Target heating in sputtering unit of magnetron

The thermal process in a sputtering magnetron unit with a sandwich-target was stud-ied. The unit contains two targets located on the same axis. The inner target is effectively cooled by running water; the outer target is cooled through the fastening elements and by radia-tion. The study was performe...

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Veröffentlicht in:IOP conference series. Materials Science and Engineering 2018-07, Vol.387 (1), p.12043
1. Verfasser: Kozin, A A
Format: Artikel
Sprache:eng
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Zusammenfassung:The thermal process in a sputtering magnetron unit with a sandwich-target was stud-ied. The unit contains two targets located on the same axis. The inner target is effectively cooled by running water; the outer target is cooled through the fastening elements and by radia-tion. The study was performed by modeling in the COMSOL Multiphysics using the Heat Transfer Module. A 3D-model of the sputtering unit has been developed in order to thoroughly analyze the thermal processes in a unit with a cold chromium target and a hot titanium one. The influence of the target thickness and magnetron discharge power on the outer target tempera-ture is found. The model can be used to study a magnetron with any metallic target.
ISSN:1757-8981
1757-899X
DOI:10.1088/1757-899X/387/1/012043