Heteroepitaxial diamond film deposition on KTaO3 substrates via single-crystal iridium buffer layers

Iridium (Ir) has recently been shown to be a superior buffer layer material for diamond heteroepitaxial growth on different substrates as it possesses chemical inertness and high melting point. This study reports the surface morphologies and microstructures of iridium films deposited on KTaO3 substr...

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Veröffentlicht in:Diamond and related materials 2020-12, Vol.110, p.108117, Article 108117
Hauptverfasser: Wang, Qijun, Wu, Gai, Newhourse-Illige, Ty A., Shepard, Adam W., Greer, James A., Gan, Zhiyin, Feng, Gan, Liu, Sheng
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container_end_page
container_issue
container_start_page 108117
container_title Diamond and related materials
container_volume 110
creator Wang, Qijun
Wu, Gai
Newhourse-Illige, Ty A.
Shepard, Adam W.
Greer, James A.
Gan, Zhiyin
Feng, Gan
Liu, Sheng
description Iridium (Ir) has recently been shown to be a superior buffer layer material for diamond heteroepitaxial growth on different substrates as it possesses chemical inertness and high melting point. This study reports the surface morphologies and microstructures of iridium films deposited on KTaO3 substrates by magnetron sputtering with sputtering powers ranging from 25 W to 100 W at a substrate temperature of ~850 °C. The Ir films were characterized by field-emission scanning electron microscope (FE-SEM) and X-ray diffraction (XRD). The results showed that the morphologies of Ir films turned out to be more homogeneous and more compact with the increase of sputtering power. In addition, single-crystal Ir films were obtained on all samples as identified by XRD measurements and the crystallographic orientations of the single-crystal Ir films changed from (111) to (100) textures with sputtering power increasing from 25 W to 100 W. The Ir thin film grown at 100 W presented a cube-on-cube-type orientation relationship with KTaO3(100) substrate and a mosaic spread of 0.53°. Then, a thin diamond film (~40-μm-thick) was deposited by microwave plasma chemical vapor deposition (MPCVD) on the Ir buffer layer. FE-SEM, XRD and Raman spectroscopy were used to characterize the heteroepitaxial diamond film. The results indicate that the diamond thin film shows a high degree of epitaxy on the KTaO3(100) substrate with the Ir buffer layer. The mosaicity of the diamond film were 0.42° (tilt) and 0.68° (twist), and the Raman full width at half maximum (FWHM) were typically in the range of 3.6–5.7 cm−1. [Display omitted] •Heteroepitaxial diamond films were successfully achieved on KTaO3(100) substrates via Ir buffer layers.•The tilt and twist for the 40-μm-thick diamond layer were 0.42° and 0.68°, respectively.•The change of crystallographic orientation of the Ir films was found with the increasing sputtering power.•The in-plane orientation relationship of Ir[010](100) || KTaO3[010](100) was confirmed.
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This study reports the surface morphologies and microstructures of iridium films deposited on KTaO3 substrates by magnetron sputtering with sputtering powers ranging from 25 W to 100 W at a substrate temperature of ~850 °C. The Ir films were characterized by field-emission scanning electron microscope (FE-SEM) and X-ray diffraction (XRD). The results showed that the morphologies of Ir films turned out to be more homogeneous and more compact with the increase of sputtering power. In addition, single-crystal Ir films were obtained on all samples as identified by XRD measurements and the crystallographic orientations of the single-crystal Ir films changed from (111) to (100) textures with sputtering power increasing from 25 W to 100 W. The Ir thin film grown at 100 W presented a cube-on-cube-type orientation relationship with KTaO3(100) substrate and a mosaic spread of 0.53°. Then, a thin diamond film (~40-μm-thick) was deposited by microwave plasma chemical vapor deposition (MPCVD) on the Ir buffer layer. FE-SEM, XRD and Raman spectroscopy were used to characterize the heteroepitaxial diamond film. The results indicate that the diamond thin film shows a high degree of epitaxy on the KTaO3(100) substrate with the Ir buffer layer. The mosaicity of the diamond film were 0.42° (tilt) and 0.68° (twist), and the Raman full width at half maximum (FWHM) were typically in the range of 3.6–5.7 cm−1. [Display omitted] •Heteroepitaxial diamond films were successfully achieved on KTaO3(100) substrates via Ir buffer layers.•The tilt and twist for the 40-μm-thick diamond layer were 0.42° and 0.68°, respectively.•The change of crystallographic orientation of the Ir films was found with the increasing sputtering power.•The in-plane orientation relationship of Ir[010](100) || KTaO3[010](100) was confirmed.