Characterization of ZnO Films Grown by Chemical Vapor Deposition as Active Layer in Pseudo-MOSFET
The characterization of zinc oxide (ZnO) films, developed by a home-built chemical vapor deposition (CVD) system, working as an active layer for a n -channel depletion mode pseudo-metal-oxide-semiconductor field-effect transistor (MOSFET) is reported. A factorial experimental design was applied to a...
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| Veröffentlicht in: | Journal of electronic materials 2021-09, Vol.50 (9), p.5196-5208 |
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| creator | Ramos-Carrazco, A. Gallardo-Cubedo, J. A. Vera-Marquina, A. Leal-Cruz, A. L. Noriega, J. R. Zuñiga-Islas, C. Rojas-Hernández, A. G. Gomez-Fuentes, R. Berman-Mendoza, D. |
| description | The characterization of zinc oxide (ZnO) films, developed by a home-built chemical vapor deposition (CVD) system, working as an active layer for a
n
-channel depletion mode pseudo-metal-oxide-semiconductor field-effect transistor (MOSFET) is reported. A factorial experimental design was applied to analyze the behavior of the structural, optical, and morphological properties of the ZnO semiconductor. To study the behavior of the assembled equipment, the main parameters of substrate temperature, oxygen flow, and chamber pressure were varied at two levels. The ZnO films were studied by means of the characterization techniques of scanning electron microscopy (SEM), x-ray diffraction (XRD), Raman spectroscopy, photoluminescence, and cathodoluminescence. SEM images showed that the submicrometric ZnO morphologies were obtained from the interaction of the three growth parameters. XRD analysis exhibited an hexagonal wurtzite structure without the presence of other crystalline phases. The Raman response was analyzed according to the dependence of the oxygen flow, temperature, and growth pressure. The emission obtained under ultraviolet laser excitation showed two strong emissions, at 487 nm and 514 nm. In comparison, cathodoluminescence spectra of the ZnO samples exhibited a dominant transition centered at 380 nm. According to the results of the factorial design, one ZnO sample was selected as the active layer for the development of a pseudo-field effect transistor. The transfer and output characteristics of the device were used to study the threshold voltage, carrier mobility, and transconductance behavior. As a result, this work provides an alternative pathway to the fabrication of a
n
-channel depletion mode ZnO pseudo-transistor using a low-cost and home-built CVD system. |
| doi_str_mv | 10.1007/s11664-021-09038-9 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_journals_2557305157</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>2557305157</sourcerecordid><originalsourceid>FETCH-LOGICAL-c319t-f8a8bea13fe630482cfeae6efec03caa477e4a38769f259d627cd36f5cc11af53</originalsourceid><addsrcrecordid>eNp9kE1LAzEQhoMoWKt_wFPAczSz2WR3j1K1CpUKfiBewjSd6Eq7qclWqb_e1RW8eZmB4XnfgYexQ5DHIGVxkgCMyYXMQMhKqlJUW2wAOlcCSvO4zQZSGRA6U3qX7aX0KiVoKGHAcPSCEV1Lsf7Etg4ND54_NVN-US-WiY9j-Gj4bMNHL7SsHS74A65C5Ge0Cqn-4THxU9fW78QnuKHI64bfJFrPg7ie3l6c3-2zHY-LRAe_e8juu-voUkym46vR6UQ4BVUrfInljBCUJ6NkXmbOE5IhT04qh5gXBeWoysJUPtPV3GSFmyvjtXMA6LUasqO-dxXD25pSa1_DOjbdS5tpXSipoZtDlvWUiyGlSN6uYr3EuLEg7bdK26u0nUr7o9JWXUj1odTBzTPFv-p_Ul-REHb3</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2557305157</pqid></control><display><type>article</type><title>Characterization of ZnO Films Grown by Chemical Vapor Deposition as Active Layer in Pseudo-MOSFET</title><source>Springer Nature - Complete Springer Journals</source><creator>Ramos-Carrazco, A. ; Gallardo-Cubedo, J. A. ; Vera-Marquina, A. ; Leal-Cruz, A. L. ; Noriega, J. R. ; Zuñiga-Islas, C. ; Rojas-Hernández, A. G. ; Gomez-Fuentes, R. ; Berman-Mendoza, D.</creator><creatorcontrib>Ramos-Carrazco, A. ; Gallardo-Cubedo, J. A. ; Vera-Marquina, A. ; Leal-Cruz, A. L. ; Noriega, J. R. ; Zuñiga-Islas, C. ; Rojas-Hernández, A. G. ; Gomez-Fuentes, R. ; Berman-Mendoza, D.</creatorcontrib><description>The characterization of zinc oxide (ZnO) films, developed by a home-built chemical vapor deposition (CVD) system, working as an active layer for a
n
