Deposition of ZnO thin film by plasma sputtering method and study of changes in its physical and morphological properties under gamma irradiation with different doses
In this study, changes in the structural and optical properties of ZnO thin film prepared by plasma sputtering on glass substrate due to gamma radiation emitted by Co 60 have been experimentally investigated, and the relationship between ZnO semiconductor optical energy gap and the rate of transmiss...
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| Veröffentlicht in: | Journal of materials science. Materials in electronics 2021-06, Vol.32 (11), p.15533-15543 |
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| container_title | Journal of materials science. Materials in electronics |
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| creator | Nobakht, Sara Talebzadeh, Robabeh Sobhanian, Samad Naghshara, Hamid Kouhi, Mohammad |
| description | In this study, changes in the structural and optical properties of ZnO thin film prepared by plasma sputtering on glass substrate due to gamma radiation emitted by Co
60
have been experimentally investigated, and the relationship between ZnO semiconductor optical energy gap and the rate of transmission and absorption in the optical range (visible and ultraviolet) at different doses of gamma radiation is investigated. The experiments were performed in two intervals of medium and high doses. It is also shown that the transmission and the reflection rates, besides the amount of gamma ray dose, depend on the substrate temperature and also the percentage of oxygen used as admixture to the working gas (Ar). By irradiating ZnO thin films prepared by plasma sputtering by gamma rays of Co
60
, the optical energy gap is generally reduced. Some typical SEM patterns showing special nanostructures are also presented. |
| doi_str_mv | 10.1007/s10854-021-06103-1 |
| format | Article |
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60
have been experimentally investigated, and the relationship between ZnO semiconductor optical energy gap and the rate of transmission and absorption in the optical range (visible and ultraviolet) at different doses of gamma radiation is investigated. The experiments were performed in two intervals of medium and high doses. It is also shown that the transmission and the reflection rates, besides the amount of gamma ray dose, depend on the substrate temperature and also the percentage of oxygen used as admixture to the working gas (Ar). By irradiating ZnO thin films prepared by plasma sputtering by gamma rays of Co
60
, the optical energy gap is generally reduced. Some typical SEM patterns showing special nanostructures are also presented.</description><identifier>ISSN: 0957-4522</identifier><identifier>EISSN: 1573-482X</identifier><identifier>DOI: 10.1007/s10854-021-06103-1</identifier><language>eng</language><publisher>New York: Springer US</publisher><subject>Characterization and Evaluation of Materials ; Chemistry and Materials Science ; Dosage ; Energy gap ; Gamma irradiation ; Gamma rays ; Glass substrates ; Materials Science ; Optical and Electronic Materials ; Optical properties ; Radiation ; Sputtering ; Thin films ; Zinc oxide</subject><ispartof>Journal of materials science. Materials in electronics, 2021-06, Vol.32 (11), p.15533-15543</ispartof><rights>The Author(s), under exclusive licence to Springer Science+Business Media, LLC, part of Springer Nature 2021</rights><rights>The Author(s), under exclusive licence to Springer Science+Business Media, LLC, part of Springer Nature 2021.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c319t-cd4996dd7ac244483e248b07a6577835f900d85c8e43c4fa6dd94ec1f7301c63</citedby><cites>FETCH-LOGICAL-c319t-cd4996dd7ac244483e248b07a6577835f900d85c8e43c4fa6dd94ec1f7301c63</cites><orcidid>0000-0001-7815-0971</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://link.springer.com/content/pdf/10.1007/s10854-021-06103-1$$EPDF$$P50$$Gspringer$$H</linktopdf><linktohtml>$$Uhttps://link.springer.com/10.1007/s10854-021-06103-1$$EHTML$$P50$$Gspringer$$H</linktohtml><link.rule.ids>314,780,784,27924,27925,41488,42557,51319</link.rule.ids></links><search><creatorcontrib>Nobakht, Sara</creatorcontrib><creatorcontrib>Talebzadeh, Robabeh</creatorcontrib><creatorcontrib>Sobhanian, Samad</creatorcontrib><creatorcontrib>Naghshara, Hamid</creatorcontrib><creatorcontrib>Kouhi, Mohammad</creatorcontrib><title>Deposition of ZnO thin film by plasma sputtering method and study of changes in its physical and morphological properties under gamma irradiation with different doses</title><title>Journal of materials science. Materials in electronics</title><addtitle>J Mater Sci: Mater Electron</addtitle><description>In this study, changes in the structural and optical properties of ZnO thin film prepared by plasma sputtering on glass substrate due to gamma radiation emitted by Co
60
have been experimentally investigated, and the relationship between ZnO semiconductor optical energy gap and the rate of transmission and absorption in the optical range (visible and ultraviolet) at different doses of gamma radiation is investigated. The experiments were performed in two intervals of medium and high doses. It is also shown that the transmission and the reflection rates, besides the amount of gamma ray dose, depend on the substrate temperature and also the percentage of oxygen used as admixture to the working gas (Ar). By irradiating ZnO thin films prepared by plasma sputtering by gamma rays of Co
