Vertical Graphene Growth on AlCu4Mg Alloy by PECVD Technique
Vertical graphene, which belongs to nanomaterials, is a very promising tool for improving the useful properties of long-used and proven materials. Since the growth of vertical graphene is different on each base material and has specific deposition setting parameters, it is necessary to examine each...
Gespeichert in:
| Veröffentlicht in: | Coatings (Basel) 2021-09, Vol.11 (9), p.1108 |
|---|---|
| Hauptverfasser: | , , , , |
| Format: | Artikel |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | 9 |
| container_start_page | 1108 |
| container_title | Coatings (Basel) |
| container_volume | 11 |
| creator | Polzer, Ales Sedlak, Josef Sedlacek, Jan Benes, Libor Mouralova, Katerina |
| description | Vertical graphene, which belongs to nanomaterials, is a very promising tool for improving the useful properties of long-used and proven materials. Since the growth of vertical graphene is different on each base material and has specific deposition setting parameters, it is necessary to examine each base material separately. For this reason, a full factor design of experiment was performed with 26 = 64 rounds, which contained additional 5 central points, i.e., a total of 69 rounds of individual experiments, which was to examine the effect of input factors Temperature, Pressure, Flow, CH4, Plasma Power, and Annealing in H2 on the growth of vertical graphene on aluminum alloy AlCu4Mg. The deposition was performed using plasma-enhanced chemical vapor deposition (PECVD) technology. Mainly, the occurrence of graphene was analyzed, which was confirmed by Raman spectroscopy, as well as its thickness. The characterization was performed using electron and transmission microscopy, including an atomic force microscope. It was found that the growth of graphene occurred in 7 cases and its thickness is affected only by the interaction flow (sccm) × pretreatment H2 (sccm). |
| doi_str_mv | 10.3390/coatings11091108 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_journals_2576387867</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>2576387867</sourcerecordid><originalsourceid>FETCH-LOGICAL-c313t-3ab0724003b88fc2bf5f3f26f1ff558344816a43901042dd2953ea9e9dd7f30c3</originalsourceid><addsrcrecordid>eNpdUEFLwzAYDaLgmLt7LHiuJvnSNgEvo84pTPQwdw1pmqwdtZlJi_TfG5kH8cHHe4fHe3wPoWuCbwEEvtNODW2_D4RgEY-foRnFhUhzRuj5H32JFiEccIQgwImYofud8UOrVZesvTo2pjdRuK-hSVyfLLtyZC_7yJ2bkmpK3lbl7iHZGt307edortCFVV0wi1-eo_fH1bZ8Sjev6-dyuUk1EBhSUBUuKMMYKs6tppXNLFiaW2JtlnFgjJNcsfgIwYzWNRUZGCWMqOvCAtYwRzen3KN3sTYM8uBG38dKSbMiB17wvIgufHJp70Lwxsqjbz-UnyTB8mcm-X8m-AYEbln7</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2576387867</pqid></control><display><type>article</type><title>Vertical Graphene Growth on AlCu4Mg Alloy by PECVD Technique</title><source>MDPI - Multidisciplinary Digital Publishing Institute</source><source>Elektronische Zeitschriftenbibliothek - Frei zugängliche E-Journals</source><source>Alma/SFX Local Collection</source><creator>Polzer, Ales ; Sedlak, Josef ; Sedlacek, Jan ; Benes, Libor ; Mouralova, Katerina</creator><creatorcontrib>Polzer, Ales ; Sedlak, Josef ; Sedlacek, Jan ; Benes, Libor ; Mouralova, Katerina</creatorcontrib><description>Vertical graphene, which belongs to nanomaterials, is a very promising tool for improving the useful properties of long-used and proven materials. Since the growth of vertical graphene is different on each base material and has specific deposition setting parameters, it is necessary to examine each base material separately. For this reason, a full factor design of experiment was performed with 26 = 64 rounds, which contained additional 5 central points, i.e., a total of 69 rounds of