Study on the subsurface damage depth of monocrystalline silicon in ultrasonic vibration assisted diamond wire sawing

•A mathematical model of the subsurface damage depth in monocrystalline silicon wafers induced by ultrasonic vibration assisted diamond wire sawing (UAWS) was proposed.•The variation of subsurface damage depth with position angle of diamond abrasives under ultrasonic vibration was analyzed on the cr...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Engineering fracture mechanics 2021-12, Vol.258, p.108077, Article 108077
Hauptverfasser: Wang, Yan, Zhao, Bocheng, Huang, Shengju, Qian, Zhaofeng
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page 108077
container_title Engineering fracture mechanics
container_volume 258
creator Wang, Yan
Zhao, Bocheng
Huang, Shengju
Qian, Zhaofeng
description •A mathematical model of the subsurface damage depth in monocrystalline silicon wafers induced by ultrasonic vibration assisted diamond wire sawing (UAWS) was proposed.•The variation of subsurface damage depth with position angle of diamond abrasives under ultrasonic vibration was analyzed on the cross section of wire saw.•The influence of shielding effect of median crack on subsurface damage depth under ultrasonic vibration was analyzed.•A finite element model of diamond wire sawing monocrystalline silicon was established by ABAQUS, and the subsurface damage depth under different slicing parameters was simulated.•The interface bonding method was used to measure the subsurface damage depth of monocrystalline silicon wafer. Diamond wire sawing is one of the key technologies in solar cell manufacturing process and semiconductor chip manufacturing process. The subsurface damage depth (SSD) affects the quality of machined surface in diamond wire sawing, which must be evaluated. In this paper, a mathematical model of the SSD in monocrystalline silicon wafers induced by ultrasonic vibration assisted diamond wire sawing (UAWS) was proposed. In this model, the input is the depth and deflection angle of the median crack, the depth and length of the lateral crack, and ultrasonic vibration, and the output is the residual SSD on the chip. According to the model, the variation of SSD with position angle of diamond abrasives under ultrasonic vibration was analyzed on the cross section of wire saw, and the influence of shielding effect about median crack on SSD under ultrasonic vibration was analyzed later. Then, a finite element model (FEM) of diamond wire sawing monocrystalline silicon was established by ABAQUS,and the SSD under different slicing parameters was simulated. Finally, the interface bonding method was used to measure the SSD of monocrystalline silicon wafer. The experimental results showed that the SSD increases with the increase of the wire saw feed rate, and decreases with the increase of the wire saw speed and the workpiece rotation speed. The SSD in wafer sliced by UAWS is 18.95% on average lower than that in wafer sliced by conventional wire sawing (CWS). The maximum error between theoretical of mathematical model and experimental values is 15.9%, which verifies the validity of the mathematical model.
doi_str_mv 10.1016/j.engfracmech.2021.108077
format Article
fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_journals_2619119618</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>S0013794421004896</els_id><sourcerecordid>2619119618</sourcerecordid><originalsourceid>FETCH-LOGICAL-c349t-6743004753f026468d7faec3aeb572d0aaba2bce9cdfb8e62b31f64cb36d851c3</originalsourceid><addsrcrecordid>eNqNkEFvGyEQhVHVSnHd_Aeqnu3Csgu7x8pqk0qRckh7RrMw2FhrcIG15X8fLPeQY05v9PS-Gc0j5Ctna864_L5fY9i6BOaAZrduWMOr3zOlPpAF75VYKcG7j2TBGK_z0LZ35HPOe8aYkj1bkPJSZnuhMdCyQ5rnMc_JgUFq4QDbKngsOxodPcQQTbrkAtPkQ436yZuK-UDnqSTIMXhDT35MUHz1IWefC1pqPVTW0rNPlYKzD9sv5JODKeP9f12Sv79-_tk8rp6eH35vfjytjGiHspKqFYy1qhOONbKVvVUO0AjAsVONZQAjNKPBwVg39iibUXAnWzMKafuOG7Ek3257jyn-mzEXvY9zCvWkbiQfOB8k72tquKVMijkndPqY_AHSRXOmryXrvX5Tsr6WrG8lV3ZzY7G-cfKYdDYeg0FbvzVF2-jfseUVyYuOeQ</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2619119618</pqid></control><display><type>article</type><title>Study on the subsurface damage depth of monocrystalline silicon in ultrasonic vibration assisted diamond wire sawing</title><source>Elsevier ScienceDirect Journals</source><creator>Wang, Yan ; Zhao, Bocheng ; Huang, Shengju ; Qian, Zhaofeng</creator><creatorcontrib>Wang, Yan ; Zhao, Bocheng ; Huang, Shengju ; Qian, Zhaofeng</creatorcontrib><description>•A mathematical model of the subsurface damage depth in monocrystalline silicon wafers induced by ultrasonic vibration assisted diamond wire sawing (UAWS) was proposed.