Design and Fabrication of PTFE Substrate Integrated Waveguide Coupler by SR Direct Etching

The microfabrication technique based on synchrotron radiation (SR) direct etching process has recently been applied to construct PTFE microstructures. This paper proposes a PTFE substrate integrated waveguide (PTFE SIW). It is expected that the PTFE SIW contributes to the improvement of the structur...

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Veröffentlicht in:IEICE Transactions on Electronics 2021/09/01, Vol.E104.C(9), pp.446-454
Hauptverfasser: KISHIHARA, Mitsuyoshi, TAKEUCHI, Masaya, YAMAGUCHI, Akinobu, UTSUMI, Yuichi, OHTA, Isao
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container_end_page 454
container_issue 9
container_start_page 446
container_title IEICE Transactions on Electronics
container_volume E104.C
creator KISHIHARA, Mitsuyoshi
TAKEUCHI, Masaya
YAMAGUCHI, Akinobu
UTSUMI, Yuichi
OHTA, Isao
description The microfabrication technique based on synchrotron radiation (SR) direct etching process has recently been applied to construct PTFE microstructures. This paper proposes a PTFE substrate integrated waveguide (PTFE SIW). It is expected that the PTFE SIW contributes to the improvement of the structural strength. A rectangular through-hole is introduced taking the advantage of the SR direct etching process. First, a PTFE SIW for the Q-band is designed. Then, a cruciform 3-dB directional coupler consisting of the PTFE SIW is designed and fabricated by the SR direct etching process. The validity of the PTFE SIW coupler is confirmed by measuring the frequency characteristics of the S-parameters. The mechanical strength of the PTFE SIW and the peeling strength of its Au film are also additionally investigated.
doi_str_mv 10.1587/transele.2020ECP5043
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subjects couplers
dielectric loaded waveguides
Directional couplers
Etching
microstructure
millimeter wave circuits
Polytetrafluoroethylene
Structural strength
Substrate integrated waveguides
Synchrotron radiation
Synchrotrons
X-ray lithography
title Design and Fabrication of PTFE Substrate Integrated Waveguide Coupler by SR Direct Etching
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