Spray Coating of Photoresist for 3D Microstructures with Different Geometries

This paper presents the advantages of spray coating technique as compared to the conventional spin coating method for photoresist coating of 3D microstructures. An optimized mix of photoresist AZ4620: MEK: PGMEA (1:1.5:0.5) was used to achieve good coverage and uniformity of photoresist not only on...

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Veröffentlicht in:	Journal of physics. Conference series 2006-04, Vol.34 (1), p.937-942
Hauptverfasser:	Yu, Liming, Lee, Yong Yeow, Tay, Francis E H, Iliescu, Ciprian
Format:	Artikel
Sprache:	eng
Schlagworte:	Microstructure Photoresists Physics Spin coating Spray coating
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