-channel depletion mode pseudo-metal-oxide-semiconductor field-effect transistor (MOSFET) is reported. A factorial experimental design was applied to analyze the behavior of the structural, optical, and morphological properties of the ZnO semiconductor. To study the behavior of the assembled equipment, the main parameters of substrate temperature, oxygen flow, and chamber pressure were varied at two levels. The ZnO films were studied by means of the characterization techniques of scanning electron microscopy (SEM), x-ray diffraction (XRD), Raman spectroscopy, photoluminescence, and cathodoluminescence. SEM images showed that the submicrometric ZnO morphologies were obtained from the interaction of the three growth parameters. XRD analysis exhibited an hexagonal wurtzite structure without the presence of other crystalline phases. The Raman response was analyzed according to the dependence of the oxygen flow, temperature, and growth pressure. The emission obtained under ultraviolet laser excitation showed two strong emissions, at 487 nm and 514 nm. In comparison, cathodoluminescence spectra of the ZnO samples exhibited a dominant transition centered at 380 nm. According to the results of the factorial design, one ZnO sample was selected as the active layer for the development of a pseudo-field effect transistor. The transfer and output characteristics of the device were used to study the threshold voltage, carrier mobility, and transconductance behavior. As a result, this work provides an alternative pathway to the fabrication of a
n
-channel depletion mode ZnO pseudo-transistor using a low-cost and home-built CVD system.</description><identifier>ISSN: 0361-5235</identifier><identifier>EISSN: 1543-186X</identifier><identifier>DOI: 10.1007/s11664-021-09038-9</identifier><language>eng</language><publisher>New York: Springer US</publisher><subject>Carrier mobility ; Cathodoluminescence ; Characterization and Evaluation of Materials ; Chemical vapor deposition ; Chemistry and Materials Science ; Depletion ; Design of experiments ; Electronics and Microelectronics ; Factorial design ; Field effect transistors ; Instrumentation ; Materials Science ; Metal oxide semiconductors ; Morphology ; MOSFETs ; Optical and Electronic Materials ; Optical properties ; Original Research Article ; Parameters ; Photoluminescence ; Raman spectroscopy ; Scanning electron microscopy ; Semiconductor devices ; Solid State Physics ; Spectrum analysis ; Substrates ; Threshold voltage ; Transconductance ; Transistors ; Ultraviolet lasers ; Wurtzite ; X-ray diffraction ; Zinc oxide ; Zinc oxides</subject><ispartof>Journal of electronic materials, 2021-09, Vol.50 (9), p.5196-5208</ispartof><rights>The Minerals, Metals & Materials Society 2021</rights><rights>The Minerals, Metals & Materials Society 2021.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c319t-f8a8bea13fe630482cfeae6efec03caa477e4a38769f259d627cd36f5cc11af53</citedby><cites>FETCH-LOGICAL-c319t-f8a8bea13fe630482cfeae6efec03caa477e4a38769f259d627cd36f5cc11af53</cites><orcidid>0000-0002-1267-0090</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://link.springer.com/content/pdf/10.1007/s11664-021-09038-9$$EPDF$$P50$$Gspringer$$H</linktopdf><linktohtml>$$Uhttps://link.springer.com/10.1007/s11664-021-09038-9$$EHTML$$P50$$Gspringer$$H</linktohtml><link.rule.ids>314,776,780,27901,27902,41464,42533,51294</link.rule.ids></links><search><creatorcontrib>Ramos-Carrazco, A.</creatorcontrib><creatorcontrib>Gallardo-Cubedo, J. A.</creatorcontrib><creatorcontrib>Vera-Marquina, A.</creatorcontrib><creatorcontrib>Leal-Cruz, A. L.</creatorcontrib><creatorcontrib>Noriega, J. R.</creatorcontrib><creatorcontrib>Zuñiga-Islas, C.</creatorcontrib><creatorcontrib>Rojas-Hernández, A. G.</creatorcontrib><creatorcontrib>Gomez-Fuentes, R.</creatorcontrib><creatorcontrib>Berman-Mendoza, D.</creatorcontrib><title>Characterization of ZnO Films Grown by Chemical Vapor Deposition as Active Layer in Pseudo-MOSFET</title><title>Journal of electronic materials</title><addtitle>Journal of Elec Materi</addtitle><description>The characterization of zinc oxide (ZnO) films, developed by a home-built chemical vapor deposition (CVD) system, working as an active layer for a
n
