SILAR Deposition of Metal Oxide Nanostructured Films

Methods for the fabrication of thin films with well controlled structure and properties are of great importance for the development of functional devices for a large range of applications. SILAR, the acronym for Successive Ionic Layer Adsorption and Reaction, is an evolution and combination of two o...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Small (Weinheim an der Bergstrasse, Germany) Germany), 2021-12, Vol.17 (49), p.n/a
Hauptverfasser:	Ratnayake, Samantha Prabath, Ren, Jiawen, Colusso, Elena, Guglielmi, Massimo, Martucci, Alessandro, Della Gaspera, Enrico
Format:	Artikel
Sprache:	eng
Schlagworte:	Atomic layer epitaxy metal chalcogenides Metal oxides Nanotechnology Oxide coatings Parameters Photoelectrochemical devices Photovoltaic cells Solar cells supercapacitors Thin films water splitting
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!