Optical properties and morphology analysis of hexagonal WO3 thin films obtained by electron beam evaporation

WO 3 films with thicknesses between 550 and 853 nm were deposited on glass substrates using the electron beam evaporation method at room temperature. The microstructures and surface roughness of the films were studied by X-ray diffraction (XRD) and atomic force microscopy (AFM). It was observed that...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Veröffentlicht in:	Journal of materials science. Materials in electronics 2021, Vol.32 (1), p.798-805
Hauptverfasser:	Shakoury, Reza, Arman, Ali, Rezaee, Sahar, Korpi, Alireza Grayeli, Kulesza, Sławomir, Luna, Carlos, Bramowicz, Mirosław, Mardani, Mohsen
Format:	Artikel
Sprache:	eng
Schlagworte:	Atomic force microscopy Characterization and Evaluation of Materials Chemistry and Materials Science Crystal structure Crystallinity Electron beams Evaporation Film thickness Glass substrates Grain size Homogeneous structure Materials Science Microscopes Morphology Optical and Electronic Materials Optical properties Refractivity Room temperature Surface roughness Thin films Tungsten oxides
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Schreiben Sie den ersten Kommentar!