Effects of Oxygen Concentration in Monocrystalline Silicon on Reverse Leakage Current of PIN Rectifier Diodes

The effects of initial oxygen concentration on the reverse leakage current of PIN rectifier diodes were studied. We fabricated the PIN rectifier diodes with different initial oxygen concentrations, and analyzed the electrical properties, anisotropic preferred etching by means of optical microscopy,...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Journal of Wuhan University of Technology. Materials science edition 2021-08, Vol.36 (4), p.472-477
Hauptverfasser: Sun, Xinli, Guo, Hui, Zhang, Yuming, Guo, Bingjian, Li, Xingpeng, Cao, Zhen
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 477
container_issue 4
container_start_page 472
container_title Journal of Wuhan University of Technology. Materials science edition
container_volume 36
creator Sun, Xinli
Guo, Hui
Zhang, Yuming
Guo, Bingjian
Li, Xingpeng
Cao, Zhen
description The effects of initial oxygen concentration on the reverse leakage current of PIN rectifier diodes were studied. We fabricated the PIN rectifier diodes with different initial oxygen concentrations, and analyzed the electrical properties, anisotropic preferred etching by means of optical microscopy, Fourier transform infrared spectroscopy and transmission electron microscopy. It is pointed out that the reverse leakage current increases exponentially with the increasing initial oxygen concentration. Furtherly, we researched and analyzed the mechanism of the effects of initial oxygen concentration on the reverse leakage current of PIN rectifier diode. It is shown that the oxygen precipitations present in an “S” curve with increasing initial oxygen concentration after high temperature diffusion. The main reason is that the nucleation and growth of oxygen precipitation at high temperature induce bulk oxidation-induced defects (B-OSF), which are mainly dislocations, and a small amount of rod stacking faults. The density of B-OSF increases with the increasing initial oxygen concentration. The existence of B-OSF has great effects on the reverse leakage current of PIN rectifier diode.
doi_str_mv 10.1007/s11595-021-2432-8
format Article
fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_journals_2566054026</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>2566054026</sourcerecordid><originalsourceid>FETCH-LOGICAL-c268t-cc29e410fd61353f93ae246a754566d631fd632596b210ffaa29478c0125b65a3</originalsourceid><addsrcrecordid>eNp1kFtLAzEQhYMoWKs_wLeAz6u5bLK7j7LeCtWKl-eQppOSuk1qshX7701ZwSdhYAa-c87AQeickktKSHWVKBWNKAijBSs5K-oDNKJNwwtS8uow34SQTCg_RicprQgpCZdyhNa31oLpEw4Wz753S_C4Dd6A76PuXfDYefwYfDBxl3rddc4DfnWdMxnleYEviAnwFPSHXgJutzFm7z7tefKUsemddRDxjQsLSKfoyOouwdnvHqP3u9u39qGYzu4n7fW0MEzWfWEMa6CkxC4k5YLbhmtgpdSVKIWUC8lpJpyJRs5ZVlmtWVNWtSGUibkUmo_RxZC7ieFzC6lXq7CNPr9ULCcQURIms4oOKhNDShGs2kS31nGnKFH7VtXQqsqtqn2rqs4eNnhS1volxL_k_00_dK15oQ</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2566054026</pqid></control><display><type>article</type><title>Effects of Oxygen Concentration in Monocrystalline Silicon on Reverse Leakage Current of PIN Rectifier Diodes</title><source>Alma/SFX Local Collection</source><source>SpringerLink Journals - AutoHoldings</source><creator>Sun, Xinli ; Guo, Hui ; Zhang, Yuming ; Guo, Bingjian ; Li, Xingpeng ; Cao, Zhen</creator><creatorcontrib>Sun, Xinli ; Guo, Hui ; Zhang, Yuming ; Guo, Bingjian ; Li, Xingpeng ; Cao, Zhen</creatorcontrib><description>The effects of initial oxygen concentration on the reverse leakage current of PIN rectifier diodes were studied. We fabricated the PIN rectifier diodes with different initial oxygen concentrations, and analyzed the electrical properties, anisotropic preferred etching by means of optical microscopy, Fourier transform infrared spectroscopy and transmission electron microscopy. It is pointed out that the reverse leakage current increases exponentially with the increasing initial oxygen concentration. Furtherly, we researched and analyzed the mechanism of the effects of initial oxygen concentration on the reverse leakage current of PIN rectifier diode. It is shown that the oxygen precipitations present in an “S” curve with increasing initial oxygen concentration after high temperature diffusion. The main reason is that the nucleation and growth of oxygen precipitation at high temperature induce bulk oxidation-induced defects (B-OSF), which are mainly dislocations, and a small amount of rod stacking faults. The density of B-OSF increases with the increasing initial oxygen concentration. The existence of B-OSF has great effects on the reverse leakage current of PIN rectifier diode.