individual experiments, which was to examine the effect of input factors Temperature, Pressure, Flow, CH4, Plasma Power, and Annealing in H2 on the growth of vertical graphene on aluminum alloy AlCu4Mg. The deposition was performed using plasma-enhanced chemical vapor deposition (PECVD) technology. Mainly, the occurrence of graphene was analyzed, which was confirmed by Raman spectroscopy, as well as its thickness. The characterization was performed using electron and transmission microscopy, including an atomic force microscope. It was found that the growth of graphene occurred in 7 cases and its thickness is affected only by the interaction flow (sccm) × pretreatment H2 (sccm).</description><identifier>ISSN: 2079-6412</identifier><identifier>EISSN: 2079-6412</identifier><identifier>DOI: 10.3390/coatings11091108</identifier><language>eng</language><publisher>Basel: MDPI AG</publisher><subject>Aluminum alloys ; Aluminum base alloys ; Atomic force microscopes ; Atomic force microscopy ; Carbon ; Chemical bonds ; Chemical vapor deposition ; Design factors ; Design of experiments ; Graphene ; Mechanical properties ; Morphology ; Nanomaterials ; Packaging industry ; Plasma ; Plasma enhanced chemical vapor deposition ; Raman spectroscopy ; Spectrum analysis ; Temperature effects ; Tensile strength ; Thickness</subject><ispartof>Coatings (Basel), 2021-09, Vol.11 (9), p.1108</ispartof><rights>2021 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c313t-3ab0724003b88fc2bf5f3f26f1ff558344816a43901042dd2953ea9e9dd7f30c3</citedby><cites>FETCH-LOGICAL-c313t-3ab0724003b88fc2bf5f3f26f1ff558344816a43901042dd2953ea9e9dd7f30c3</cites><orcidid>0000-0002-6025-2520 ; 0000-0001-8124-803X</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,27901,27902</link.rule.ids></links><search><creatorcontrib>Polzer, Ales</creatorcontrib><creatorcontrib>Sedlak, Josef</creatorcontrib><creatorcontrib>Sedlacek, Jan</creatorcontrib><creatorcontrib>Benes, Libor</creatorcontrib><creatorcontrib>Mouralova, Katerina</creatorcontrib><title>Vertical Graphene Growth on AlCu4Mg Alloy by PECVD Technique</title><title>Coatings (Basel)</title><description>Vertical graphene, which belongs to nanomaterials, is a very promising tool for improving the useful properties of long-used and proven materials. Since the growth of vertical graphene is different on each base material and has specific deposition setting parameters, it is necessary to examine each base material separately. For this reason, a full factor design of experiment was performed with 26 = 64 rounds, which contained additional 5 central points, i.e., a total of 69 rounds of individual experiments, which was to examine the effect of input factors Temperature, Pressure, Flow, CH4, Plasma Power, and Annealing in H2 on the growth of vertical graphene on aluminum alloy AlCu4Mg. The deposition was performed using plasma-enhanced chemical vapor deposition (PECVD) technology. Mainly, the occurrence of graphene was analyzed, which was confirmed by Raman spectroscopy, as well as its thickness. The characterization was performed using electron and transmission microscopy, including an atomic force microscope. It was found that the growth of graphene occurred in 7 cases and its thickness is affected only by the interaction flow (sccm) × pretreatment H2 (sccm).