Control of electroplating process by weak background pulses

This study addresses the influence of weak agitation pulses of electromagnetic origin at 50–2000 kHz on the cyanide-based silvering for rack- and barrel-electroplating processes at industrial-grade production. The morphology of the electroplated layers has been investigated using scanning electron m...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Zarembo, Viktor, Zarembo, Daria
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Agitation Cyanide process Electroplating Plating Pulse modulation Silver plating Thickness
Online-Zugang:	Volltext
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