</description><identifier>ISSN: 0925-9635</identifier><identifier>EISSN: 1879-0062</identifier><identifier>DOI: 10.1016/j.diamond.2020.108117</identifier><language>eng</language><publisher>Amsterdam: Elsevier B.V</publisher><subject>Buffer layers ; Chemical vapor deposition ; Crystal structure ; Crystallography ; Diamond film ; Diamond films ; Heteroepitaxy ; Iridium ; KTaO3 ; Magnetron sputtering ; Melting points ; Microwave plasmas ; Morphology ; Raman spectroscopy ; Scanning electron microscopy ; Single crystals ; Substrates ; Thin films ; X-ray diffraction</subject><ispartof>Diamond and related materials, 2020-12, Vol.110, p.108117, Article 108117</ispartof><rights>2020 Elsevier B.V.</rights><rights>Copyright Elsevier BV Dec 2020</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c337t-1588de38990ffa586ee3a60093cf3710540050931b2aec1be441c084b4e7c7b43</citedby><cites>FETCH-LOGICAL-c337t-1588de38990ffa586ee3a60093cf3710540050931b2aec1be441c084b4e7c7b43</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/j.diamond.2020.108117$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,778,782,3539,27907,27908,45978</link.rule.ids></links><search><creatorcontrib>Wang, Qijun</creatorcontrib><creatorcontrib>Wu, Gai</creatorcontrib><creatorcontrib>Newhourse-Illige, Ty A.</creatorcontrib><creatorcontrib>Shepard, Adam W.</creatorcontrib><creatorcontrib>Greer, James A.</creatorcontrib><creatorcontrib>Gan, Zhiyin</creatorcontrib><creatorcontrib>Feng, Gan</creatorcontrib><creatorcontrib>Liu, Sheng</creatorcontrib><title>Heteroepitaxial diamond film deposition on KTaO3 substrates via single-crystal iridium buffer layers</title><title>Diamond and related materials</title><description>Iridium (Ir) has recently been shown to be a superior buffer layer material for diamond heteroepitaxial growth on different substrates as it possesses chemical inertness and high melting point. This study reports the surface morphologies and microstructures of iridium films deposited on KTaO3 substrates by magnetron sputtering with sputtering powers ranging from 25 W to 100 W at a substrate temperature of ~850 °C. The Ir films were characterized by field-emission scanning electron microscope (FE-SEM) and X-ray diffraction (XRD). The results showed that the morphologies of Ir films turned out to be more homogeneous and more compact with the increase of sputtering power. In addition, single-crystal Ir films were obtained on all samples as identified by XRD measurements and the crystallographic orientations of the single-crystal Ir films changed from (111) to (100) textures with sputtering power increasing from 25 W to 100 W. The Ir thin film grown at 100 W presented a cube-on-cube-type orientation relationship with KTaO3(100) substrate and a mosaic spread of 0.53°. Then, a thin diamond film (~40-μm-thick) was deposited by microwave plasma chemical vapor deposition (MPCVD) on the Ir buffer layer. FE-SEM, XRD and Raman spectroscopy were used to characterize the heteroepitaxial diamond film. The results indicate that the diamond thin film shows a high degree of epitaxy on the KTaO3(100) substrate with the Ir buffer layer. The mosaicity of the diamond film were 0.42° (tilt) and 0.68° (twist), and the Raman full width at half maximum (FWHM) were typically in the range of 3.6–5.7 cm−1. [Display omitted] •Heteroepitaxial diamond films were successfully achieved on KTaO3(100) substrates via Ir buffer layers.•The tilt and twist for the 40-μm-thick diamond layer were 0.42° and 0.68°, respectively.•The change of crystallographic orientation of the Ir films was found with the increasing sputtering power.•The in-plane orientation relationship of Ir[010](100) || KTaO3[010](100) was confirmed.</description><subject>Buffer layers</subject><subject>Chemical vapor deposition</subject><subject>Crystal structure</subject><subject>Crystallography</subject><subject>Diamond film</subject><subject>Diamond films</subject><subject>Heteroepitaxy</subject><subject>Iridium</subject><subject>KTaO3</subject><subject>Magnetron sputtering</subject><subject>Melting points</subject><subject>Microwave plasmas</subject><subject>Morphology</subject><subject>Raman spectroscopy</subject><subject>Scanning electron microscopy</subject><subject>Single crystals</subject><subject>Substrates</subject><subject>Thin films</subject><subject>X-ray diffraction</subject><issn>0925-9635</issn><issn>1879-0062</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2020</creationdate><recordtype>article</recordtype><recordid>eNqFkFtLxDAQhYMouF5-ghDwuesk6SV9ElnUFRf2ZX0OaTKVlG5bk3Rx_71duu_CwDDDOWeYj5AHBksGLH9qltbpfd_ZJQd-2knGiguyYLIoE4CcX5IFlDxLylxk1-QmhAaA8TJlC2LXGNH3OLiof51u6TmK1q7dU4tDH1x0fUen-tzpraBhrEL0OmKgB6dpcN13i4nxxxAnu_POunFPq7Gu0dNWH9GHO3JV6zbg_bnfkq-3191qnWy27x-rl01ihChiwjIpLQpZllDXOpM5otA5QClMLQoGWQqQTROruEbDKkxTZkCmVYqFKapU3JLHOXfw_c-IIaqmH303nVQ8lSXwPIdiUmWzyvg-BI-1Grzba39UDNQJqGrUmYI6AVUz0Mn3PPtweuHg0KtgHHYGrfNoorK9-yfhD1MMgdg</recordid><startdate>202012</startdate><enddate>202012</enddate><creator>Wang, Qijun</creator><creator>Wu, Gai</creator><creator>Newhourse-Illige, Ty A.</creator><creator>Shepard, Adam W.