Annealing-induced abnormal hardening in nanocrystalline NbMoTaW high-entropy alloy thin films
•Nanocrystalline NbMoTaW high-entropy alloy film deposited by magnetron sputtering.•Abnormal hardening effect observed in the NbMoTaW HEA films after annealing at 800 °C.•The oxygen segregation at grain boundaries contributes to the amorphous intergranular films (AIFs) formation. High temperature an...
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| Veröffentlicht in: | Materials letters 2020-09, Vol.275, p.128097, Article 128097 |
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| creator | Feng, Xiaobin Utama Surjadi, James Lu, Yang |
| description | •Nanocrystalline NbMoTaW high-entropy alloy film deposited by magnetron sputtering.•Abnormal hardening effect observed in the NbMoTaW HEA films after annealing at 800 °C.•The oxygen segregation at grain boundaries contributes to the amorphous intergranular films (AIFs) formation.
High temperature annealing of high-entropy alloys (HEA) typically results in reduced hardness due to grain coarsening, limiting its potential for applications at elevated temperatures. However, in this work, our nanocrystalline NbMoTaW HEA thin film exhibits enhanced hardness up to ~ 17.1 GPa after isothermal annealing at 800 °C for ~ 6 h (hrs). This phenomenon can be explained mainly by the formation of amorphous intergranular films (AIFs). This work does not only demonstrate a high-performance HEA film for potential high-temperature applications, but also provides a practical approach to tailor mechanical properties of nanostructured HEAs. |
| doi_str_mv | 10.1016/j.matlet.2020.128097 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_journals_2446723250</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>S0167577X20308028</els_id><sourcerecordid>2446723250</sourcerecordid><originalsourceid>FETCH-LOGICAL-c334t-a4f1a025eb70f6dfe6e16c967643ffe54110466cd49a3c854017a08bd837578a3</originalsourceid><addsrcrecordid>eNp9kE1LxDAQhoMouK7-Aw8Fz12TNk3ai7AsfsGqlxW9SEjTyTalm6xJV-i_N0s9exqYed4Z5kHomuAFwYTddoudHHoYFhnOYisrccVP0IyUPE9pxatTNIsYTwvOP8_RRQgdxphWmM7Q19JakL2x29TY5qCgSWRtnd_JPmmlb8DGUWJsYqV1yo9hkH2kIXmtX9xGfiSt2bYp2MG7_ZjEmRuToY28Nv0uXKIzLfsAV391jt4f7jerp3T99vi8Wq5Tled0SCXVROKsgJpjzRoNDAhTFeOM5lpDQQnBlDHV0ErmqiwoJlzism7KnBe8lPkc3Ux79959HyAMonMHb-NJkVHKeJZnBY4UnSjlXQgetNh7s5N-FASLo0jRiUmkOIoUk8gYu5tiED_4MeBFUAZsVGU8qEE0zvy_4BcQvn6N</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2446723250</pqid></control><display><type>article</type><title>Annealing-induced abnormal hardening in nanocrystalline NbMoTaW high-entropy alloy thin films</title><source>Elsevier ScienceDirect Journals Complete</source><creator>Feng, Xiaobin ; Utama Surjadi, James ; Lu, Yang</creator><creatorcontrib>Feng, Xiaobin ; Utama Surjadi, James ; Lu, Yang</creatorcontrib><description>•Nanocrystalline NbMoTaW high-entropy alloy film deposited by magnetron sputtering.•Abnormal hardening effect observed in the NbMoTaW HEA films after annealing at 800 °C.•The oxygen segregation at grain boundaries contributes to the amorphous intergranular films (AIFs) formation.
