results showed that the LIDT of the film was 1.7 J·cm−2 under the femtosecond laser. The damage morphology developed from surface damage to a clear layered structure, and the outline has become more transparent and regular with an increase in the laser fluence. Under the picosecond laser irradiation, the LIDT of the film was 2.0 J·cm−2. The damage morphology developed from small range to thin film layer separation, and the outline changed from blurry to clear with an increase in laser fluence. Therefore, the LIDT of the film decreased with a decrease in the laser pulse width.</description><subject>Defects</subject><subject>Dielectric properties</subject><subject>Electron beams</subject><subject>Experiments</subject><subject>Femtosecond pulsed lasers</subject><subject>Fluence</subject><subject>Glass substrates</subject><subject>Ion beams</subject><subject>Laser damage</subject><subject>Lasers</subject><subject>Morphology</subject><subject>Multilayers</subject><subject>Pulse duration</subject><subject>Silicon dioxide</subject><subject>Tantalum</subject><subject>Tantalum oxides</subject><subject>Thin films</subject><subject>Yield point</subject><issn>2079-6412</issn><issn>2079-6412</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2022</creationdate><recordtype>article</recordtype><sourceid>BENPR</sourceid><recordid>eNpdUE1LAzEQDaJgqb17DHhezcdmNzlKtbZQsYd68bJkk0m7ZXdTk91D_72RKogzDPMevDcDD6FbSu45V-TBeD00_S5SRlILeoEmjJQqK3LKLv_gazSL8UBSKcolVRP0sd0DftKd3gHe7gPEvW8t9g6_ju3QtPoEAS-atsOr3o4GLK5PeAHd4CMY31us02wa80vXOibDZmwjxBt05XQCs589Re-L5-18ma3fXlbzx3VmOOVDJqmVdZ2XUjhLuHBCMaoFSFZy40qnoZbKFppIURopuGYCrNCK5y7xgjo-RXfnu8fgP0eIQ3XwY-jTy4oVnBVUlSxPKnJWmeBjDOCqY2g6HU4VJdV3iNX_EPkXHrFmTQ</recordid><startdate>20220201</startdate><enddate>20220201</enddate><creator>Wang, Yunzhe</creator><creator>Cheng, Xiangzheng</creator><creator>Shao, Junfeng</creator><creator>Zheng, Changbin</creator><creator>Chen, Anmin</creator><creator>Zhang, Luwei</creator><general>MDPI AG</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>8FE</scope><scope>8FG</scope><scope>ABJCF</scope><scope>ABUWG</scope><scope>AFKRA</scope><scope>AZQEC</scope><scope>BENPR</scope><scope>BGLVJ</scope><scope>CCPQU</scope><scope>D1I</scope><scope>DWQXO</scope><scope>HCIFZ</scope><scope>JG9</scope><scope>KB.</scope><scope>PDBOC</scope><scope>PIMPY</scope><scope>PQEST</scope><scope>PQQKQ</scope><scope>PQUKI</scope><scope>PRINS</scope></search><sort><creationdate>20220201</creationdate><title>The Damage Threshold of Multilayer Film Induced by Femtosecond and Picosecond Laser Pulses</title><author>Wang, Yunzhe ; Cheng, Xiangzheng ; Shao, Junfeng ; Zheng, Changbin ; Chen, Anmin ; Zhang, Luwei</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c313t-81d8bb4785fd035f5921a5e8273cf7faeb89d6a0857c853a25ed5a934f7c861f3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2022</creationdate><topic>Defects</topic><topic>Dielectric properties</topic><topic>Electron beams</topic><topic>Experiments</topic><topic>Femtosecond pulsed lasers</topic><topic>Fluence</topic><topic>Glass substrates</topic><topic>Ion beams</topic><topic>Laser damage</topic><topic>Lasers</topic><topic>Morphology</topic><topic>Multilayers</topic><topic>Pulse duration</topic><topic>Silicon dioxide</topic><topic>Tantalum</topic><topic>Tantalum oxides</topic><topic>Thin films</topic><topic>Yield point</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Wang, Yunzhe</creatorcontrib><creatorcontrib>Cheng, Xiangzheng</creatorcontrib><creatorcontrib>Shao, Junfeng</creatorcontrib><creatorcontrib>Zheng, Changbin</creatorcontrib><creatorcontrib>Chen, Anmin</creatorcontrib><creatorcontrib>Zhang, Luwei</creatorcontrib><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>ProQuest SciTech Collection</collection><collection>ProQuest Technology Collection</collection><collection>Materials Science & Engineering Collection</collection><collection>ProQuest Central (Alumni Edition)</collection><collection>ProQuest Central UK/Ireland</collection><collection>ProQuest Central Essentials</collection><collection>ProQuest Central</collection><collection>Technology Collection</collection><collection>ProQuest One Community College</collection><collection>ProQuest Materials Science Collection</collection><collection>ProQuest Central Korea</collection><collection>SciTech Premium Collection</collection><collection>Materials Research Database</collection><collection>Materials Science Database</collection><collection>Materials Science Collection</collection><collection>Publicly Available Content Database</collection><collection>ProQuest One Academic Eastern Edition (DO NOT USE)</collection><collection>ProQuest One Academic</collection><collection>ProQuest One Academic UKI Edition</collection><collection>ProQuest Central China</collection><jtitle>Coatings (Basel)</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Wang, Yunzhe</au><au>Cheng, Xiangzheng</au><au>Shao, Junfeng</au><au>Zheng, Changbin</au><au>Chen, Anmin</au><au>Zhang, Luwei</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>The Damage Threshold of Multilayer Film Induced by Femtosecond and Picosecond Laser Pulses</atitle><jtitle>Coatings (Basel)</jtitle><date>2022-02-01</date><risdate>2022</risdate><volume>12</volume><issue>2</issue><spage>251</spage><pages>251-</pages><issn>2079-6412</issn><eissn>2079-6412</eissn><abstract>Laser-induced damage threshold (LIDT) is an essential factor in measuring the anti-laser damage of optical films. The damage threshold and morphology of the Ta2O5/SiO2 multilayer film prepared by electron beam evaporation were studied by femtosecond (50 fs) and picosecond (30 ps) laser irradiations. The results showed that the LIDT of the film was 1.7 J·cm−2 under the femtosecond laser. The damage morphology developed from surface damage to a clear layered structure, and the outline has become more transparent and regular with an increase in the laser fluence. Under the picosecond laser irradiation, the LIDT of the film was 2.0 J·cm−2. The damage morphology developed from small range to thin film layer separation, and the outline changed from blurry to clear with an increase in laser fluence. Therefore, the LIDT of the film decreased with a decrease in the laser pulse width.</abstract><cop>Basel</cop><pub>MDPI AG</pub><doi>10.3390/coatings12020251</doi><oa>free_for_read</oa></addata></record> |
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| source | MDPI - Multidisciplinary Digital Publishing Institute; Elektronische Zeitschriftenbibliothek - Frei zugängliche E-Journals; Alma/SFX Local Collection |
| subjects | Defects Dielectric properties Electron beams Experiments Femtosecond pulsed lasers Fluence Glass substrates Ion beams Laser damage Lasers Morphology Multilayers Pulse duration Silicon dioxide Tantalum Tantalum oxides Thin films Yield point |
| title | The Damage Threshold of Multilayer Film Induced by Femtosecond and Picosecond Laser Pulses |
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