Computational Lithography Using Machine Learning Models

Machine learning models have been applied to a wide range of computational lithography applications since around 2010. They provide higher modeling capability, so their application allows modeling of higher accuracy. Many applications which are computationally expensive can take advantage of machine...

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Veröffentlicht in:	IPSJ Transactions on System LSI Design Methodology 2021, Vol.14, pp.2-10
1. Verfasser:	Shin, Youngsoo
Format:	Artikel
Sprache:	eng
Schlagworte:	assist features computational lithography hotspot Lithography lithography model lithography test patterns Machine learning Model accuracy Model testing optical proximity correction Optimization
Online-Zugang:	Volltext
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