•The variation of subsurface damage depth with position angle of diamond abrasives under ultrasonic vibration was analyzed on the cross section of wire saw.•The influence of shielding effect of median crack on subsurface damage depth under ultrasonic vibration was analyzed.•A finite element model of diamond wire sawing monocrystalline silicon was established by ABAQUS, and the subsurface damage depth under different slicing parameters was simulated.•The interface bonding method was used to measure the subsurface damage depth of monocrystalline silicon wafer. Diamond wire sawing is one of the key technologies in solar cell manufacturing process and semiconductor chip manufacturing process. The subsurface damage depth (SSD) affects the quality of machined surface in diamond wire sawing, which must be evaluated. In this paper, a mathematical model of the SSD in monocrystalline silicon wafers induced by ultrasonic vibration assisted diamond wire sawing (UAWS) was proposed. In this model, the input is the depth and deflection angle of the median crack, the depth and length of the lateral crack, and ultrasonic vibration, and the output is the residual SSD on the chip. According to the model, the variation of SSD with position angle of diamond abrasives under ultrasonic vibration was analyzed on the cross section of wire saw, and the influence of shielding effect about median crack on SSD under ultrasonic vibration was analyzed later. Then, a finite element model (FEM) of diamond wire sawing monocrystalline silicon was established by ABAQUS,and the SSD under different slicing parameters was simulated. Finally, the interface bonding method was used to measure the SSD of monocrystalline silicon wafer. The experimental results showed that the SSD increases with the increase of the wire saw feed rate, and decreases with the increase of the wire saw speed and the workpiece rotation speed. The SSD in wafer sliced by UAWS is 18.95% on average lower than that in wafer sliced by conventional wire sawing (CWS). The maximum error between theoretical of mathematical model and experimental values is 15.9%, which verifies the validity of the mathematical model.</description><identifier>ISSN: 0013-7944</identifier><identifier>EISSN: 1873-7315</identifier><identifier>DOI: 10.1016/j.engfracmech.2021.108077</identifier><language>eng</language><publisher>New York: Elsevier Ltd</publisher><subject>Abrasives ; Damage ; Diamond machining ; Diamond wire sawing ; Feed rate ; Finite element method ; Interface bonding ; Manufacturing ; Mathematical models ; Monocrystalline silicon ; Photovoltaic cells ; Sawing ; Semiconductors ; Shielding ; Silicon ; Silicon wafers ; Solar cells ; Subsurface damage depth ; Ultrasonic vibration ; Vibration analysis ; Wire ; Workpieces</subject><ispartof>Engineering fracture mechanics, 2021-12, Vol.258, p.108077, Article 108077</ispartof><rights>2021 Elsevier Ltd</rights><rights>Copyright Elsevier BV Dec 2021</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c349t-6743004753f026468d7faec3aeb572d0aaba2bce9cdfb8e62b31f64cb36d851c3</citedby><cites>FETCH-LOGICAL-c349t-6743004753f026468d7faec3aeb572d0aaba2bce9cdfb8e62b31f64cb36d851c3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/j.engfracmech.2021.108077$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,776,780,3536,27903,27904,45974</link.rule.ids></links><search><creatorcontrib>Wang, Yan</creatorcontrib><creatorcontrib>Zhao, Bocheng</creatorcontrib><creatorcontrib>Huang, Shengju</creatorcontrib><creatorcontrib>Qian, Zhaofeng</creatorcontrib><title>Study on the subsurface damage depth of monocrystalline silicon in ultrasonic vibration assisted diamond wire sawing</title><title>Engineering fracture mechanics</title><description>•A mathematical model of the subsurface damage depth in monocrystalline silicon wafers induced by ultrasonic vibration assisted diamond wire sawing (UAWS) was proposed.•The variation of subsurface damage depth with position angle of diamond abrasives under ultrasonic vibration was analyzed on the cross section of wire saw.•The influence of shielding effect of median crack on subsurface damage depth under ultrasonic vibration was analyzed.•A finite element model of diamond wire sawing monocrystalline silicon was established by ABAQUS, and the subsurface damage depth under different slicing parameters was simulated.