-channel depletion mode pseudo-metal-oxide-semiconductor field-effect transistor (MOSFET) is reported. A factorial experimental design was applied to analyze the behavior of the structural, optical, and morphological properties of the ZnO semiconductor. To study the behavior of the assembled equipment, the main parameters of substrate temperature, oxygen flow, and chamber pressure were varied at two levels. The ZnO films were studied by means of the characterization techniques of scanning electron microscopy (SEM), x-ray diffraction (XRD), Raman spectroscopy, photoluminescence, and cathodoluminescence. SEM images showed that the submicrometric ZnO morphologies were obtained from the interaction of the three growth parameters. XRD analysis exhibited an hexagonal wurtzite structure without the presence of other crystalline phases. The Raman response was analyzed according to the dependence of the oxygen flow, temperature, and growth pressure. The emission obtained under ultraviolet laser excitation showed two strong emissions, at 487 nm and 514 nm. In comparison, cathodoluminescence spectra of the ZnO samples exhibited a dominant transition centered at 380 nm. According to the results of the factorial design, one ZnO sample was selected as the active layer for the development of a pseudo-field effect transistor. The transfer and output characteristics of the device were used to study the threshold voltage, carrier mobility, and transconductance behavior. As a result, this work provides an alternative pathway to the fabrication of a
n
-channel depletion mode ZnO pseudo-transistor using a low-cost and home-built CVD system.</description><subject>Carrier mobility</subject><subject>Cathodoluminescence</subject><subject>Characterization and Evaluation of Materials</subject><subject>Chemical vapor deposition</subject><subject>Chemistry and Materials Science</subject><subject>Depletion</subject><subject>Design of experiments</subject><subject>Electronics and Microelectronics</subject><subject>Factorial design</subject><subject>Field effect transistors</subject><subject>Instrumentation</subject><subject>Materials Science</subject><subject>Metal oxide semiconductors</subject><subject>Morphology</subject><subject>MOSFETs</subject><subject>Optical and Electronic Materials</subject><subject>Optical properties</subject><subject>Original Research Article</subject><subject>Parameters</subject><subject>Photoluminescence</subject><subject>Raman spectroscopy</subject><subject>Scanning electron microscopy</subject><subject>Semiconductor devices</subject><subject>Solid State Physics</subject><subject>Spectrum analysis</subject><subject>Substrates</subject><subject>Threshold voltage</subject><subject>Transconductance</subject><subject>Transistors</subject><subject>Ultraviolet lasers</subject><subject>Wurtzite</subject><subject>X-ray diffraction</subject><subject>Zinc oxide</subject><subject>Zinc oxides</subject><issn>0361-5235</issn><issn>1543-186X</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2021</creationdate><recordtype>article</recordtype><sourceid>8G5</sourceid><sourceid>BENPR</sourceid><sourceid>GUQSH</sourceid><sourceid>M2O</sourceid><recordid>eNp9kE1LAzEQhoMoWKt_wFPAczSz2WR3j1K1CpUKfiBewjSd6Eq7qclWqb_e1RW8eZmB4XnfgYexQ5DHIGVxkgCMyYXMQMhKqlJUW2wAOlcCSvO4zQZSGRA6U3qX7aX0KiVoKGHAcPSCEV1Lsf7Etg4ND54_NVN-US-WiY9j-Gj4bMNHL7SsHS74A65C5Ge0Cqn-4THxU9fW78QnuKHI64bfJFrPg7ie3l6c3-2zHY-LRAe_e8juu-voUkym46vR6UQ4BVUrfInljBCUJ6NkXmbOE5IhT04qh5gXBeWoysJUPtPV3GSFmyvjtXMA6LUasqO-dxXD25pSa1_DOjbdS5tpXSipoZtDlvWUiyGlSN6uYr3EuLEg7bdK26u0nUr7o9JWXUj1odTBzTPFv-p_Ul-REHb3</recordid><startdate>20210901</startdate><enddate>20210901</enddate><creator>Ramos-Carrazco, A.</creator><creator>Gallardo-Cubedo, J. 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G.</creator><creator>Gomez-Fuentes, R.</creator><creator>Berman-Mendoza, D.</creator><general>Springer US</general><general>Springer Nature B.V</general><scope>AAYXX</scope><scope>CITATION</scope><scope>3V.</scope><scope>7XB</scope><scope>88I</scope><scope>8AF</scope><scope>8AO</scope><scope>8FE</scope><scope>8FG</scope><scope>8FK</scope><scope>8G5</scope><scope>ABJCF</scope><scope>ABUWG</scope><scope>AFKRA</scope><scope>ARAPS</scope><scope>AZQEC</scope><scope>BENPR</scope><scope>BGLVJ</scope><scope>CCPQU</scope><scope>D1I</scope><scope>DWQXO</scope><scope>GNUQQ</scope><scope>GUQSH</scope><scope>HCIFZ</scope><scope>KB.