Efficient Process of ALD CuO and Its Application in Photocatalytic H2 Evolution

As a cost-effective material, CuO has been widely used in many emerging fields. The synthesis method plays a key role in the performance of the material. Atomic layer deposition (ALD) has been developed as a precise technique to deposit materials with great control at atomic scale. Herein, an effici...

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Veröffentlicht in:	Russian journal of inorganic chemistry 2021-12, Vol.66 (13), p.1986-1994
Hauptverfasser:	Dongmei He, Du, Liyong, Wang, Keyan, Ding, Yuqiang
Format:	Artikel
Sprache:	eng
Schlagworte:	Atomic layer epitaxy Chemistry Chemistry and Materials Science Copper oxides Hydrogen evolution Inorganic Chemistry Inorganic Materials and Nanomaterials Nanoparticles Particulate composites Performance evaluation Silicon dioxide Substrates Titanium dioxide
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