The Photoelectric Behavior and Antimicrobial Effect of Titanium Dioxide Deposition for Dental Implants
This work presents a pilot study on the photoelectric effect of anatase titanium dioxide (TiO2) deposited on grade 4 titanium discs on their antimicrobial properties, especially for dental implants applications. The prepared specimens are characterized by X-ray diffraction and Raman spectroscopy to...
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Veröffentlicht in: | Key engineering materials 2020-09, Vol.865, p.97-103 |
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description | This work presents a pilot study on the photoelectric effect of anatase titanium dioxide (TiO2) deposited on grade 4 titanium discs on their antimicrobial properties, especially for dental implants applications. The prepared specimens are characterized by X-ray diffraction and Raman spectroscopy to ensure a homogenous coverage of the TiO2 material on the discs. The samples were further tested to outline the photoelectric response of titanium dioxide to ultraviolet radiation in the form of electrical current within the discs. Six discs (three bare Ti, and three coated with TiO2) were seeded with a 5 μl of Escherichia coli culture. One disc of each group was subjected to the same UV light source used for the opto-electrical analysis for 0, 1 or 5 minutes. Bacteria on the discs were then harvested and incubated to examine number of viable cells. The obtained electrical properties confirmed the suitability of the surface-coating to provide simultaneous oxidation-reduction driven reactions under the photoinduced catalytic activity. This activity highlighted the benefits of the added TiO2 layer in reducing the numbers of active E-Coli bacteria in a microbial setup by as much as 21% after 5 minutes of UV exposure. This photoelectrical effect has a profound impact on the development of an in-situ oral disinfectant material deposited on titanium-based dental implants. |
doi_str_mv | 10.4028/www.scientific.net/KEM.865.97 |
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fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_journals_2447998482</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>2447998482</sourcerecordid><originalsourceid>FETCH-LOGICAL-c2087-f911dbba63cdf5a2c83bb615db873c62d0ecd78dac1c74454154a470647cf9d73</originalsourceid><addsrcrecordid>eNqNkMtOAjEUhidGExF9hybG5QztTGfaLoxBQCVidIHrptNLpgSm2BbRt7cEE7euzln8l3O-LLtBsMCwpKP9fl8EaXUfrbGy6HUcPc9eCtrUBSMn2QA1TZkzwurTtENU5YyWzXl2EcIKwgpRVA8ys-w0eOtcdHqtZfRWgnvdiU_rPBC9AuMUvrHSu9aKNZgZk0TAGbC0UfR2twFT676s0mCqty7YaF0PTPJO01XJMN9s16KP4TI7M2Id9NXvHGbvD7Pl5ClfvD7OJ-NFLktISW4YQqptRVNJZWpRSlq1bYNq1VJSyaZUUEtFqBISSYJxjVGNBSawwUQapkg1zK6PuVvvPnY6RL5yO9-nSl5iTBijmJZJdXtUpb9C8Nrwrbcb4b85gvyAlie0_A8tT2h5QssTWs4OLXdHf_SiD1HL7q_mfwk_xSeMIg</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2447998482</pqid></control><display><type>article</type><title>The Photoelectric Behavior and Antimicrobial Effect of Titanium Dioxide Deposition for Dental Implants</title><source>Scientific.net Journals</source><creator>Alami, Abdul Hai ; Abu Hawili, Abdullah ; Moufti, Mohammad-Adel ; Faraj, Mohammed ; Aokal, Kamilia ; Hamad, Mohammad ; Naji, Rawand</creator><creatorcontrib>Alami, Abdul Hai ; Abu Hawili, Abdullah ; Moufti, Mohammad-Adel ; Faraj, Mohammed ; Aokal, Kamilia ; Hamad, Mohammad ; Naji, Rawand</creatorcontrib><description>This work presents a pilot study on the photoelectric effect of anatase titanium dioxide (TiO2) deposited on grade 4 titanium discs on their antimicrobial properties, especially for dental implants applications. The prepared specimens are characterized by X-ray diffraction and Raman spectroscopy to ensure a homogenous coverage of the TiO2 material on the discs. The samples were further tested to outline the photoelectric response of titanium dioxide to ultraviolet