Enhancement of the ion flux to the substrate through high-voltage biasing in an electron cyclotron resonance plasma and its application to high-speed deposition of conductive carbon film

A method for enhancing ion flux to the substrate via high-voltage pulse biasing is investigated in an electron cyclotron resonance plasma. When high-voltage pulse biases above 500 V are applied to the stage, an increase in the stage current is observed, especially in the case of diverging magnetic f...

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