</description><identifier>ISSN: 1000-2413</identifier><identifier>EISSN: 1993-0437</identifier><identifier>DOI: 10.1007/s11595-021-2432-8</identifier><language>eng</language><publisher>Wuhan: Wuhan University of Technology</publisher><subject>Advanced Materials ; Chemistry and Materials Science ; Diodes ; Electrical properties ; Fourier transforms ; High temperature ; Leakage current ; Materials Science ; Microscopy ; Nucleation ; Optical microscopy ; Optical properties ; Oxidation ; Oxygen ; Rectifiers ; Stacking faults</subject><ispartof>Journal of Wuhan University of Technology. Materials science edition, 2021-08, Vol.36 (4), p.472-477</ispartof><rights>Wuhan University of Technology and Springer-Verlag GmbH Germany, Part of Springer Nature 2021</rights><rights>Wuhan University of Technology and Springer-Verlag GmbH Germany, Part of Springer Nature 2021.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><cites>FETCH-LOGICAL-c268t-cc29e410fd61353f93ae246a754566d631fd632596b210ffaa29478c0125b65a3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://link.springer.com/content/pdf/10.1007/s11595-021-2432-8$$EPDF$$P50$$Gspringer$$H</linktopdf><linktohtml>$$Uhttps://link.springer.com/10.1007/s11595-021-2432-8$$EHTML$$P50$$Gspringer$$H</linktohtml><link.rule.ids>314,776,780,27903,27904,41467,42536,51297</link.rule.ids></links><search><creatorcontrib>Sun, Xinli</creatorcontrib><creatorcontrib>Guo, Hui</creatorcontrib><creatorcontrib>Zhang, Yuming</creatorcontrib><creatorcontrib>Guo, Bingjian</creatorcontrib><creatorcontrib>Li, Xingpeng</creatorcontrib><creatorcontrib>Cao, Zhen</creatorcontrib><title>Effects of Oxygen Concentration in Monocrystalline Silicon on Reverse Leakage Current of PIN Rectifier Diodes</title><title>Journal of Wuhan University of Technology. Materials science edition</title><addtitle>J. Wuhan Univ. Technol.-Mat. Sci. Edit</addtitle><description>The effects of initial oxygen concentration on the reverse leakage current of PIN rectifier diodes were studied. We fabricated the PIN rectifier diodes with different initial oxygen concentrations, and analyzed the electrical properties, anisotropic preferred etching by means of optical microscopy, Fourier transform infrared spectroscopy and transmission electron microscopy. It is pointed out that the reverse leakage current increases exponentially with the increasing initial oxygen concentration. Furtherly, we researched and analyzed the mechanism of the effects of initial oxygen concentration on the reverse leakage current of PIN rectifier diode. It is shown that the oxygen precipitations present in an “S” curve with increasing initial oxygen concentration after high temperature diffusion. The main reason is that the nucleation and growth of oxygen precipitation at high temperature induce bulk oxidation-induced defects (B-OSF), which are mainly dislocations, and a small amount of rod stacking faults. The density of B-OSF increases with the increasing initial oxygen concentration. The existence of B-OSF has great effects on the reverse leakage current of PIN rectifier diode.</description><subject>Advanced Materials</subject><subject>Chemistry and Materials Science</subject><subject>Diodes</subject><subject>Electrical properties</subject><subject>Fourier transforms</subject><subject>High temperature</subject><subject>Leakage current</subject><subject>Materials Science</subject><subject>Microscopy</subject><subject>Nucleation</subject><subject>Optical microscopy</subject><subject>Optical properties</subject><subject>Oxidation</subject><subject>Oxygen</subject><subject>Rectifiers</subject><subject>Stacking faults</subject><issn>1000-2413</issn><issn>1993-0437</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2021</creationdate><recordtype>article</recordtype><recordid>eNp1kFtLAzEQhYMoWKs_wLeAz6u5bLK7j7LeCtWKl-eQppOSuk1qshX7701ZwSdhYAa-c87AQeickktKSHWVKBWNKAijBSs5K-oDNKJNwwtS8uow34SQTCg_RicprQgpCZdyhNa31oLpEw4Wz753S_C4Dd6A76PuXfDYefwYfDBxl3rddc4DfnWdMxnleYEviAnwFPSHXgJutzFm7z7tefKUsemddRDxjQsLSKfoyOouwdnvHqP3u9u39qGYzu4n7fW0MEzWfWEMa6CkxC4k5YLbhmtgpdSVKIWUC8lpJpyJRs5ZVlmtWVNWtSGUibkUmo_RxZC7ieFzC6lXq7CNPr9ULCcQURIms4oOKhNDShGs2kS31nGnKFH7VtXQqsqtqn2rqs4eNnhS1volxL_k_00_dK15oQ</recordid><startdate>20210801</startdate><enddate>20210801</enddate><creator>Sun, Xinli</creator><creator>Guo, Hui</creator><creator>Zhang, Yuming</creator><creator>Guo, Bingjian</creator><creator>Li, Xingpeng</creator><creator>Cao, Zhen</creator><general>Wuhan University of Technology</general><general>Springer Nature B.V</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>20210801</creationdate><title>Effects of Oxygen