Study of titanium nitride film growth by plasma enhanced pulsed laser deposition at different experimental conditions

In this work, we have combined a conventional pulsed laser deposition (PLD) system with a dual radio frequency (RF) discharge to create a plasma-enhanced PLD system, known as (PE-PLD). This system was used to grow titanium nitride (TiN) thin films in order to study the feasibility of obtaining contr...

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Veröffentlicht in:	Surface & coatings technology 2021-01, Vol.405, p.126492, Article 126492
Hauptverfasser:	Escalona, M., Bhuyan, H., Ibacache, S., Retamal, M.J., Saikia, P., Borgohain, C., Valenzuela, J.C., Veloso, F., Favre, M., Wyndham, E.
Format:	Artikel
Sprache:	eng
Schlagworte:	Atomic force microscopy Dual radio-frequency plasma Feasibility studies Film growth Ion bombardment Nitrogen Nitrogen ions Plasma Plasma-enhanced pulsed laser deposition Pulsed laser deposition Pulsed lasers Radio frequency Raman spectroscopy RF discharge-pumped lasers Substrates Thin film Thin films Titanium nitride
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