•The interface bonding method was used to measure the subsurface damage depth of monocrystalline silicon wafer. Diamond wire sawing is one of the key technologies in solar cell manufacturing process and semiconductor chip manufacturing process. The subsurface damage depth (SSD) affects the quality of machined surface in diamond wire sawing, which must be evaluated. In this paper, a mathematical model of the SSD in monocrystalline silicon wafers induced by ultrasonic vibration assisted diamond wire sawing (UAWS) was proposed. In this model, the input is the depth and deflection angle of the median crack, the depth and length of the lateral crack, and ultrasonic vibration, and the output is the residual SSD on the chip. According to the model, the variation of SSD with position angle of diamond abrasives under ultrasonic vibration was analyzed on the cross section of wire saw, and the influence of shielding effect about median crack on SSD under ultrasonic vibration was analyzed later. Then, a finite element model (FEM) of diamond wire sawing monocrystalline silicon was established by ABAQUS,and the SSD under different slicing parameters was simulated. Finally, the interface bonding method was used to measure the SSD of monocrystalline silicon wafer. The experimental results showed that the SSD increases with the increase of the wire saw feed rate, and decreases with the increase of the wire saw speed and the workpiece rotation speed. The SSD in wafer sliced by UAWS is 18.95% on average lower than that in wafer sliced by conventional wire sawing (CWS). The maximum error between theoretical of mathematical model and experimental values is 15.9%, which verifies the validity of the mathematical model.</description><subject>Abrasives</subject><subject>Damage</subject><subject>Diamond machining</subject><subject>Diamond wire sawing</subject><subject>Feed rate</subject><subject>Finite element method</subject><subject>Interface bonding</subject><subject>Manufacturing</subject><subject>Mathematical models</subject><subject>Monocrystalline silicon</subject><subject>Photovoltaic cells</subject><subject>Sawing</subject><subject>Semiconductors</subject><subject>Shielding</subject><subject>Silicon</subject><subject>Silicon wafers</subject><subject>Solar cells</subject><subject>Subsurface damage depth</subject><subject>Ultrasonic vibration</subject><subject>Vibration analysis</subject><subject>Wire</subject><subject>Workpieces</subject><issn>0013-7944</issn><issn>1873-7315</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2021</creationdate><recordtype>article</recordtype><recordid>eNqNkEFvGyEQhVHVSnHd_Aeqnu3Csgu7x8pqk0qRckh7RrMw2FhrcIG15X8fLPeQY05v9PS-Gc0j5Ctna864_L5fY9i6BOaAZrduWMOr3zOlPpAF75VYKcG7j2TBGK_z0LZ35HPOe8aYkj1bkPJSZnuhMdCyQ5rnMc_JgUFq4QDbKngsOxodPcQQTbrkAtPkQ436yZuK-UDnqSTIMXhDT35MUHz1IWefC1pqPVTW0rNPlYKzD9sv5JODKeP9f12Sv79-_tk8rp6eH35vfjytjGiHspKqFYy1qhOONbKVvVUO0AjAsVONZQAjNKPBwVg39iibUXAnWzMKafuOG7Ek3257jyn-mzEXvY9zCvWkbiQfOB8k72tquKVMijkndPqY_AHSRXOmryXrvX5Tsr6WrG8lV3ZzY7G-cfKYdDYeg0FbvzVF2-jfseUVyYuOeQ</recordid><startdate>202112</startdate><enddate>202112</enddate><creator>Wang, Yan</creator><creator>Zhao, Bocheng</creator><creator>Huang, Shengju</creator><creator>Qian, Zhaofeng</creator><general>Elsevier Ltd</general><general>Elsevier BV</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>7TB</scope><scope>8BQ</scope><scope>8FD</scope><scope>FR3</scope><scope>JG9</scope><scope>KR7</scope></search><sort><creationdate>202112</creationdate><title>Study on the subsurface damage depth of monocrystalline silicon in ultrasonic vibration assisted diamond wire sawing</title><author>Wang, Yan ; Zhao, Bocheng ; Huang, Shengju ; Qian, Zhaofeng</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c349t-6743004753f026468d7faec3aeb572d0aaba2bce9cdfb8e62b31f64cb36d851c3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2021</creationdate><topic>Abrasives</topic><topic>Damage</topic><topic>Diamond machining</topic><topic>Diamond wire sawing</topic><topic>Feed rate</topic><topic>Finite element method</topic><topic>Interface bonding</topic><topic>Manufacturing</topic><topic>Mathematical models</topic><topic>Monocrystalline silicon</topic><topic>Photovoltaic cells</topic><topic>Sawing</topic><topic>Semiconductors</topic><topic>Shielding</topic><topic>Silicon</topic><topic>Silicon wafers</topic><topic>Solar cells</topic><topic>Subsurface damage depth</topic><topic>Ultrasonic vibration</topic><topic>Vibration analysis</topic><topic>Wire</topic><topic>Workpieces</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Wang, Yan</creatorcontrib><creatorcontrib>Zhao, Bocheng</creatorcontrib><creatorcontrib>Huang, Shengju</creatorcontrib><creatorcontrib>Qian, Zhaofeng</creatorcontrib><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>Mechanical &amp; Transportation