Synthesis, Properties and Aging of ICP-CVD SiCxNy:H Films Formed from Tetramethyldisilazane

Amorphous hydrogenated silicon carbonitride films were synthesized on Si(100), Ge(111), and fused silica substrates using the inductively coupled plasma chemical vapor deposition technique. 1,1,3,3-tetramethyldisilazane (TMDSN) was used as a single-source precursor. The effect of the precursor’s pre...

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Veröffentlicht in:	Coatings (Basel) 2022-01, Vol.12 (1), p.80
Hauptverfasser:	Chagin, Maksim N., Sulyaeva, Veronica S., Shayapov, Vladimir R., Kolodin, Aleksey N., Khomyakov, Maksim N., Yushina, Irina V., Kosinova, Marina L.
Format:	Artikel
Sprache:	eng
Schlagworte:	Argon Chemical bonds Chemical composition Chemical vapor deposition Contact angle Decomposition Emission analysis Film growth Flow velocity Fourier transforms Fused silica Gas mixtures Gases Germanium Inductively coupled plasma Mechanical properties Nitrogen Optical emission spectroscopy Optical properties Oxidation Precursors Radio frequency plasma Reagents Silicon carbonitride Silicon dioxide Silicon nitride Spectrum analysis Stability Substrates Vapor phases Wettability
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