Two-Dimensional MoSi2N4: An Excellent 2-D Semiconductor for Field-Effect Transistors

We report the performance of field-effect transistors (FETs), composed of monolayer of recently synthesized layered two-dimensional (2-D) MoSi 2 N 4 as channel material, using the first principles quantum transport simulations. The devices' performance is assessed as per the International Roadm...

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Veröffentlicht in:IEEE transactions on electron devices 2022-01, Vol.69 (1), p.406-413
Hauptverfasser: Nandan, Keshari, Ghosh, Barun, Agarwal, Amit, Bhowmick, Somnath, Chauhan, Yogesh S.
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Sprache:eng
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