radiation in the form of electrical current within the discs. Six discs (three bare Ti, and three coated with TiO2) were seeded with a 5 μl of Escherichia coli culture. One disc of each group was subjected to the same UV light source used for the opto-electrical analysis for 0, 1 or 5 minutes. Bacteria on the discs were then harvested and incubated to examine number of viable cells. The obtained electrical properties confirmed the suitability of the surface-coating to provide simultaneous oxidation-reduction driven reactions under the photoinduced catalytic activity. This activity highlighted the benefits of the added TiO2 layer in reducing the numbers of active E-Coli bacteria in a microbial setup by as much as 21% after 5 minutes of UV exposure. This photoelectrical effect has a profound impact on the development of an in-situ oral disinfectant material deposited on titanium-based dental implants.</description><identifier>ISSN: 1013-9826</identifier><identifier>ISSN: 1662-9795</identifier><identifier>EISSN: 1662-9795</identifier><identifier>DOI: 10.4028/www.scientific.net/KEM.865.97</identifier><language>eng</language><publisher>Zurich: Trans Tech Publications Ltd</publisher><subject>Anatase ; Antiinfectives and antibacterials ; Bacteria ; Catalytic activity ; Dental implants ; Dental materials ; E coli ; Electrical properties ; Light sources ; Microorganisms ; Oxidation ; Photoelectric effect ; Photoelectricity ; Raman spectroscopy ; Surgical implants ; Titanium ; Titanium dioxide ; Ultraviolet radiation</subject><ispartof>Key engineering materials, 2020-09, Vol.865, p.97-103</ispartof><rights>2020 Trans Tech Publications Ltd</rights><rights>Copyright Trans Tech Publications Ltd. Sep 2020</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><cites>FETCH-LOGICAL-c2087-f911dbba63cdf5a2c83bb615db873c62d0ecd78dac1c74454154a470647cf9d73</cites><orcidid>0000-0002-7043-8249</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Uhttps://www.scientific.net/Image/TitleCover/5941?width=600</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids></links><search><creatorcontrib>Alami, Abdul Hai</creatorcontrib><creatorcontrib>Abu Hawili, Abdullah</creatorcontrib><creatorcontrib>Moufti, Mohammad-Adel</creatorcontrib><creatorcontrib>Faraj, Mohammed</creatorcontrib><creatorcontrib>Aokal, Kamilia</creatorcontrib><creatorcontrib>Hamad, Mohammad</creatorcontrib><creatorcontrib>Naji, Rawand</creatorcontrib><title>The Photoelectric Behavior and Antimicrobial Effect of Titanium Dioxide Deposition for Dental Implants</title><title>Key engineering materials</title><description>This work presents a pilot study on the photoelectric effect of anatase titanium dioxide (TiO2) deposited on grade 4 titanium discs on their antimicrobial properties, especially for dental implants applications. The prepared specimens are characterized by X-ray diffraction and Raman spectroscopy to ensure a homogenous coverage of the TiO2 material on the discs. The samples were further tested to outline the photoelectric response of titanium dioxide to ultraviolet radiation in the form of electrical current within the discs. Six discs (three bare Ti, and three coated with TiO2) were seeded with a 5 μl of Escherichia coli culture. One disc of each group was subjected to the same UV light source used for the opto-electrical analysis for 0, 1 or 5 minutes. Bacteria on the discs were then harvested and incubated to examine number of viable cells. The obtained electrical properties confirmed the suitability of the surface-coating to provide simultaneous oxidation-reduction driven reactions under the photoinduced catalytic activity. This activity highlighted the benefits of the added TiO2 layer in reducing the numbers of active E-Coli bacteria in a microbial setup by as much as 21% after 5 minutes of UV exposure. This photoelectrical effect has a profound impact on the development of an in-situ oral disinfectant material deposited on titanium-based dental implants.