Analysis Structural Modification and Optical–Electrical Properties of Al-Doped ZnO Oxide Films Deposited by Magnetron Sputtering

This study aims to assess structural, optical, and electrical properties of AZO thin films produced by magnetron sputtering in high pressure were 12, 7, and 5 cm apart between the target and the glass substrate. Then, a treatment current variation (0.1, 0.2, and 0.3 A) was performed for the fixed po...

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Veröffentlicht in:	Brazilian journal of physics 2021-12, Vol.51 (6), p.1677-1688
Hauptverfasser:	Santos, E. J. C., Queiroz, J. C. A., Queiroz, M. G. O., Liborio, M. S., Almeida, E. O., Bessa, K. L., Souza, R. R. M., Feitor, M. C., Costa, T. H. C.
Format:	Artikel
Sprache:	eng
Schlagworte:	Electrical properties Film thickness General and Applied Physics Glass substrates Grain size Magnetic properties Magnetron sputtering Optical properties Oxide coatings Physics Physics and Astronomy Spectrophotometry Thin films Zinc oxide
Online-Zugang:	Volltext
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