</description><subject>Aluminum alloys</subject><subject>Aluminum base alloys</subject><subject>Atomic force microscopes</subject><subject>Atomic force microscopy</subject><subject>Carbon</subject><subject>Chemical bonds</subject><subject>Chemical vapor deposition</subject><subject>Design factors</subject><subject>Design of experiments</subject><subject>Graphene</subject><subject>Mechanical properties</subject><subject>Morphology</subject><subject>Nanomaterials</subject><subject>Packaging industry</subject><subject>Plasma</subject><subject>Plasma enhanced chemical vapor deposition</subject><subject>Raman spectroscopy</subject><subject>Spectrum analysis</subject><subject>Temperature effects</subject><subject>Tensile strength</subject><subject>Thickness</subject><issn>2079-6412</issn><issn>2079-6412</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2021</creationdate><recordtype>article</recordtype><sourceid>BENPR</sourceid><recordid>eNpdUEFLwzAYDaLgmLt7LHiuJvnSNgEvo84pTPQwdw1pmqwdtZlJi_TfG5kH8cHHe4fHe3wPoWuCbwEEvtNODW2_D4RgEY-foRnFhUhzRuj5H32JFiEccIQgwImYofud8UOrVZesvTo2pjdRuK-hSVyfLLtyZC_7yJ2bkmpK3lbl7iHZGt307edortCFVV0wi1-eo_fH1bZ8Sjev6-dyuUk1EBhSUBUuKMMYKs6tppXNLFiaW2JtlnFgjJNcsfgIwYzWNRUZGCWMqOvCAtYwRzen3KN3sTYM8uBG38dKSbMiB17wvIgufHJp70Lwxsqjbz-UnyTB8mcm-X8m-AYEbln7</recordid><startdate>20210901</startdate><enddate>20210901</enddate><creator>Polzer, Ales</creator><creator>Sedlak, Josef</creator><creator>Sedlacek, Jan</creator><creator>Benes, Libor</creator><creator>Mouralova, Katerina</creator><general>MDPI AG</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>8FE</scope><scope>8FG</scope><scope>ABJCF</scope><scope>ABUWG</scope><scope>AFKRA</scope><scope>AZQEC</scope><scope>BENPR</scope><scope>BGLVJ</scope><scope>CCPQU</scope><scope>D1I</scope><scope>DWQXO</scope><scope>HCIFZ</scope><scope>JG9</scope><scope>KB.</scope><scope>PDBOC</scope><scope>PIMPY</scope><scope>PQEST</scope><scope>PQQKQ</scope><scope>PQUKI</scope><scope>PRINS</scope><orcidid>https://orcid.org/0000-0002-6025-2520</orcidid><orcidid>https://orcid.org/0000-0001-8124-803X</orcidid></search><sort><creationdate>20210901</creationdate><title>Vertical Graphene Growth on AlCu4Mg Alloy by PECVD Technique</title><author>Polzer, Ales ; Sedlak, Josef ; Sedlacek, Jan ; Benes, Libor ; Mouralova, Katerina</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c313t-3ab0724003b88fc2bf5f3f26f1ff558344816a43901042dd2953ea9e9dd7f30c3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2021</creationdate><topic>Aluminum alloys</topic><topic>Aluminum base alloys</topic><topic>Atomic force microscopes</topic><topic>Atomic force microscopy</topic><topic>Carbon</topic><topic>Chemical bonds</topic><topic>Chemical vapor deposition</topic><topic>Design factors</topic><topic>Design of experiments</topic><topic>Graphene</topic><topic>Mechanical properties</topic><topic>Morphology</topic><topic>Nanomaterials</topic><topic>Packaging industry</topic><topic>Plasma</topic><topic>Plasma enhanced chemical vapor deposition</topic><topic>Raman spectroscopy</topic><topic>Spectrum analysis</topic><topic>Temperature effects</topic><topic>Tensile strength</topic><topic>Thickness</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Polzer, Ales</creatorcontrib><creatorcontrib>Sedlak, Josef</creatorcontrib><creatorcontrib>Sedlacek, Jan</creatorcontrib><creatorcontrib>Benes, Libor</creatorcontrib><creatorcontrib>Mouralova, Katerina</creatorcontrib><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>ProQuest SciTech Collection</collection><collection>ProQuest Technology Collection</collection><collection>Materials Science & Engineering Collection</collection><collection>ProQuest Central (Alumni Edition)</collection><collection>ProQuest Central UK/Ireland</collection><collection>ProQuest Central Essentials</collection><collection>ProQuest Central</collection><collection>Technology Collection</collection><collection>ProQuest One Community College</collection><collection>ProQuest Materials Science Collection</collection><collection>ProQuest Central Korea</collection><collection>SciTech Premium Collection</collection><collection>Materials