High temperature annealing of high-entropy alloys (HEA) typically results in reduced hardness due to grain coarsening, limiting its potential for applications at elevated temperatures. However, in this work, our nanocrystalline NbMoTaW HEA thin film exhibits enhanced hardness up to ~ 17.1 GPa after isothermal annealing at 800 °C for ~ 6 h (hrs). This phenomenon can be explained mainly by the formation of amorphous intergranular films (AIFs). This work does not only demonstrate a high-performance HEA film for potential high-temperature applications, but also provides a practical approach to tailor mechanical properties of nanostructured HEAs.</description><identifier>ISSN: 0167-577X</identifier><identifier>EISSN: 1873-4979</identifier><identifier>DOI: 10.1016/j.matlet.2020.128097</identifier><language>eng</language><publisher>Amsterdam: Elsevier B.V</publisher><subject>Annealing ; Grain boundary ; Hardness ; Heat resistant alloys ; High entropy alloys ; High temperature ; High-entropy alloy (HEA) ; Isothermal annealing ; Materials science ; Mechanical properties ; Nanocrystalline ; Nanocrystals ; Thermal properties ; Thin film ; Thin films</subject><ispartof>Materials letters, 2020-09, Vol.275, p.128097, Article 128097</ispartof><rights>2020 Elsevier B.V.</rights><rights>Copyright Elsevier BV Sep 15, 2020</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c334t-a4f1a025eb70f6dfe6e16c967643ffe54110466cd49a3c854017a08bd837578a3</citedby><cites>FETCH-LOGICAL-c334t-a4f1a025eb70f6dfe6e16c967643ffe54110466cd49a3c854017a08bd837578a3</cites><orcidid>0000-0002-9280-2718</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/j.matlet.2020.128097$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,780,784,3550,27924,27925,45995</link.rule.ids></links><search><creatorcontrib>Feng, Xiaobin</creatorcontrib><creatorcontrib>Utama Surjadi, James</creatorcontrib><creatorcontrib>Lu, Yang</creatorcontrib><title>Annealing-induced abnormal hardening in nanocrystalline NbMoTaW high-entropy alloy thin films</title><title>Materials letters</title><description>•Nanocrystalline NbMoTaW high-entropy alloy film deposited by magnetron sputtering.•Abnormal hardening effect observed in the NbMoTaW HEA films after annealing at 800 °C.•The oxygen segregation at grain boundaries contributes to the amorphous intergranular films (AIFs) formation.
High temperature annealing of high-entropy alloys (HEA) typically results in reduced hardness due to grain coarsening, limiting its potential for applications at elevated temperatures. However, in this work, our nanocrystalline NbMoTaW HEA thin film exhibits enhanced hardness up to ~ 17.1 GPa after isothermal annealing at 800 °C for ~ 6 h (hrs). This phenomenon can be explained mainly by the formation of amorphous intergranular films (AIFs). This work does not only demonstrate a high-performance HEA film for potential high-temperature applications, but also provides a practical approach to tailor mechanical properties of nanostructured HEAs.</description><subject>Annealing</subject><subject>Grain boundary</subject><subject>Hardness</subject><subject>Heat resistant alloys</subject><subject>High entropy alloys</subject><subject>High temperature</subject><subject>High-entropy alloy (HEA)</subject><subject>Isothermal annealing</subject><subject>Materials science</subject><subject>Mechanical properties</subject><subject>Nanocrystalline</subject><subject>Nanocrystals</subject><subject>Thermal properties</subject><subject>Thin film</subject><subject>Thin