Silicon substrate orientation influence on structural and magnetic properties of BaFe12O19 thin films obtained by RF magneton sputtering
•The correlation between the Si substrate orientation and structural and magnetic anisotropy were investigated.•In-plane oriented BaM thin films can be obtained using silicon substrates.•The uniform needle-shaped grains with in-plane orientation was enhanced for BaM thin films grown onto Si(1 1 1) s...
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| Veröffentlicht in: | Journal of magnetism and magnetic materials 2020-06, Vol.504, p.166705, Article 166705 |
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| container_start_page | 166705 |
| container_title | Journal of magnetism and magnetic materials |
| container_volume | 504 |
| creator | Pretti Rossi, Vinicius Pereira Bonini, Ricardo Marino Gonçalves, André José Gualdi, Alexandre Antônio Eiras, Jose Luis Zabotto, Fabio |
| description | •The correlation between the Si substrate orientation and structural and magnetic anisotropy were investigated.•In-plane oriented BaM thin films can be obtained using silicon substrates.•The uniform needle-shaped grains with in-plane orientation was enhanced for BaM thin films grown onto Si(1 1 1) substrate.
In this work, the fabrication of BaFe12O19 (BaM) thin films by radio-frequency sputtering and the influence of substrate orientation on structural, microstructure and magnetic properties were carried out. Measurements pointed out the deposition time and power have no significant effect over stoichiometry in the studied condition, producing films with satisfying Fe:Ba rate confirmed by EDX analysis. The orientation of the Si substrate showed to be essentially correlated with in-plane orientation of BaM phase. Both Si (1 0 0) and (1 1 1) substrates privileged in-plane orientation of the c-axis of BaM and atomic force microscopy found needle-like grains spread randomly onto substrates, although Si (1 1 1) substrate exhibited higher magnetic anisotropy. |
| doi_str_mv | 10.1016/j.jmmm.2020.166705 |
| format | Article |
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In this work, the fabrication of BaFe12O19 (BaM) thin films by radio-frequency sputtering and the influence of substrate orientation on structural, microstructure and magnetic properties were carried out. Measurements pointed out the deposition time and power have no significant effect over stoichiometry in the studied condition, producing films with satisfying Fe:Ba rate confirmed by EDX analysis. The orientation of the Si substrate showed to be essentially correlated with in-plane orientation of BaM phase. Both Si (1 0 0) and (1 1 1) substrates privileged in-plane orientation of the c-axis of BaM and atomic force microscopy found needle-like grains spread randomly onto substrates, although Si (1 1 1) substrate exhibited higher magnetic anisotropy.</description><identifier>ISSN: 0304-8853</identifier><identifier>EISSN: 1873-4766</identifier><identifier>DOI: 10.1016/j.jmmm.2020.166705</identifier><language>eng</language><publisher>Amsterdam: Elsevier B.V</publisher><subject>Atomic force microscopy ; Barium hexaferrite ; In-plane orientation ; Magnetic anisotropy ; Magnetic properties ; Magnetoelectric composites ; Orientation ; RF sputtering ; Silicon substrates ; Sputtering ; Stoichiometry ; Thin films</subject><ispartof>Journal of magnetism and magnetic materials, 2020-06, Vol.504, p.166705, Article 166705</ispartof><rights>2020 Elsevier B.V.</rights><rights>Copyright Elsevier BV Jun 15, 2020</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><cites>FETCH-LOGICAL-c323t-8aaefdac85be6d012462843b234fb7d3fa097b6fb17a0cdb3dcc1461dd10b1a63</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://www.sciencedirect.com/science/article/pii/S0304885319342738$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,776,780,3537,27901,27902,65306</link.rule.ids></links><search><creatorcontrib>Pretti Rossi, Vinicius</creatorcontrib><creatorcontrib>Pereira Bonini, Ricardo</creatorcontrib><creatorcontrib>Marino Gonçalves, André</creatorcontrib><creatorcontrib>José Gualdi, Alexandre</creatorcontrib><creatorcontrib>Antônio Eiras, Jose</creatorcontrib><creatorcontrib>Luis Zabotto, Fabio</creatorcontrib><title>Silicon substrate orientation influence on structural and magnetic properties of BaFe12O19 thin films obtained by RF magneton sputtering</title><title>Journal of magnetism and magnetic materials</title><description>•The correlation between the Si substrate orientation and structural and magnetic anisotropy were investigated.•In-plane oriented BaM thin films can be obtained using silicon substrates.•The uniform needle-shaped grains with in-plane orientation was enhanced for BaM thin films grown onto Si(1 1 1) substrate.
