Influence of magnetic field configuration on plasma characteristics and thin film properties in dual magnetron reactive high power impulse magnetron sputtering discharge with Al in Ar/O2 mixture

In this work, the influences of the magnetic field configuration (mirror-field and closed-field) on plasma parameters and ion flux dynamics of dual magnetron reactive high power impulse magnetron sputtering (R-HiPIMS) with Al targets in Ar/O2 mixture were studied by time-resolved Langmuir probe and...

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Veröffentlicht in:	Surface & coatings technology 2021-03, Vol.409, p.126837, Article 126837
Hauptverfasser:	Zhou, Guangxue, Wang, Langping, Wang, Xiaofeng, Yu, Yonghao
Format:	Artikel
Sprache:	eng
Schlagworte:	Al2O3 film Aluminum oxide Discharge Distribution functions Dual magnetron sputtering Electric potential Electron density Electron energy HiPIMS Ion energy distribution Ion flux Langmuir probe Magnetic field configuration Magnetic field configurations Magnetic fields Magnetic properties Magnetron sputtering Mass spectrometry Plasma Thin films Voltage
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