Stochastic Modeling and Local CD Uniformity Comparison between Negative Metal-Based, Negative- and Positive-Tone Development EUV Resists

This paper presents a simulation study on the printing behavior of three different EUV resist systems. Stochastic models for negative metal-based resist and conventional chemically amplified resist (CAR) were calibrated and then validated. As for negative-tone development (NTD) CAR, we commenced fro...

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Veröffentlicht in:	IEICE Transactions on Electronics 2022/01/01, Vol.E105.C(1), pp.35-46
Hauptverfasser:	KAMOHARA, Itaru, WELLING, Ulrich, KLOSTERMANN, Ulrich, DEMMERLE, Wolfgang
Format:	Artikel
Sprache:	eng
Schlagworte:	Contact holes EUV Inhibitors LCDU mask tone metal-oxide-resist NTD Pitch polymer resist Resists stochastic model calibration Stochastic models Stochastic processes
Online-Zugang:	Volltext
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