Development of a novel plasma probe for the investigation and control of plasma‐enhanced chemical vapor deposition coating processes

A plasma probe and measuring method were developed to simultaneously determine both the electron density, ne, and floating potential in plasma‐enhanced chemical vapor deposition (PECVD) coating processes within low‐pressure plasmas. The functionality of the probe with a high deposition rate is demon...

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Veröffentlicht in:	Plasma processes and polymers 2020-11, Vol.17 (11), p.n/a
Hauptverfasser:	Kasashima, Yuji, Brenner, Thorben, Vissing, Klaus
Format:	Artikel
Sprache:	eng
Schlagworte:	Chemical vapor deposition Electron density floating potential Flow velocity Gas flow Hexamethyldisiloxane Measurement methods Plasma Plasma probes Plasmas plasma‐enhanced chemical vapor deposition probe measurement Vapor deposition coating
Online-Zugang:	Volltext
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