Engineering Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Engineering Research Database</collection><collection>Materials Research Database</collection><collection>Civil Engineering Abstracts</collection><jtitle>Engineering fracture mechanics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Wang, Yan</au><au>Zhao, Bocheng</au><au>Huang, Shengju</au><au>Qian, Zhaofeng</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Study on the subsurface damage depth of monocrystalline silicon in ultrasonic vibration assisted diamond wire sawing</atitle><jtitle>Engineering fracture mechanics</jtitle><date>2021-12</date><risdate>2021</risdate><volume>258</volume><spage>108077</spage><pages>108077-</pages><artnum>108077</artnum><issn>0013-7944</issn><eissn>1873-7315</eissn><abstract>•A mathematical model of the subsurface damage depth in monocrystalline silicon wafers induced by ultrasonic vibration assisted diamond wire sawing (UAWS) was proposed.•The variation of subsurface damage depth with position angle of diamond abrasives under ultrasonic vibration was analyzed on the cross section of wire saw.•The influence of shielding effect of median crack on subsurface damage depth under ultrasonic vibration was analyzed.•A finite element model of diamond wire sawing monocrystalline silicon was established by ABAQUS, and the subsurface damage depth under different slicing parameters was simulated.•The interface bonding method was used to measure the subsurface damage depth of monocrystalline silicon wafer. Diamond wire sawing is one of the key technologies in solar cell manufacturing process and semiconductor chip manufacturing process. The subsurface damage depth (SSD) affects the quality of machined surface in diamond wire sawing, which must be evaluated. In this paper, a mathematical model of the SSD in monocrystalline silicon wafers induced by ultrasonic vibration assisted diamond wire sawing (UAWS) was proposed. In this model, the input is the depth and deflection angle of the median crack, the depth and length of the lateral crack, and ultrasonic vibration, and the output is the residual SSD on the chip. According to the model, the variation of SSD with position angle of diamond abrasives under ultrasonic vibration was analyzed on the cross section of wire saw, and the influence of shielding effect about median crack on SSD under ultrasonic vibration was analyzed later. Then, a finite element model (FEM) of diamond wire sawing monocrystalline silicon was established by ABAQUS,and the SSD under different slicing parameters was simulated. Finally, the interface bonding method was used to measure the SSD of monocrystalline silicon wafer. The experimental results showed that the SSD increases with the increase of the wire saw feed rate, and decreases with the increase of the wire saw speed and the workpiece rotation speed. The SSD in wafer sliced by UAWS is 18.95% on average lower than that in wafer sliced by conventional wire sawing (CWS). The maximum error between theoretical of mathematical model and experimental values is 15.9%, which verifies the validity of the mathematical model.</abstract><cop>New York</cop><pub>Elsevier Ltd</pub><doi>10.1016/j.engfracmech.2021.108077</doi></addata></record>
fulltext fulltext
identifier ISSN: 0013-7944
ispartof Engineering fracture mechanics, 2021-12, Vol.258, p.108077, Article 108077
issn 0013-7944
1873-7315
language eng
recordid cdi_proquest_journals_2619119618
source Elsevier ScienceDirect Journals
subjects Abrasives
Damage
Diamond machining
Diamond wire sawing
Feed rate
Finite element method
Interface bonding
Manufacturing
Mathematical models
Monocrystalline silicon
Photovoltaic cells
Sawing
Semiconductors
Shielding
Silicon
Silicon wafers
Solar cells
Subsurface damage depth
Ultrasonic vibration
Vibration analysis
Wire
Workpieces
title Study on the subsurface damage depth of monocrystalline silicon in ultrasonic vibration assisted diamond wire sawing
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-21T23%3A55%3A50IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Study%20on%20the%20subsurface%20damage%20depth%20of%20monocrystalline%20silicon%20in%20ultrasonic%20vibration%20assisted%20diamond%20wire%20sawing&rft.jtitle=Engineering%20fracture%20mechanics&rft.au=Wang,%20Yan&rft.date=2021-12&rft.volume=258&rft.spage=108077&rft.pages=108077-&rft.artnum=108077&rft.issn=0013-7944&rft.eissn=1873-7315&rft_id=info:doi/10.1016/j.engfracmech.2021.108077&rft_dat=%3Cproquest_cross%3E2619119618%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=2619119618&rft_id=info:pmid/&rft_els_id=S0013794421004896&rfr_iscdi=true