Effective N-methyl-2-pyrrolidone wet cleaning for fabricating high-performance monolayer MoS2 transistors

Two-dimensional semiconductors, such as MoS 2 are known to be highly susceptible to diverse molecular adsorbates on the surface during fabrication, which could adversely affect device performance. To ensure high device yield, uniformity and performance, the semiconductor industry has long employed w...

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Veröffentlicht in:Nano research 2019-02, Vol.12 (2), p.303-308
Hauptverfasser: Chen, Po-Chun, Lin, Chih-Pin, Hong, Chuan-Jie, Yang, Chih-Hao, Lin, Yun-Yan, Li, Ming-Yang, Li, Lain-Jong, Yu, Tung-Yuan, Su, Chun-Jung, Li, Kai-Shin, Zhong, Yuan-Liang, Hou, Tuo-Hung, Lan, Yann-Wen
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Sprache:eng
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