Concentration in Monocrystalline Silicon on Reverse Leakage Current of PIN Rectifier Diodes</title><author>Sun, Xinli ; Guo, Hui ; Zhang, Yuming ; Guo, Bingjian ; Li, Xingpeng ; Cao, Zhen</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c268t-cc29e410fd61353f93ae246a754566d631fd632596b210ffaa29478c0125b65a3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2021</creationdate><topic>Advanced Materials</topic><topic>Chemistry and Materials Science</topic><topic>Diodes</topic><topic>Electrical properties</topic><topic>Fourier transforms</topic><topic>High temperature</topic><topic>Leakage current</topic><topic>Materials Science</topic><topic>Microscopy</topic><topic>Nucleation</topic><topic>Optical microscopy</topic><topic>Optical properties</topic><topic>Oxidation</topic><topic>Oxygen</topic><topic>Rectifiers</topic><topic>Stacking faults</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Sun, Xinli</creatorcontrib><creatorcontrib>Guo, Hui</creatorcontrib><creatorcontrib>Zhang, Yuming</creatorcontrib><creatorcontrib>Guo, Bingjian</creatorcontrib><creatorcontrib>Li, Xingpeng</creatorcontrib><creatorcontrib>Cao, Zhen</creatorcontrib><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Journal of Wuhan University of Technology. Materials science edition</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Sun, Xinli</au><au>Guo, Hui</au><au>Zhang, Yuming</au><au>Guo, Bingjian</au><au>Li, Xingpeng</au><au>Cao, Zhen</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Effects of Oxygen Concentration in Monocrystalline Silicon on Reverse Leakage Current of PIN Rectifier Diodes</atitle><jtitle>Journal of Wuhan University of Technology. Materials science edition</jtitle><stitle>J. Wuhan Univ. Technol.-Mat. Sci. Edit</stitle><date>2021-08-01</date><risdate>2021</risdate><volume>36</volume><issue>4</issue><spage>472</spage><epage>477</epage><pages>472-477</pages><issn>1000-2413</issn><eissn>1993-0437</eissn><abstract>The effects of initial oxygen concentration on the reverse leakage current of PIN rectifier diodes were studied. We fabricated the PIN rectifier diodes with different initial oxygen concentrations, and analyzed the electrical properties, anisotropic preferred etching by means of optical microscopy, Fourier transform infrared spectroscopy and transmission electron microscopy. It is pointed out that the reverse leakage current increases exponentially with the increasing initial oxygen concentration. Furtherly, we researched and analyzed the mechanism of the effects of initial oxygen concentration on the reverse leakage current of PIN rectifier diode. It is shown that the oxygen precipitations present in an “S” curve with increasing initial oxygen concentration after high temperature diffusion. The main reason is that the nucleation and growth of oxygen precipitation at high temperature induce bulk oxidation-induced defects (B-OSF), which are mainly dislocations, and a small amount of rod stacking faults. The density of B-OSF increases with the increasing initial oxygen concentration. The existence of B-OSF has great effects on the reverse leakage current of PIN rectifier diode.</abstract><cop>Wuhan</cop><pub>Wuhan University of Technology</pub><doi>10.1007/s11595-021-2432-8</doi><tpages>6</tpages></addata></record>
fulltext fulltext
identifier ISSN: 1000-2413
ispartof Journal of Wuhan University of Technology. Materials science edition, 2021-08, Vol.36 (4), p.472-477
issn 1000-2413
1993-0437
language eng
recordid cdi_proquest_journals_2566054026
source Alma/SFX Local Collection; SpringerLink Journals - AutoHoldings
subjects Advanced Materials
Chemistry and Materials Science
Diodes
Electrical properties
Fourier transforms
High temperature
Leakage current
Materials Science
Microscopy
Nucleation
Optical microscopy
Optical properties
Oxidation
Oxygen
Rectifiers
Stacking faults
title Effects of Oxygen Concentration in Monocrystalline Silicon on Reverse Leakage Current of PIN Rectifier Diodes
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-26T14%3A07%3A18IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Effects%20of%20Oxygen%20Concentration%20in%20Monocrystalline%20Silicon%20on%20Reverse%20Leakage%20Current%20of%20PIN%20Rectifier%20Diodes&rft.jtitle=Journal%20of%20Wuhan%20University%20of%20Technology.%20Materials%20science%20edition&rft.au=Sun,%20Xinli&rft.date=2021-08-01&rft.volume=36&rft.issue=4&rft.spage=472&rft.epage=477&rft.pages=472-477&rft.issn=1000-2413&rft.eissn=1993-0437&rft_id=info:doi/10.1007/s11595-021-2432-8&rft_dat=%3Cproquest_cross%3E2566054026%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=2566054026&rft_id=info:pmid/&rfr_iscdi=true