Effect of growth technological conditions on the heterointerface thickness in the InAs/GaSb strained-layer superlattices grown by MOCVD

In this article, we investigated the effect of technological growth parameters by metal-organic chemical vapor deposition (MOCVD) method on the thickness of the transition layers, which affect the value of tensile strain in the structure, in the InAs/GaSb superlattice. We consider that the thickness...

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Veröffentlicht in:Journal of physics. Conference series 2019-11, Vol.1400 (5), p.55024
Hauptverfasser: Fedorov, I V, Prasolov, N D, Levin, R V, Nevedomsky, V N, Gordeeva, A B, Pushnyi, B V
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Sprache:eng
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