In this work, the fabrication of BaFe12O19 (BaM) thin films by radio-frequency sputtering and the influence of substrate orientation on structural, microstructure and magnetic properties were carried out. Measurements pointed out the deposition time and power have no significant effect over stoichiometry in the studied condition, producing films with satisfying Fe:Ba rate confirmed by EDX analysis. The orientation of the Si substrate showed to be essentially correlated with in-plane orientation of BaM phase. Both Si (1 0 0) and (1 1 1) substrates privileged in-plane orientation of the c-axis of BaM and atomic force microscopy found needle-like grains spread randomly onto substrates, although Si (1 1 1) substrate exhibited higher magnetic anisotropy.</description><subject>Atomic force microscopy</subject><subject>Barium hexaferrite</subject><subject>In-plane orientation</subject><subject>Magnetic anisotropy</subject><subject>Magnetic properties</subject><subject>Magnetoelectric composites</subject><subject>Orientation</subject><subject>RF sputtering</subject><subject>Silicon substrates</subject><subject>Sputtering</subject><subject>Stoichiometry</subject><subject>Thin films</subject><issn>0304-8853</issn><issn>1873-4766</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2020</creationdate><recordtype>article</recordtype><recordid>eNp9kM1q3DAUhUVoINNpXiArQdee6m9kD3TThk4bGAikyVro5yqVsWVXkgt5gzx2ZCbrri4czjn38CF0Q8mOEiq_9Lt-HMcdI6wKUrZkf4E2tGt5I1opP6AN4UQ0XbfnV-hjzj0hhIpObtDr7zAEO0WcF5NL0gXwlALEokuoaoh-WCDaqlZLSYstS9ID1tHhUT9HKMHiOU0zpBIg48nj7_oIlN3TAy5_QsQ-DGPVTdEhgsPmBT8c36Nr5byUAinE50_o0ushw_X73aKn44_H21_N6f7n3e23U2M546XptAbvtO32BqQjlAnJOsEN48Kb1nGvyaE10hvaamKd4c5aKiR1jhJDteRb9PncW1f_XSAX1U9LivWlYkJQTg5Cri52dtk05ZzAqzmFUacXRYlaiatercTVSlydidfQ13MI6v5_AZLKNqzwXEhgi3JT-F_8DbLBjNM</recordid><startdate>20200615</startdate><enddate>20200615</enddate><creator>Pretti Rossi, Vinicius</creator><creator>Pereira Bonini, Ricardo</creator><creator>Marino Gonçalves, André</creator><creator>José Gualdi, Alexandre</creator><creator>Antônio Eiras, Jose</creator><creator>Luis Zabotto, Fabio</creator><general>Elsevier B.V</general><general>Elsevier BV</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20200615</creationdate><title>Silicon substrate orientation influence on structural and magnetic properties of BaFe12O19 thin films obtained by RF magneton sputtering</title><author>Pretti Rossi, Vinicius ; Pereira Bonini, Ricardo ; Marino Gonçalves, André ; José Gualdi, Alexandre ; Antônio Eiras, Jose ; Luis Zabotto, Fabio</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c323t-8aaefdac85be6d012462843b234fb7d3fa097b6fb17a0cdb3dcc1461dd10b1a63</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2020</creationdate><topic>Atomic force microscopy</topic><topic>Barium hexaferrite</topic><topic>In-plane orientation</topic><topic>Magnetic anisotropy</topic><topic>Magnetic properties</topic><topic>Magnetoelectric composites</topic><topic>Orientation</topic><topic>RF sputtering</topic><topic>Silicon substrates</topic><topic>Sputtering</topic><topic>Stoichiometry</topic><topic>Thin films</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Pretti Rossi, Vinicius</creatorcontrib><creatorcontrib>Pereira Bonini, Ricardo</creatorcontrib><creatorcontrib>Marino Gonçalves, André</creatorcontrib><creatorcontrib>José Gualdi, Alexandre</creatorcontrib><creatorcontrib>Antônio Eiras, Jose</creatorcontrib><creatorcontrib>Luis Zabotto, Fabio</creatorcontrib><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Journal of magnetism and magnetic materials</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Pretti Rossi, Vinicius</au><au>Pereira Bonini, Ricardo</au><au>Marino Gonçalves, André</au><au>José Gualdi, Alexandre</au><au>Antônio Eiras, Jose</au><au>Luis Zabotto, Fabio</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Silicon substrate orientation influence on structural and magnetic properties of BaFe12O19 thin films obtained by RF magneton sputtering</atitle><jtitle>Journal of magnetism and magnetic materials</jtitle><date>2020-06-15</date><risdate>2020</risdate><volume>504</volume><spage>166705</spage><pages>166705-</pages><artnum>166705</artnum><issn>0304-8853</issn><eissn>1873-4766</eissn><abstract>•The correlation between the Si substrate orientation and structural and magnetic anisotropy were investigated.•In-plane oriented BaM thin films can be obtained using silicon substrates.•The uniform needle-shaped grains with in-plane orientation was enhanced for BaM thin films grown onto Si(1 1 1) substrate.
In this work, the fabrication of BaFe12O19 (BaM) thin films by radio-frequency sputtering and the influence of substrate orientation on structural, microstructure and magnetic properties were carried out. Measurements pointed out the deposition time and power have no significant effect over stoichiometry in the studied condition, producing films with satisfying Fe:Ba rate confirmed by EDX analysis. The orientation of the Si substrate showed to be essentially correlated with in-plane orientation of BaM phase. Both Si (1 0 0) and (1 1 1) substrates privileged in-plane orientation of the c-axis of BaM and atomic force microscopy found needle-like grains spread randomly onto substrates, although Si (1 1 1) substrate exhibited higher magnetic anisotropy.</abstract><cop>Amsterdam</cop><pub>Elsevier B.V</pub><doi>10.1016/j.jmmm.2020.166705</doi><oa>free_for_read</oa></addata></record> |
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| issn | 0304-8853 1873-4766 |
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| subjects | Atomic force microscopy Barium hexaferrite In-plane orientation Magnetic anisotropy Magnetic properties Magnetoelectric composites Orientation RF sputtering Silicon substrates Sputtering Stoichiometry Thin films |
| title | Silicon substrate orientation influence on structural and magnetic properties of BaFe12O19 thin films obtained by RF magneton sputtering |
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