</scope><scope>L6V</scope><scope>M2O</scope><scope>M2P</scope><scope>M7S</scope><scope>MBDVC</scope><scope>P5Z</scope><scope>P62</scope><scope>PDBOC</scope><scope>PQEST</scope><scope>PQQKQ</scope><scope>PQUKI</scope><scope>PRINS</scope><scope>PTHSS</scope><scope>Q9U</scope><scope>S0X</scope><orcidid>https://orcid.org/0000-0002-1267-0090</orcidid></search><sort><creationdate>20210901</creationdate><title>Characterization of ZnO Films Grown by Chemical Vapor Deposition as Active Layer in Pseudo-MOSFET</title><author>Ramos-Carrazco, A. ; Gallardo-Cubedo, J. A. ; Vera-Marquina, A. ; Leal-Cruz, A. L. ; Noriega, J. R. ; Zuñiga-Islas, C. ; Rojas-Hernández, A. 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A.</au><au>Vera-Marquina, A.</au><au>Leal-Cruz, A. L.</au><au>Noriega, J. R.</au><au>Zuñiga-Islas, C.</au><au>Rojas-Hernández, A. G.</au><au>Gomez-Fuentes, R.</au><au>Berman-Mendoza, D.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Characterization of ZnO Films Grown by Chemical Vapor Deposition as Active Layer in Pseudo-MOSFET</atitle><jtitle>Journal of electronic materials</jtitle><stitle>Journal of Elec Materi</stitle><date>2021-09-01</date><risdate>2021</risdate><volume>50</volume><issue>9</issue><spage>5196</spage><epage>5208</epage><pages>5196-5208</pages><issn>0361-5235</issn><eissn>1543-186X</eissn><abstract>The characterization of zinc oxide (ZnO) films, developed by a home-built chemical vapor deposition (CVD) system, working as an active layer for a
n
-channel depletion mode pseudo-metal-oxide-semiconductor field-effect transistor (MOSFET) is reported. A factorial experimental design was applied to analyze the behavior of the structural, optical, and morphological properties of the ZnO semiconductor. To study the behavior of the assembled equipment, the main parameters of substrate temperature, oxygen flow, and chamber pressure were varied at two levels. The ZnO films were studied by means of the characterization techniques of scanning electron microscopy (SEM), x-ray diffraction (XRD), Raman spectroscopy, photoluminescence, and cathodoluminescence. SEM images showed that the submicrometric ZnO morphologies were obtained from the interaction of the three growth parameters. XRD analysis exhibited an hexagonal wurtzite structure without the presence of other crystalline phases. The Raman response was analyzed according to the dependence of the oxygen flow, temperature, and growth pressure. The emission obtained under ultraviolet laser excitation showed two strong emissions, at 487 nm and 514 nm. In comparison, cathodoluminescence spectra of the ZnO samples exhibited a dominant transition centered at 380 nm. According to the results of the factorial design, one ZnO sample was selected as the active layer for the development of a pseudo-field effect transistor. The transfer and output characteristics of the device were used to study the threshold voltage, carrier mobility, and transconductance behavior. As a result, this work provides an alternative pathway to the fabrication of a
n
-channel depletion mode ZnO pseudo-transistor using a low-cost and home-built CVD system.</abstract><cop>New York</cop><pub>Springer US</pub><doi>10.1007/s11664-021-09038-9</doi><tpages>13</tpages><orcidid>https://orcid.org/0000-0002-1267-0090</orcidid></addata></record> |
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| subjects | Carrier mobility Cathodoluminescence Characterization and Evaluation of Materials Chemical vapor deposition Chemistry and Materials Science Depletion Design of experiments Electronics and Microelectronics Factorial design Field effect transistors Instrumentation Materials Science Metal oxide semiconductors Morphology MOSFETs Optical and Electronic Materials Optical properties Original Research Article Parameters Photoluminescence Raman spectroscopy Scanning electron microscopy Semiconductor devices Solid State Physics Spectrum analysis Substrates Threshold voltage Transconductance Transistors Ultraviolet lasers Wurtzite X-ray diffraction Zinc oxide Zinc oxides |
| title | Characterization of ZnO Films Grown by Chemical Vapor Deposition as Active Layer in Pseudo-MOSFET |
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