films</subject><issn>0167-577X</issn><issn>1873-4979</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2020</creationdate><recordtype>article</recordtype><recordid>eNp9kE1LxDAQhoMouK7-Aw8Fz12TNk3ai7AsfsGqlxW9SEjTyTalm6xJV-i_N0s9exqYed4Z5kHomuAFwYTddoudHHoYFhnOYisrccVP0IyUPE9pxatTNIsYTwvOP8_RRQgdxphWmM7Q19JakL2x29TY5qCgSWRtnd_JPmmlb8DGUWJsYqV1yo9hkH2kIXmtX9xGfiSt2bYp2MG7_ZjEmRuToY28Nv0uXKIzLfsAV391jt4f7jerp3T99vi8Wq5Tled0SCXVROKsgJpjzRoNDAhTFeOM5lpDQQnBlDHV0ErmqiwoJlzism7KnBe8lPkc3Ux79959HyAMonMHb-NJkVHKeJZnBY4UnSjlXQgetNh7s5N-FASLo0jRiUmkOIoUk8gYu5tiED_4MeBFUAZsVGU8qEE0zvy_4BcQvn6N</recordid><startdate>20200915</startdate><enddate>20200915</enddate><creator>Feng, Xiaobin</creator><creator>Utama Surjadi, James</creator><creator>Lu, Yang</creator><general>Elsevier B.V</general><general>Elsevier BV</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><orcidid>https://orcid.org/0000-0002-9280-2718</orcidid></search><sort><creationdate>20200915</creationdate><title>Annealing-induced abnormal hardening in nanocrystalline NbMoTaW high-entropy alloy thin films</title><author>Feng, Xiaobin ; Utama Surjadi, James ; Lu, Yang</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c334t-a4f1a025eb70f6dfe6e16c967643ffe54110466cd49a3c854017a08bd837578a3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2020</creationdate><topic>Annealing</topic><topic>Grain boundary</topic><topic>Hardness</topic><topic>Heat resistant alloys</topic><topic>High entropy alloys</topic><topic>High temperature</topic><topic>High-entropy alloy (HEA)</topic><topic>Isothermal annealing</topic><topic>Materials science</topic><topic>Mechanical properties</topic><topic>Nanocrystalline</topic><topic>Nanocrystals</topic><topic>Thermal properties</topic><topic>Thin film</topic><topic>Thin films</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Feng, Xiaobin</creatorcontrib><creatorcontrib>Utama Surjadi, James</creatorcontrib><creatorcontrib>Lu, Yang</creatorcontrib><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Materials letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Feng, Xiaobin</au><au>Utama Surjadi, James</au><au>Lu, Yang</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Annealing-induced abnormal hardening in nanocrystalline NbMoTaW high-entropy alloy thin films</atitle><jtitle>Materials letters</jtitle><date>2020-09-15</date><risdate>2020</risdate><volume>275</volume><spage>128097</spage><pages>128097-</pages><artnum>128097</artnum><issn>0167-577X</issn><eissn>1873-4979</eissn><abstract>•Nanocrystalline NbMoTaW high-entropy alloy film deposited by magnetron sputtering.•Abnormal hardening effect observed in the NbMoTaW HEA films after annealing at 800 °C.•The oxygen segregation at grain boundaries contributes to the amorphous intergranular films (AIFs) formation.
High temperature annealing of high-entropy alloys (HEA) typically results in reduced hardness due to grain coarsening, limiting its potential for applications at elevated temperatures. However, in this work, our nanocrystalline NbMoTaW HEA thin film exhibits enhanced hardness up to ~ 17.1 GPa after isothermal annealing at 800 °C for ~ 6 h (hrs). This phenomenon can be explained mainly by the formation of amorphous intergranular films (AIFs). This work does not only demonstrate a high-performance HEA film for potential high-temperature applications, but also provides a practical approach to tailor mechanical properties of nanostructured HEAs.</abstract><cop>Amsterdam</cop><pub>Elsevier B.V</pub><doi>10.1016/j.matlet.2020.128097</doi><orcidid>https://orcid.org/0000-0002-9280-2718</orcidid></addata></record> |
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| subjects | Annealing Grain boundary Hardness Heat resistant alloys High entropy alloys High temperature High-entropy alloy (HEA) Isothermal annealing Materials science Mechanical properties Nanocrystalline Nanocrystals Thermal properties Thin film Thin films |
| title | Annealing-induced abnormal hardening in nanocrystalline NbMoTaW high-entropy alloy thin films |
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