CO2‐Based Dual‐Tone Resists for Electron Beam Lithography

The increasing global environmental and energy crisis has urgently motivated the advancement of sustainable materials. Significant effort has been focused on developing new materials to replace the fossil‐based resists in the semiconductor industry based on greener sources such as ice, dry ice, smal...

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Veröffentlicht in:	Advanced functional materials 2021-03, Vol.31 (13), p.n/a
Hauptverfasser:	Lu, Xin‐Yu, Luo, Hao, Wang, Kai, Zhang, Yao‐Yao, Zhu, Xiao‐Feng, Li, Dongxue, Ma, Bingze, Xiong, Shisheng, Nealey, Paul F., Li, Qiang, Wu, Guang‐Peng
Format:	Artikel
Sprache:	eng
Schlagworte:	Carbon dioxide carbon dioxide capture Copolymerization Dry ice Electron beam lithography Fourier transforms Materials science Molecular structure nanofabrication Organic chemistry Photonic crystals photoresist Resists Sensitivity Sustainable materials
Online-Zugang:	Volltext
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