Computation of Impurity Effects on Argon Pinch Soft X-Ray Emission Using the Nonrelativistic 4-D Vlasov-Maxwell Approach
In this article, the Vlasov-Maxwell equations have been integrated by the forward semi-Lagrangian method to compute the soft X-ray (SXR) emission from a dense plasma focus device filled with pure and impure argon. The impurity has been assumed as copper of which the electrodes were made. The results...
Gespeichert in:
| Veröffentlicht in: | IEEE transactions on plasma science 2021-08, Vol.49 (8), p.2311-2317 |
|---|---|
| Hauptverfasser: | , |
| Format: | Artikel |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | 2317 |
|---|---|
| container_issue | 8 |
| container_start_page | 2311 |
| container_title | IEEE transactions on plasma science |
| container_volume | 49 |
| creator | Barati, Hadi Habibi, Morteza |
| description | In this article, the Vlasov-Maxwell equations have been integrated by the forward semi-Lagrangian method to compute the soft X-ray (SXR) emission from a dense plasma focus device filled with pure and impure argon. The impurity has been assumed as copper of which the electrodes were made. The results have shown that, in the case of pure argon, the emission power reached up to 3.5 \times 10^{9}{\mathrm {W}} . However, for the impurity with a 10% volumetric fraction and with the effective charge number of 10, the emission power reduced to 4\times 10^{5}{\mathrm {W}} . With the further increase in the impurity amount, the emission power reduced again. However, if the impurity charge number is close to the pure gas charge number, the attenuation of the SXR emission decreases. |
| doi_str_mv | 10.1109/TPS.2021.3093634 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_RIE</sourceid><recordid>TN_cdi_proquest_journals_2560130931</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>9478943</ieee_id><sourcerecordid>2560130931</sourcerecordid><originalsourceid>FETCH-LOGICAL-c291t-e5c3c232bdc3affb79cab8fc65815bbd23e16ad0bc99909ff6b6b4ef37bd481c3</originalsourceid><addsrcrecordid>eNo9kEtPAjEUhRujiYjuTdw0cT3YTufVJcEXCSoRMO4mbaeFkmE6tgXh39sJxM29uSfn3JN8ANxiNMAY0Yf5dDaIUYwHBFGSkeQM9DAlNKIkT89BDwU1IgUml-DKuTVCOElR3AP7kdm0W8-8Ng00Co7DZbU_wCelpPAOBnlol2FOdSNWcGaUh9_RJwuOjXauiy2cbpbQryR8N42VdXi2085rAZPoEX7VzJld9Mb2v7Ku4bBtrWFidQ0uFKudvDntPlg8P81Hr9Hk42U8Gk4iEVPsI5kKImIS80oQphTPqWC8UCJLC5xyXsVE4oxViAtKKaJKZTzjiVQk51VSYEH64P74N9T-bKXz5dpsbRMqyzjNEO5w4eBCR5ewxjkrVdlavWH2UGJUdnzLwLfs-JYnviFyd4xoKeW_nSZ5QRNC_gD9SHha</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2560130931</pqid></control><display><type>article</type><title>Computation of Impurity Effects on Argon Pinch Soft X-Ray Emission Using the Nonrelativistic 4-D Vlasov-Maxwell Approach</title><source>IEEE Electronic Library (IEL)</source><creator>Barati, Hadi ; Habibi, Morteza</creator><creatorcontrib>Barati, Hadi ; Habibi, Morteza</creatorcontrib><description><![CDATA[In this article, the Vlasov-Maxwell equations have been integrated by the forward semi-Lagrangian method to compute the soft X-ray (SXR) emission from a dense plasma focus device filled with pure and impure argon. The impurity has been assumed as copper of which the electrodes were made. The results have shown that, in the case of pure argon, the emission power reached up to <inline-formula> <tex-math notation="LaTeX">3.5 \times 10^{9}{\mathrm {W}} </tex-math></inline-formula>. However, for the impurity with a 10% volumetric fraction and with the effective charge number of 10, the emission power reduced to <inline-formula> <tex-math notation="LaTeX">4\times 10^{5}{\mathrm {W}} </tex-math></inline-formula>. With the further increase in the impurity amount, the emission power reduced again. However, if the impurity charge number is close to the pure gas charge number, the attenuation of the SXR emission decreases.]]