A study of greyscale electron beam lithography for a 3D round shape Kinoform lens for hard X-ray optics

For high quality imaging of materials in nanoscale by hard X-ray optics, high resolution lenses with high focusing/imaging efficiency are needed. Refraction based conventional Kinoform lenses with 1D linear configuration in Si has been attempted for decades, but there has still been no sign of succe...

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Veröffentlicht in:	Microelectronic engineering 2020-10, Vol.234, p.111435, Article 111435
Hauptverfasser:	Tong, Xujie, Xu, Chen, Zhu, Jingyuan, Mao, Chengwen, Zhen, Xiangjun, Huang, Wanxia, Chen, Yifang
Format:	Artikel
Sprache:	eng
Schlagworte:	3-D technology Charge distribution Configurations Diffraction Electron beam lithography Fresnel zones Geometrical optics Gray scale Grayscale e-beam lithography Hard X-ray focusing/imaging High resolution Image processing systems Image resolution Kinoform Lenses Monte Carlo simulation Optics Proximity effect Round Kinoform lens Simulation X ray imagery X ray optics Zone plates
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