</description><subject>Anatase</subject><subject>Antiinfectives and antibacterials</subject><subject>Bacteria</subject><subject>Catalytic activity</subject><subject>Dental implants</subject><subject>Dental materials</subject><subject>E coli</subject><subject>Electrical properties</subject><subject>Light sources</subject><subject>Microorganisms</subject><subject>Oxidation</subject><subject>Photoelectric effect</subject><subject>Photoelectricity</subject><subject>Raman spectroscopy</subject><subject>Surgical implants</subject><subject>Titanium</subject><subject>Titanium dioxide</subject><subject>Ultraviolet radiation</subject><issn>1013-9826</issn><issn>1662-9795</issn><issn>1662-9795</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2020</creationdate><recordtype>article</recordtype><sourceid>AFKRA</sourceid><sourceid>BENPR</sourceid><sourceid>CCPQU</sourceid><sourceid>DWQXO</sourceid><recordid>eNqNkMtOAjEUhidGExF9hybG5QztTGfaLoxBQCVidIHrptNLpgSm2BbRt7cEE7euzln8l3O-LLtBsMCwpKP9fl8EaXUfrbGy6HUcPc9eCtrUBSMn2QA1TZkzwurTtENU5YyWzXl2EcIKwgpRVA8ys-w0eOtcdHqtZfRWgnvdiU_rPBC9AuMUvrHSu9aKNZgZk0TAGbC0UfR2twFT676s0mCqty7YaF0PTPJO01XJMN9s16KP4TI7M2Id9NXvHGbvD7Pl5ClfvD7OJ-NFLktISW4YQqptRVNJZWpRSlq1bYNq1VJSyaZUUEtFqBISSYJxjVGNBSawwUQapkg1zK6PuVvvPnY6RL5yO9-nSl5iTBijmJZJdXtUpb9C8Nrwrbcb4b85gvyAlie0_A8tT2h5QssTWs4OLXdHf_SiD1HL7q_mfwk_xSeMIg</recordid><startdate>20200930</startdate><enddate>20200930</enddate><creator>Alami, Abdul Hai</creator><creator>Abu Hawili, Abdullah</creator><creator>Moufti, Mohammad-Adel</creator><creator>Faraj, Mohammed</creator><creator>Aokal, Kamilia</creator><creator>Hamad, Mohammad</creator><creator>Naji, Rawand</creator><general>Trans Tech Publications Ltd</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>8FE</scope><scope>8FG</scope><scope>ABJCF</scope><scope>AFKRA</scope><scope>BENPR</scope><scope>BGLVJ</scope><scope>CCPQU</scope><scope>D1I</scope><scope>DWQXO</scope><scope>F28</scope><scope>FR3</scope><scope>HCIFZ</scope><scope>JG9</scope><scope>KB.</scope><scope>L6V</scope><scope>M7S</scope><scope>PDBOC</scope><scope>PQEST</scope><scope>PQQKQ</scope><scope>PQUKI</scope><scope>PRINS</scope><scope>PTHSS</scope><orcidid>https://orcid.org/0000-0002-7043-8249</orcidid></search><sort><creationdate>20200930</creationdate><title>The Photoelectric Behavior and Antimicrobial Effect of Titanium Dioxide Deposition for Dental Implants</title><author>Alami, Abdul Hai ; Abu Hawili, Abdullah ; Moufti, Mohammad-Adel ; Faraj, Mohammed ; Aokal, Kamilia ; Hamad, Mohammad ; Naji, Rawand</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c2087-f911dbba63cdf5a2c83bb615db873c62d0ecd78dac1c74454154a470647cf9d73</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2020</creationdate><topic>Anatase</topic><topic>Antiinfectives and antibacterials</topic><topic>Bacteria</topic><topic>Catalytic activity</topic><topic>Dental implants</topic><topic>Dental materials</topic><topic>E coli</topic><topic>Electrical properties</topic><topic>Light sources</topic><topic>Microorganisms</topic><topic>Oxidation</topic><topic>Photoelectric effect</topic><topic>Photoelectricity</topic><topic>Raman spectroscopy</topic><topic>Surgical implants</topic><topic>Titanium</topic><topic>Titanium dioxide</topic><topic>Ultraviolet radiation</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Alami, Abdul Hai</creatorcontrib><creatorcontrib>Abu Hawili, Abdullah</creatorcontrib><creatorcontrib>Moufti, Mohammad-Adel</creatorcontrib><creatorcontrib>Faraj, Mohammed</creatorcontrib><creatorcontrib>Aokal, Kamilia</creatorcontrib><creatorcontrib>Hamad, Mohammad</creatorcontrib><creatorcontrib>Naji, Rawand</creatorcontrib><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>ProQuest SciTech Collection</collection><collection>ProQuest Technology