</creator><creator>Greer, James A.</creator><creator>Gan, Zhiyin</creator><creator>Feng, Gan</creator><creator>Liu, Sheng</creator><general>Elsevier B.V</general><general>Elsevier BV</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>202012</creationdate><title>Heteroepitaxial diamond film deposition on KTaO3 substrates via single-crystal iridium buffer layers</title><author>Wang, Qijun ; Wu, Gai ; Newhourse-Illige, Ty A. ; Shepard, Adam W. ; Greer, James A. ; Gan, Zhiyin ; Feng, Gan ; Liu, Sheng</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c337t-1588de38990ffa586ee3a60093cf3710540050931b2aec1be441c084b4e7c7b43</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2020</creationdate><topic>Buffer layers</topic><topic>Chemical vapor deposition</topic><topic>Crystal structure</topic><topic>Crystallography</topic><topic>Diamond film</topic><topic>Diamond films</topic><topic>Heteroepitaxy</topic><topic>Iridium</topic><topic>KTaO3</topic><topic>Magnetron sputtering</topic><topic>Melting points</topic><topic>Microwave plasmas</topic><topic>Morphology</topic><topic>Raman spectroscopy</topic><topic>Scanning electron microscopy</topic><topic>Single crystals</topic><topic>Substrates</topic><topic>Thin films</topic><topic>X-ray diffraction</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Wang, Qijun</creatorcontrib><creatorcontrib>Wu, Gai</creatorcontrib><creatorcontrib>Newhourse-Illige, Ty A.</creatorcontrib><creatorcontrib>Shepard, Adam W.</creatorcontrib><creatorcontrib>Greer, James A.</creatorcontrib><creatorcontrib>Gan, Zhiyin</creatorcontrib><creatorcontrib>Feng, Gan</creatorcontrib><creatorcontrib>Liu, Sheng</creatorcontrib><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Diamond and related materials</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Wang, Qijun</au><au>Wu, Gai</au><au>Newhourse-Illige, Ty A.</au><au>Shepard, Adam W.</au><au>Greer, James A.</au><au>Gan, Zhiyin</au><au>Feng, Gan</au><au>Liu, Sheng</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Heteroepitaxial diamond film deposition on KTaO3 substrates via single-crystal iridium buffer layers</atitle><jtitle>Diamond and related materials</jtitle><date>2020-12</date><risdate>2020</risdate><volume>110</volume><spage>108117</spage><pages>108117-</pages><artnum>108117</artnum><issn>0925-9635</issn><eissn>1879-0062</eissn><abstract>Iridium (Ir) has recently been shown to be a superior buffer layer material for diamond heteroepitaxial growth on different substrates as it possesses chemical inertness and high melting point. This study reports the surface morphologies and microstructures of iridium films deposited on KTaO3 substrates by magnetron sputtering with sputtering powers ranging from 25 W to 100 W at a substrate temperature of ~850 °C. The Ir films were characterized by field-emission scanning electron microscope (FE-SEM) and X-ray diffraction (XRD). The results showed that the morphologies of Ir films turned out to be more homogeneous and more compact with the increase of sputtering power. In addition, single-crystal Ir films were obtained on all samples as identified by XRD measurements and the crystallographic orientations of the single-crystal Ir films changed from (111) to (100) textures with sputtering power increasing from 25 W to 100 W. The Ir thin film grown at 100 W presented a cube-on-cube-type orientation relationship with KTaO3(100) substrate and a mosaic spread of 0.53°. Then, a thin diamond film (~40-μm-thick) was deposited by microwave plasma chemical vapor deposition (MPCVD) on the Ir buffer layer. FE-SEM, XRD and Raman spectroscopy were used to characterize the heteroepitaxial diamond film. The results indicate that the diamond thin film shows a high degree of epitaxy on the KTaO3(100) substrate with the Ir buffer layer. The mosaicity of the diamond film were 0.42° (tilt) and 0.68° (twist), and the Raman full width at half maximum (FWHM) were typically in the range of 3.6–5.7 cm−1. [Display omitted] •Heteroepitaxial diamond films were successfully achieved on KTaO3(100) substrates via Ir buffer layers.•The tilt and twist for the 40-μm-thick diamond layer were 0.42° and 0.68°, respectively.•The change of crystallographic orientation of the Ir films was found with the increasing sputtering power.•The in-plane orientation relationship of Ir[010](100) || KTaO3[010](100) was confirmed.</abstract><cop>Amsterdam</cop><pub>Elsevier B.V</pub><doi>10.1016/j.diamond.2020.108117</doi></addata></record>
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subjects Buffer layers
Chemical vapor deposition
Crystal structure
Crystallography
Diamond film
Diamond films
Heteroepitaxy
Iridium
KTaO3
Magnetron sputtering
Melting points
Microwave plasmas
Morphology
Raman spectroscopy
Scanning electron microscopy
Single crystals
Substrates
Thin films
X-ray diffraction
title Heteroepitaxial diamond film deposition on KTaO3 substrates via single-crystal iridium buffer layers
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