60
, the optical energy gap is generally reduced. Some typical SEM patterns showing special nanostructures are also presented.</description><subject>Characterization and Evaluation of Materials</subject><subject>Chemistry and Materials Science</subject><subject>Dosage</subject><subject>Energy gap</subject><subject>Gamma irradiation</subject><subject>Gamma rays</subject><subject>Glass substrates</subject><subject>Materials Science</subject><subject>Optical and Electronic Materials</subject><subject>Optical properties</subject><subject>Radiation</subject><subject>Sputtering</subject><subject>Thin films</subject><subject>Zinc oxide</subject><issn>0957-4522</issn><issn>1573-482X</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2021</creationdate><recordtype>article</recordtype><sourceid>AFKRA</sourceid><sourceid>BENPR</sourceid><sourceid>CCPQU</sourceid><sourceid>DWQXO</sourceid><recordid>eNp9kctq3DAUhkVpoNM0L5CVoGu3utmylyVt00IgmyxCN0LRZaxgS6qOTJkX6nNGM1PoLqsD4vv-c9CP0DUlnygh8jNQMvaiI4x2ZKCEd_QN2tFe8k6M7PEt2pGpl53oGXuH3gM8E0IGwccd-vvV5QShhhRx8vhXvMd1DhH7sKz46YDzomHVGPJWqysh7vHq6pws1tFiqJs9HDUz67h3gJsYKuA8HyAYvZygNZU8pyXtTy-5pOxKDQ3eonUF7_Xa8kMp2gZ9OuNPqDO2wXtXXKzYJnDwAV14vYC7-jcv0cP3bw83P7q7-9ufN1_uOsPpVDtjxTQN1kptmBBi5I6J8YlIPfRSjrz3EyF27M3oBDfC64ZOwhnqJSfUDPwSfTzHtjN_bw6qek5biW2jYr1gkximQTaKnSlTEkBxXuUSVl0OihJ1rEOd61CtDnWqQ9Em8bME-fiNrvyPfsV6ASVnkUE</recordid><startdate>20210601</startdate><enddate>20210601</enddate><creator>Nobakht, Sara</creator><creator>Talebzadeh, Robabeh</creator><creator>Sobhanian, Samad</creator><creator>Naghshara, Hamid</creator><creator>Kouhi, Mohammad</creator><general>Springer US</general><general>Springer Nature B.V</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>8FE</scope><scope>8FG</scope><scope>ABJCF</scope><scope>AFKRA</scope><scope>ARAPS</scope><scope>BENPR</scope><scope>BGLVJ</scope><scope>CCPQU</scope><scope>D1I</scope><scope>DWQXO</scope><scope>F28</scope><scope>FR3</scope><scope>HCIFZ</scope><scope>JG9</scope><scope>KB.</scope><scope>L7M</scope><scope>P5Z</scope><scope>P62</scope><scope>PDBOC</scope><scope>PQEST</scope><scope>PQQKQ</scope><scope>PQUKI</scope><scope>PRINS</scope><scope>S0W</scope><orcidid>https://orcid.org/0000-0001-7815-0971</orcidid></search><sort><creationdate>20210601</creationdate><title>Deposition of ZnO thin film by plasma sputtering method and study of changes in its physical and morphological properties under gamma irradiation with different doses</title><author>Nobakht, Sara ; 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Materials in electronics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Nobakht, Sara</au><au>Talebzadeh, Robabeh</au><au>Sobhanian, Samad</au><au>Naghshara, Hamid</au><au>Kouhi, Mohammad</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Deposition of ZnO thin film by plasma sputtering method and study of changes in its physical and morphological properties under gamma irradiation with different doses</atitle><jtitle>Journal of materials science. Materials in electronics</jtitle><stitle>J Mater Sci: Mater Electron</stitle><date>2021-06-01</date><risdate>2021</risdate><volume>32</volume><issue>11</issue><spage>15533</spage><epage>15543</epage><pages>15533-15543</pages><issn>0957-4522</issn><eissn>1573-482X</eissn><abstract>In this study, changes in the structural and optical properties of ZnO thin film prepared by plasma sputtering on glass substrate due to gamma radiation emitted by Co
60
have been experimentally investigated, and the relationship between ZnO semiconductor optical energy gap and the rate of transmission and absorption in the optical range (visible and ultraviolet) at different doses of gamma radiation is investigated. The experiments were performed in two intervals of medium and high doses. It is also shown that the transmission and the reflection rates, besides the amount of gamma ray dose, depend on the substrate temperature and also the percentage of oxygen used as admixture to the working gas (Ar). By irradiating ZnO thin films prepared by plasma sputtering by gamma rays of Co
60
, the optical energy gap is generally reduced. Some typical SEM patterns showing special nanostructures are also presented.</abstract><cop>New York</cop><pub>Springer US</pub><doi>10.1007/s10854-021-06103-1</doi><tpages>11</tpages><orcidid>https://orcid.org/0000-0001-7815-0971</orcidid></addata></record> |
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| subjects | Characterization and Evaluation of Materials Chemistry and Materials Science Dosage Energy gap Gamma irradiation Gamma rays Glass substrates Materials Science Optical and Electronic Materials Optical properties Radiation Sputtering Thin films Zinc oxide |
| title | Deposition of ZnO thin film by plasma sputtering method and study of changes in its physical and morphological properties under gamma irradiation with different doses |
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