Determination of the interface band alignment of Mg2Si/4H‐SiC heterojuction for potential photodetector application

The Mg2Si/4H‐SiC heterojunction was prepared by radio frequency (RF) magnetron sputtering technique. The binding energies of Mg 2p, Si 2p, and C 1s core levels and the maxima of valence band were measured by X‐ray photoelectron spectroscopy (XPS). Using the optical bandgap of Mg2Si (0.78 eV) and 4H‐...

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Veröffentlicht in:Surface and interface analysis 2022-03, Vol.54 (3), p.270-276
Hauptverfasser: Liao, Yangfang, Xie, Jing, Lv, Bing, Xiao, Qingquan, Xie, Quan
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creator Liao, Yangfang
Xie, Jing
Lv, Bing
Xiao, Qingquan
Xie, Quan
description The Mg2Si/4H‐SiC heterojunction was prepared by radio frequency (RF) magnetron sputtering technique. The binding energies of Mg 2p, Si 2p, and C 1s core levels and the maxima of valence band were measured by X‐ray photoelectron spectroscopy (XPS). Using the optical bandgap of Mg2Si (0.78 eV) and 4H‐SiC (3.25 eV), the band offsets of valence band (VBO) and conduction band (CBO) at Mg2Si/4H‐SiC interface were identified as 1.47 and 1.00 eV, respectively. The band alignment was evaluated to be type‐I band alignment. The Mg2Si/4H‐SiC heterojunction could be a promising candidate for the infrared (IR) photodetector.
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The binding energies of Mg 2p, Si 2p, and C 1s core levels and the maxima of valence band were measured by X‐ray photoelectron spectroscopy (XPS). Using the optical bandgap of Mg2Si (0.78 eV) and 4H‐SiC (3.25 eV), the band offsets of valence band (VBO) and conduction band (CBO) at Mg2Si/4H‐SiC interface were identified as 1.47 and 1.00 eV, respectively. The band alignment was evaluated to be type‐I band alignment. 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subjects 4H‐SiC
Alignment
band alignment
Conduction bands
Electrons
heterojunction
Heterojunctions
Intermetallic compounds
Magnesium compounds
Magnetron sputtering
Metal silicides
Mg2Si
Photoelectrons
Photometers
Radio frequency
Valence band
title Determination of the interface band alignment of Mg2Si/4H‐SiC heterojuction for potential photodetector application
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