Chemical and photoelectrochemical instability of amorphous TiO2 layers quantified by spectroscopic ellipsometry

Amorphous TiO2 films deposited by Atomic Layer Deposition (ALD) are recently being employed as corrosion protection coatings for photoanodes and photocathodes. However, these protective films are not immune to degradation. We have applied spectroscopic ellipsometry to quantify the loss of material,...

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Veröffentlicht in:	Journal of materials chemistry. A, Materials for energy and sustainability Materials for energy and sustainability, 2020-01, Vol.8 (35), p.18173-18179
Hauptverfasser:	Kriegel, H, Kollmann, J, Raudsepp, R, Klassen, T, Schieda, M
Format:	Artikel
Sprache:	eng
Schlagworte:	Amorphous materials Atomic layer epitaxy Corrosion Corrosion prevention Current carriers Darkness Degradation Illumination pH effects Photocathodes Photoelectrochemical devices Protective coatings Short circuits Spectroellipsometry Spectroscopy Sulfuric acid Titanium dioxide
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