Collection</collection><collection>Materials Science & Engineering Collection</collection><collection>ProQuest Central UK/Ireland</collection><collection>ProQuest Central</collection><collection>Technology Collection</collection><collection>ProQuest One Community College</collection><collection>ProQuest Materials Science Collection</collection><collection>ProQuest Central Korea</collection><collection>ANTE: Abstracts in New Technology & Engineering</collection><collection>Engineering Research Database</collection><collection>SciTech Premium Collection</collection><collection>Materials Research Database</collection><collection>Materials Science Database</collection><collection>ProQuest Engineering Collection</collection><collection>Engineering Database</collection><collection>Materials Science Collection</collection><collection>ProQuest One Academic Eastern Edition (DO NOT USE)</collection><collection>ProQuest One Academic</collection><collection>ProQuest One Academic UKI Edition</collection><collection>ProQuest Central China</collection><collection>Engineering Collection</collection><jtitle>Key engineering materials</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Alami, Abdul Hai</au><au>Abu Hawili, Abdullah</au><au>Moufti, Mohammad-Adel</au><au>Faraj, Mohammed</au><au>Aokal, Kamilia</au><au>Hamad, Mohammad</au><au>Naji, Rawand</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>The Photoelectric Behavior and Antimicrobial Effect of Titanium Dioxide Deposition for Dental Implants</atitle><jtitle>Key engineering materials</jtitle><date>2020-09-30</date><risdate>2020</risdate><volume>865</volume><spage>97</spage><epage>103</epage><pages>97-103</pages><issn>1013-9826</issn><issn>1662-9795</issn><eissn>1662-9795</eissn><abstract>This work presents a pilot study on the photoelectric effect of anatase titanium dioxide (TiO2) deposited on grade 4 titanium discs on their antimicrobial properties, especially for dental implants applications. The prepared specimens are characterized by X-ray diffraction and Raman spectroscopy to ensure a homogenous coverage of the TiO2 material on the discs. The samples were further tested to outline the photoelectric response of titanium dioxide to ultraviolet radiation in the form of electrical current within the discs. Six discs (three bare Ti, and three coated with TiO2) were seeded with a 5 μl of Escherichia coli culture. One disc of each group was subjected to the same UV light source used for the opto-electrical analysis for 0, 1 or 5 minutes. Bacteria on the discs were then harvested and incubated to examine number of viable cells. The obtained electrical properties confirmed the suitability of the surface-coating to provide simultaneous oxidation-reduction driven reactions under the photoinduced catalytic activity. This activity highlighted the benefits of the added TiO2 layer in reducing the numbers of active E-Coli bacteria in a microbial setup by as much as 21% after 5 minutes of UV exposure. This photoelectrical effect has a profound impact on the development of an in-situ oral disinfectant material deposited on titanium-based dental implants.</abstract><cop>Zurich</cop><pub>Trans Tech Publications Ltd</pub><doi>10.4028/www.scientific.net/KEM.865.97</doi><tpages>7</tpages><orcidid>https://orcid.org/0000-0002-7043-8249</orcidid></addata></record> |
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subjects | Anatase Antiinfectives and antibacterials Bacteria Catalytic activity Dental implants Dental materials E coli Electrical properties Light sources Microorganisms Oxidation Photoelectric effect Photoelectricity Raman spectroscopy Surgical implants Titanium Titanium dioxide Ultraviolet radiation |
title | The Photoelectric Behavior and Antimicrobial Effect of Titanium Dioxide Deposition for Dental Implants |
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