The anodic formation of sulfide and oxide films on copper in borate-buffered aqueous chloride solutions containing sulfide

The formation of sulfide and oxide films on copper has been studied in sulfide solutions containing chloride and buffered to pH = 9 with borate over the temperature range 20 °C to 80 °C. The primary goal was to investigate the susceptibility of copper to pitting corrosion over a range of temperature...

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Veröffentlicht in:	Electrochimica acta 2020-12, Vol.362, p.137087, Article 137087
Hauptverfasser:	Guo, M., Chen, J., Lilja, C., Dehnavi, V., Behazin, M., Noël, J.J., Shoesmith, D.W.
Format:	Artikel
Sprache:	eng
Schlagworte:	Buffers Chalcocite Chlorides Copper Copper oxides Copper sulfides Cyclic voltammetry Dissolution Nuclear waste disposal Oxide coatings Pitting corrosion Raman spectroscopy Sulfide Temperature
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