Chemical vapor deposition and temperature-dependent Raman characterization of two-dimensional vanadium ditelluride

Recently, ultrathin two-dimensional (2D) metallic vanadium dichalcogenides have attracted widespread attention because of the charge density wave (CDW) phase transition and possible ferromagnetism. Herein, we report the synthesis and temperature-dependent Raman characterization of the 2D vanadium di...

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Veröffentlicht in:RSC advances 2021-01, Vol.11 (5), p.2624-2629
Hauptverfasser: Hossain, Mongur, Iqbal, Muhammad Ahsan, Wu, Juanxia, Xie, Liming
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Iqbal, Muhammad Ahsan
Wu, Juanxia
Xie, Liming
description Recently, ultrathin two-dimensional (2D) metallic vanadium dichalcogenides have attracted widespread attention because of the charge density wave (CDW) phase transition and possible ferromagnetism. Herein, we report the synthesis and temperature-dependent Raman characterization of the 2D vanadium ditelluride (VTe 2 ). The synthesis is done by atmospheric pressure chemical vapor deposition (APCVD) using vanadium chloride (VCl 3 ) precursor on fluorphlogopite mica, sapphire, and h-BN substrates. A large area of the thin film with thickness ∼10 nm is grown on the hexagonal boron nitride (h-BN) substrate. Temperature-dependent Raman characterization of VTe 2 is conducted from room temperature to 513 K. Remarkable changes of Raman modes at around 413 K are observed, indicating the structural phase transition. Two-dimensional vanadium ditelluride has been synthesized on mica, sapphire, and h-BN substrates by atmospheric pressure chemical vapor deposition.
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subjects Boron nitride
Charge density waves
Chemical synthesis
Chemical vapor deposition
Chemistry
Ferromagnetism
Mica
Phase transitions
Room temperature
Sapphire
Substrates
Temperature
Temperature dependence
Thickness
Thin films
Vanadium
title Chemical vapor deposition and temperature-dependent Raman characterization of two-dimensional vanadium ditelluride
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