></description><identifier>ISSN: 0093-3813</identifier><identifier>EISSN: 1939-9375</identifier><identifier>DOI: 10.1109/TPS.2021.3093634</identifier><identifier>CODEN: ITPSBD</identifier><language>eng</language><publisher>New York: IEEE</publisher><subject>Anodes ; Argon ; Attenuation ; dense plasma focus (DPF) ; Dense plasmas ; Distribution functions ; Emissions control ; Focus devices ; forward semi-Lagrangian (FSL) ; Impurities ; impurity ; Impurity effects ; Ions ; Mathematical model ; Maxwell's equations ; pinch ; Plasma focus ; Plasmas ; Soft x rays ; soft X-ray (SXR) ; Vlasov–Maxwell (VM)</subject><ispartof>IEEE transactions on plasma science, 2021-08, Vol.49 (8), p.2311-2317</ispartof><rights>Copyright The Institute of Electrical and Electronics Engineers, Inc. (IEEE) 2021</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c291t-e5c3c232bdc3affb79cab8fc65815bbd23e16ad0bc99909ff6b6b4ef37bd481c3</citedby><cites>FETCH-LOGICAL-c291t-e5c3c232bdc3affb79cab8fc65815bbd23e16ad0bc99909ff6b6b4ef37bd481c3</cites><orcidid>0000-0001-8091-0917 ; 0000-0002-8212-3658</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/9478943$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,780,784,796,27924,27925,54758</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/9478943$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Barati, Hadi</creatorcontrib><creatorcontrib>Habibi, Morteza</creatorcontrib><title>Computation of Impurity Effects on Argon Pinch Soft X-Ray Emission Using the Nonrelativistic 4-D Vlasov-Maxwell Approach</title><title>IEEE transactions on plasma science</title><addtitle>TPS</addtitle><description><![CDATA[In this article, the Vlasov-Maxwell equations have been integrated by the forward semi-Lagrangian method to compute the soft X-ray (SXR) emission from a dense plasma focus device filled with pure and impure argon. The impurity has been assumed as copper of which the electrodes were made. The results have shown that, in the case of pure argon, the emission power reached up to <inline-formula> <tex-math notation="LaTeX">3.5 \times 10^{9}{\mathrm {W}} </tex-math></inline-formula>. However, for the impurity with a 10% volumetric fraction and with the effective charge number of 10, the emission power reduced to <inline-formula> <tex-math notation="LaTeX">4\times 10^{5}{\mathrm {W}} </tex-math></inline-formula>. With the further increase in the impurity amount, the emission power reduced again. However, if the impurity charge number is close to the pure gas charge number, the attenuation of the SXR emission decreases.]]></description><subject>Anodes</subject><subject>Argon</subject><subject>Attenuation</subject><subject>dense plasma focus (DPF)</subject><subject>Dense plasmas</subject><subject>Distribution functions</subject><subject>Emissions control</subject><subject>Focus devices</subject><subject>forward semi-Lagrangian (FSL)</subject><subject>Impurities</subject><subject>impurity</subject><subject>Impurity effects</subject><subject>Ions</subject><subject>Mathematical model</subject><subject>Maxwell's equations</subject><subject>pinch</subject><subject>Plasma focus</subject><subject>Plasmas</subject><subject>Soft x rays</subject><subject>soft X-ray (SXR)</subject><subject>Vlasov–Maxwell (VM)</subject><issn>0093-3813</issn><issn>1939-9375</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2021</creationdate><recordtype>article</recordtype><sourceid>RIE</sourceid><recordid>eNo9kEtPAjEUhRujiYjuTdw0cT3YTufVJcEXCSoRMO4mbaeFkmE6tgXh39sJxM29uSfn3JN8ANxiNMAY0Yf5dDaIUYwHBFGSkeQM9DAlNKIkT89BDwU1IgUml-DKuTVCOElR3AP7kdm0W8-8Ng00Co7DZbU_wCelpPAOBnlol2FOdSNWcGaUh9_RJwuOjXauiy2cbpbQryR8N42VdXi2085rAZPoEX7VzJld9Mb2v7Ku4bBtrWFidQ0uFKudvDntPlg8P81Hr9Hk42U8Gk4iEVPsI5kKImIS80oQphTPqWC8UCJLC5xyXsVE4oxViAtKKaJKZTzjiVQk51VSYEH64P74N9T-bKXz5dpsbRMqyzjNEO5w4eBCR5ewxjkrVdlavWH2UGJUdnzLwLfs-JYnviFyd4xoKeW_nSZ5QRNC_gD9SHha</recordid><startdate>20210801</startdate><enddate>20210801</enddate><creator>Barati, Hadi</creator><creator>Habibi, Morteza</creator><general>IEEE</general><general>The Institute of Electrical and Electronics Engineers, Inc. (IEEE)</general><scope>97E</scope><scope>RIA</scope><scope>RIE</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7U5</scope><scope>8FD</scope><scope>L7M</scope><orcidid>https://orcid.org/0000-0001-8091-0917</orcidid><orcidid>https://orcid.org/0000-0002-8212-3658</orcidid></search><sort><creationdate>20210801</creationdate><title>Computation of Impurity Effects on Argon Pinch Soft X-Ray Emission Using the Nonrelativistic 4-D Vlasov-Maxwell Approach</title><author>Barati, Hadi ; Habibi, Morteza</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c291t-e5c3c232bdc3affb79cab8fc65815bbd23e16ad0bc99909ff6b6b4ef37bd481c3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2021</creationdate><topic>Anodes</topic><topic>Argon</topic><topic>Attenuation</topic><topic>dense