HPLC–DAD method for investigating pantoprazole for its stress-dependent degradation by photolysis and oxidation
A reversed-phased high-performance liquid chromatography–diode-array detection (HPLC–DAD) method has been developed for investigating the stress-dependent degradation of pantoprazole (PTZ) by a photolytic and oxidative mechanism. The developed method separated PTZ from its degradation products on a...
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Veröffentlicht in: | Acta Chromatographica 2020-12, Vol.32 (4), p.247-255 |
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creator | Al Bratty, Mohammad Thangavel, Neelaveni Peraman, Ramalingam Kumar, Vinod Reddy, Padmanabha Nagappan, Krishna Veni Al Hazmi, Hassan |
description | A reversed-phased high-performance liquid chromatography–diode-array detection (HPLC–DAD) method has been developed for investigating the stress-dependent degradation of pantoprazole (PTZ) by a photolytic and oxidative mechanism. The developed method separated PTZ from its degradation products on a C
18
column with a mobile phase consisted of methanol and water (60:40,
v/v
; pH 3.0) at a flow rate of 1 mL/min. The linear regression coefficient of 0.9995 was obtained for a concentration range from 5 to 25 μg/mL. The % relative standard deviation for repeatability and intermediate precision were below 0.5% and 1.5%, respectively, while the sensitivity of the method was demonstrated by a limit of detection value of 0.25 μg/mL. The stress sample analyses for PTZ results revealed the formation of a total of 18 degradation products, and out of them, 9 degradation products were common for both photolytic and oxidative degradations. Further, the oxidation by azobisisobutyronitrile produced the highest number of degradation products (11 impurities), 3 of which are more hydrophobic than PTZ. In photolytic degradation, 8 and 7 degradation products were observed with UV radiation and sunlight exposure, respectively. Furthermore, the degradation of pantoprazole sodium injection formulation was carried out under the same stress conditions, and it revealed the formation of 3 common impurities under both stress conditions, but other impurities were not detected in the formulations. Finally, 3 common impurities formed in formulations of PTZ injections, viz., sulfone,
N
-oxide, and
N
-oxide sulfone impurities, were identified by spike analyses. |
doi_str_mv | 10.1556/1326.2019.00709 |
format | Article |
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18
column with a mobile phase consisted of methanol and water (60:40,
v/v
; pH 3.0) at a flow rate of 1 mL/min. The linear regression coefficient of 0.9995 was obtained for a concentration range from 5 to 25 μg/mL. The % relative standard deviation for repeatability and intermediate precision were below 0.5% and 1.5%, respectively, while the sensitivity of the method was demonstrated by a limit of detection value of 0.25 μg/mL. The stress sample analyses for PTZ results revealed the formation of a total of 18 degradation products, and out of them, 9 degradation products were common for both photolytic and oxidative degradations. Further, the oxidation by azobisisobutyronitrile produced the highest number of degradation products (11 impurities), 3 of which are more hydrophobic than PTZ. In photolytic degradation, 8 and 7 degradation products were observed with UV radiation and sunlight exposure, respectively. Furthermore, the degradation of pantoprazole sodium injection formulation was carried out under the same stress conditions, and it revealed the formation of 3 common impurities under both stress conditions, but other impurities were not detected in the formulations. Finally, 3 common impurities formed in formulations of PTZ injections, viz., sulfone,
N
-oxide, and
N