Research Database</collection><collection>Materials Science Database</collection><collection>Materials Science Collection</collection><collection>Publicly Available Content Database</collection><collection>ProQuest One Academic Eastern Edition (DO NOT USE)</collection><collection>ProQuest One Academic</collection><collection>ProQuest One Academic UKI Edition</collection><collection>ProQuest Central China</collection><jtitle>Coatings (Basel)</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Polzer, Ales</au><au>Sedlak, Josef</au><au>Sedlacek, Jan</au><au>Benes, Libor</au><au>Mouralova, Katerina</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Vertical Graphene Growth on AlCu4Mg Alloy by PECVD Technique</atitle><jtitle>Coatings (Basel)</jtitle><date>2021-09-01</date><risdate>2021</risdate><volume>11</volume><issue>9</issue><spage>1108</spage><pages>1108-</pages><issn>2079-6412</issn><eissn>2079-6412</eissn><abstract>Vertical graphene, which belongs to nanomaterials, is a very promising tool for improving the useful properties of long-used and proven materials. Since the growth of vertical graphene is different on each base material and has specific deposition setting parameters, it is necessary to examine each base material separately. For this reason, a full factor design of experiment was performed with 26 = 64 rounds, which contained additional 5 central points, i.e., a total of 69 rounds of individual experiments, which was to examine the effect of input factors Temperature, Pressure, Flow, CH4, Plasma Power, and Annealing in H2 on the growth of vertical graphene on aluminum alloy AlCu4Mg. The deposition was performed using plasma-enhanced chemical vapor deposition (PECVD) technology. Mainly, the occurrence of graphene was analyzed, which was confirmed by Raman spectroscopy, as well as its thickness. The characterization was performed using electron and transmission microscopy, including an atomic force microscope. It was found that the growth of graphene occurred in 7 cases and its thickness is affected only by the interaction flow (sccm) × pretreatment H2 (sccm).</abstract><cop>Basel</cop><pub>MDPI AG</pub><doi>10.3390/coatings11091108</doi><orcidid>https://orcid.org/0000-0002-6025-2520</orcidid><orcidid>https://orcid.org/0000-0001-8124-803X</orcidid><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 2079-6412 |
| ispartof | Coatings (Basel), 2021-09, Vol.11 (9), p.1108 |
| issn | 2079-6412 2079-6412 |
| language | eng |
| recordid | cdi_proquest_journals_2576387867 |
| source | MDPI - Multidisciplinary Digital Publishing Institute; Elektronische Zeitschriftenbibliothek - Frei zugängliche E-Journals; Alma/SFX Local Collection |
| subjects | Aluminum alloys Aluminum base alloys Atomic force microscopes Atomic force microscopy Carbon Chemical bonds Chemical vapor deposition Design factors Design of experiments Graphene Mechanical properties Morphology Nanomaterials Packaging industry Plasma Plasma enhanced chemical vapor deposition Raman spectroscopy Spectrum analysis Temperature effects Tensile strength Thickness |
| title | Vertical Graphene Growth on AlCu4Mg Alloy by PECVD Technique |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-08T09%3A41%3A46IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Vertical%20Graphene%20Growth%20on%20AlCu4Mg%20Alloy%20by%20PECVD%20Technique&rft.jtitle=Coatings%20(Basel)&rft.au=Polzer,%20Ales&rft.date=2021-09-01&rft.volume=11&rft.issue=9&rft.spage=1108&rft.pages=1108-&rft.issn=2079-6412&rft.eissn=2079-6412&rft_id=info:doi/10.3390/coatings11091108&rft_dat=%3Cproquest_cross%3E2576387867%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=2576387867&rft_id=info:pmid/&rfr_iscdi=true |