plasma focus (DPF)</topic><topic>Dense plasmas</topic><topic>Distribution functions</topic><topic>Emissions control</topic><topic>Focus devices</topic><topic>forward semi-Lagrangian (FSL)</topic><topic>Impurities</topic><topic>impurity</topic><topic>Impurity effects</topic><topic>Ions</topic><topic>Mathematical model</topic><topic>Maxwell's equations</topic><topic>pinch</topic><topic>Plasma focus</topic><topic>Plasmas</topic><topic>Soft x rays</topic><topic>soft X-ray (SXR)</topic><topic>Vlasov–Maxwell (VM)</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Barati, Hadi</creatorcontrib><creatorcontrib>Habibi, Morteza</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 2005-present</collection><collection>IEEE All-Society Periodicals Package (ASPP) 1998-Present</collection><collection>IEEE Electronic Library (IEL)</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>IEEE transactions on plasma science</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Barati, Hadi</au><au>Habibi, Morteza</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Computation of Impurity Effects on Argon Pinch Soft X-Ray Emission Using the Nonrelativistic 4-D Vlasov-Maxwell Approach</atitle><jtitle>IEEE transactions on plasma science</jtitle><stitle>TPS</stitle><date>2021-08-01</date><risdate>2021</risdate><volume>49</volume><issue>8</issue><spage>2311</spage><epage>2317</epage><pages>2311-2317</pages><issn>0093-3813</issn><eissn>1939-9375</eissn><coden>ITPSBD</coden><abstract><![CDATA[In this article, the Vlasov-Maxwell equations have been integrated by the forward semi-Lagrangian method to compute the soft X-ray (SXR) emission from a dense plasma focus device filled with pure and impure argon. The impurity has been assumed as copper of which the electrodes were made. The results have shown that, in the case of pure argon, the emission power reached up to <inline-formula> <tex-math notation="LaTeX">3.5 \times 10^{9}{\mathrm {W}} </tex-math></inline-formula>. However, for the impurity with a 10% volumetric fraction and with the effective charge number of 10, the emission power reduced to <inline-formula> <tex-math notation="LaTeX">4\times 10^{5}{\mathrm {W}} </tex-math></inline-formula>. With the further increase in the impurity amount, the emission power reduced again. However, if the impurity charge number is close to the pure gas charge number, the attenuation of the SXR emission decreases.]]></abstract><cop>New York</cop><pub>IEEE</pub><doi>10.1109/TPS.2021.3093634</doi><tpages>7</tpages><orcidid>https://orcid.org/0000-0001-8091-0917</orcidid><orcidid>https://orcid.org/0000-0002-8212-3658</orcidid></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | ISSN: 0093-3813 |
| ispartof | IEEE transactions on plasma science, 2021-08, Vol.49 (8), p.2311-2317 |
| issn | 0093-3813 1939-9375 |
| language | eng |
| recordid | cdi_proquest_journals_2560130931 |
| source | IEEE Electronic Library (IEL) |
| subjects | Anodes Argon Attenuation dense plasma focus (DPF) Dense plasmas Distribution functions Emissions control Focus devices forward semi-Lagrangian (FSL) Impurities impurity Impurity effects Ions Mathematical model Maxwell's equations pinch Plasma focus Plasmas Soft x rays soft X-ray (SXR) Vlasov–Maxwell (VM) |
| title | Computation of Impurity Effects on Argon Pinch Soft X-Ray Emission Using the Nonrelativistic 4-D Vlasov-Maxwell Approach |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-04T07%3A55%3A08IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_RIE&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Computation%20of%20Impurity%20Effects%20on%20Argon%20Pinch%20Soft%20X-Ray%20Emission%20Using%20the%20Nonrelativistic%204-D%20Vlasov-Maxwell%20Approach&rft.jtitle=IEEE%20transactions%20on%20plasma%20science&rft.au=Barati,%20Hadi&rft.date=2021-08-01&rft.volume=49&rft.issue=8&rft.spage=2311&rft.epage=2317&rft.pages=2311-2317&rft.issn=0093-3813&rft.eissn=1939-9375&rft.coden=ITPSBD&rft_id=info:doi/10.1109/TPS.2021.3093634&rft_dat=%3Cproquest_RIE%3E2560130931%3C/proquest_RIE%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=2560130931&rft_id=info:pmid/&rft_ieee_id=9478943&rfr_iscdi=true |