-oxide sulfone impurities, were identified by spike analyses.</description><identifier>ISSN: 2083-5736</identifier><identifier>ISSN: 1233-2356</identifier><identifier>EISSN: 2083-5736</identifier><identifier>DOI: 10.1556/1326.2019.00709</identifier><language>eng</language><publisher>Budapest: Akademiai Kiado Zrt</publisher><subject>Azobisisobutyronitrile ; Degradation ; Degradation products ; Flow rates ; Flow velocity ; High performance liquid chromatography ; Hydrophobicity ; Impurities ; Ions ; Liquid chromatography ; Oxidation ; Photolysis ; Regression analysis ; Regression coefficients ; Stress ; Ultraviolet radiation</subject><ispartof>Acta Chromatographica, 2020-12, Vol.32 (4), p.247-255</ispartof><rights>Copyright Akademiai Kiado Zrt Dec 2020</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c310t-f33606e1b0e1aa18338c968264dfda22dd835cc473b9f792b52a795aee621293</citedby><cites>FETCH-LOGICAL-c310t-f33606e1b0e1aa18338c968264dfda22dd835cc473b9f792b52a795aee621293</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids></links><search><creatorcontrib>Al Bratty, Mohammad</creatorcontrib><creatorcontrib>Thangavel, Neelaveni</creatorcontrib><creatorcontrib>Peraman, Ramalingam</creatorcontrib><creatorcontrib>Kumar, Vinod</creatorcontrib><creatorcontrib>Reddy, Padmanabha</creatorcontrib><creatorcontrib>Nagappan, Krishna Veni</creatorcontrib><creatorcontrib>Al Hazmi, Hassan</creatorcontrib><title>HPLC–DAD method for investigating pantoprazole for its stress-dependent degradation by photolysis and oxidation</title><title>Acta Chromatographica</title><description>A reversed-phased high-performance liquid chromatography–diode-array detection (HPLC–DAD) method has been developed for investigating the stress-dependent degradation of pantoprazole (PTZ) by a photolytic and oxidative mechanism. The developed method separated PTZ from its degradation products on a C
18
column with a mobile phase consisted of methanol and water (60:40,
v/v
; pH 3.0) at a flow rate of 1 mL/min. The linear regression coefficient of 0.9995 was obtained for a concentration range from 5 to 25 μg/mL. The % relative standard deviation for repeatability and intermediate precision were below 0.5% and 1.5%, respectively, while the sensitivity of the method was demonstrated by a limit of detection value of 0.25 μg/mL. The stress sample analyses for PTZ results revealed the formation of a total of 18 degradation products, and out of them, 9 degradation products were common for both photolytic and oxidative degradations. Further, the oxidation by azobisisobutyronitrile produced the highest number of degradation products (11 impurities), 3 of which are more hydrophobic than PTZ. In photolytic degradation, 8 and 7 degradation products were observed with UV radiation and sunlight exposure, respectively. Furthermore, the degradation of pantoprazole sodium injection formulation was carried out under the same stress conditions, and it revealed the formation of 3 common impurities under both stress conditions, but other impurities were not detected in the formulations. Finally, 3 common impurities formed in formulations of PTZ injections, viz., sulfone,
N
-oxide, and
N
-oxide sulfone impurities, were identified by spike analyses.</description><subject>Azobisisobutyronitrile</subject><subject>Degradation</subject><subject>Degradation products</subject><subject>Flow rates</subject><subject>Flow velocity</subject><subject>High performance liquid chromatography</subject><subject>Hydrophobicity</subject><subject>Impurities</subject><subject>Ions</subject><subject>Liquid chromatography</subject><subject>Oxidation</subject><subject>Photolysis</subject><subject>Regression analysis</subject><subject>Regression coefficients</subject><subject>Stress</subject><subject>Ultraviolet radiation</subject><issn>2083-5736</issn><issn>1233-2356</issn><issn>2083-5736</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2020</creationdate><recordtype>article</recordtype><recordid>eNpNkM1OAjEUhRujiYiu3TZxPdCfaTtdElAwIdEF-6Yz7cAQaIe2GHHlO_iGPomD48LVPck599zcD4B7jEaYMT7GlPARQViOEBJIXoABQQXNmKD88p--BjcxbhEiLM-LATgsXpfT78-v2WQG9zZtvIG1D7BxbzamZq1T49aw1S75NugPv7O9nSKMKdgYM2Nb64x1CRq7Dtp0G97B8gTbjU9-d4pNhNoZ6N-b3rsFV7XeRXv3N4dg9fS4mi6y5cv8eTpZZhXFKGU1pRxxi0tksda4oLSoJC8Iz01tNCHGFJRVVS5oKWshScmIFpJpaznBRNIheOhr2-APx-4ZtfXH4LqLiuQipwhTgbrUuE9VwccYbK3a0Ox1OCmM1BmrOmNVZ6zqFyv9AdymbGg</recordid><startdate>202012</startdate><enddate>202012</enddate><creator>Al Bratty, Mohammad</creator><creator>Thangavel, Neelaveni</creator><creator>Peraman, Ramalingam</creator><creator>Kumar, Vinod</creator><creator>Reddy, Padmanabha</creator><creator>Nagappan, Krishna Veni</creator><creator>Al Hazmi, Hassan</creator><general>Akademiai Kiado Zrt</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7QO</scope><scope>8FD</scope><scope>FR3</scope><scope>P64</scope></search><sort><creationdate>202012</creationdate><title>HPLC–DAD method for investigating pantoprazole for its stress-dependent degradation by photolysis and oxidation</title><author>Al Bratty, Mohammad ; Thangavel, Neelaveni ; Peraman, Ramalingam ; Kumar, Vinod ; Reddy, Padmanabha ; Nagappan, Krishna Veni ; Al Hazmi, Hassan</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c310t-f33606e1b0e1aa18338c968264dfda22dd835cc473b9f792b52a795aee621293</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2020</creationdate><topic>Azobisisobutyronitrile</topic><topic>Degradation</topic><topic>Degradation products</topic><topic>Flow rates</topic><topic>Flow velocity</topic><topic>High performance liquid chromatography</topic><topic>Hydrophobicity</topic><topic>Impurities</topic><topic>Ions</topic><topic>Liquid chromatography</topic><topic>Oxidation</topic><topic>Photolysis</topic><topic>Regression analysis</topic><topic>Regression coefficients</topic><topic>Stress</topic><topic>Ultraviolet radiation</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Al Bratty, Mohammad</creatorcontrib><creatorcontrib>Thangavel, Neelaveni</creatorcontrib><creatorcontrib>Peraman, Ramalingam</creatorcontrib><creatorcontrib>Kumar, Vinod</creatorcontrib><creatorcontrib>Reddy, Padmanabha</creatorcontrib><creatorcontrib>Nagappan, Krishna Veni</creatorcontrib><creatorcontrib>Al Hazmi, Hassan</creatorcontrib><collection>CrossRef</collection><collection>Biotechnology Research Abstracts</collection><collection>Technology Research Database</collection><collection>Engineering Research Database</collection><collection>Biotechnology and BioEngineering Abstracts</collection><jtitle>Acta Chromatographica</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Al Bratty, Mohammad</au><au>Thangavel, Neelaveni</au><au>Peraman, Ramalingam</au><au>Kumar, Vinod</au><au>Reddy, Padmanabha</au><au>Nagappan, Krishna Veni</au><au>Al Hazmi, Hassan</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>HPLC–DAD method for investigating pantoprazole for its stress-dependent degradation by photolysis and oxidation</atitle><jtitle>Acta Chromatographica</jtitle><date>2020-12</date><risdate>2020</risdate><volume>32</volume><issue>4</issue><spage>247</spage><epage>255</epage><pages>247-255</pages><issn>2083-5736</issn><issn>1233-2356</issn><eissn>2083-5736</eissn><abstract>A reversed-phased high-performance liquid chromatography–diode-array detection (HPLC–DAD) method has been developed for investigating the stress-dependent degradation of pantoprazole (PTZ) by a photolytic and oxidative mechanism. The developed method separated PTZ from its degradation products on a C
18
column with a mobile phase consisted of methanol and water (60:40,
v/v
; pH 3.0) at a flow rate of 1 mL/min. The linear regression coefficient of 0.9995 was obtained for a concentration range from 5 to 25 μg/mL. The % relative standard deviation for repeatability and intermediate precision were below 0.5% and 1.5%, respectively, while the sensitivity of the method was demonstrated by a limit of detection value of 0.25 μg/mL. The stress sample analyses for PTZ results revealed the formation of a total of 18 degradation products, and out of them, 9 degradation products were common for both photolytic and oxidative degradations. Further, the oxidation by azobisisobutyronitrile produced the highest number of degradation products (11 impurities), 3 of which are more hydrophobic than PTZ. In photolytic degradation, 8 and 7 degradation products were observed with UV radiation and sunlight exposure, respectively. Furthermore, the degradation of pantoprazole sodium injection formulation was carried out under the same stress conditions, and it revealed the formation of 3 common impurities under both stress conditions, but other impurities were not detected in the formulations. Finally, 3 common impurities formed in formulations of PTZ injections, viz., sulfone,
N
-oxide, and
N
-oxide sulfone impurities, were identified by spike analyses.</abstract><cop>Budapest</cop><pub>Akademiai Kiado Zrt</pub><doi>10.1556/1326.2019.00709</doi><tpages>9</tpages><oa>free_for_read</oa></addata></record> |
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subjects | Azobisisobutyronitrile Degradation Degradation products Flow rates Flow velocity High performance liquid chromatography Hydrophobicity Impurities Ions Liquid chromatography Oxidation Photolysis Regression analysis Regression coefficients Stress Ultraviolet radiation |
title | HPLC–DAD method for investigating pantoprazole for its stress-dependent degradation by photolysis and oxidation |
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