Pulse-reverse electroplating of chromium from Sargent baths: Influence of anodic time on physical and electrochemical properties of electroplated Cr

Herein, chromium film was successfully synthesized by pulse-reverse (PR) electrodeposition using various anodic current time in a Sargent bath which is mainly composed of hexavalent chromium (Cr6+) and sulfuric acid (H2SO4). The correlation between anodic time during electroplating and various physi...

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Veröffentlicht in:International journal of refractory metals & hard materials 2020-06, Vol.89, p.105213, Article 105213
Hauptverfasser: Lim, Dongwook, Ku, Bonil, Seo, Dongjo, Lim, Chaewon, Oh, Euntaek, Shim, Sang Eun, Baeck, Sung-Hyeon
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container_title International journal of refractory metals & hard materials
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creator Lim, Dongwook
Ku, Bonil
Seo, Dongjo
Lim, Chaewon
Oh, Euntaek
Shim, Sang Eun
Baeck, Sung-Hyeon
description Herein, chromium film was successfully synthesized by pulse-reverse (PR) electrodeposition using various anodic current time in a Sargent bath which is mainly composed of hexavalent chromium (Cr6+) and sulfuric acid (H2SO4). The correlation between anodic time during electroplating and various physical properties was investigated. The crack density, hardness, and thickness of electrodeposited chromium was decreased with an increase in anodic time for PR electroplating. The chromium prepared by PR electroplating showed higher corrosion resistance than that prepared by direct current (DC) electroplating owing to low crack density. Consequently, the optimal anodic time for PR electroplating was found to be 0.001 s based on the crack density, hardness, current efficiency, and film thickness. The results obtained suggest that this optimized process is a promising route for electroplating chromium film with low crack density and high corrosion resistance. [Display omitted] •Chromium film was prepared by pulse-reverse (PR) electrodeposition of hexavalent chromium using various anodic current time.•The crack density, hardness, and thickness was decreased with an increase in anodic time for PR electroplating.•The optimal anodic time for PR electroplating was found to be 0.001 s based on physical properties.
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fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_journals_2438990278</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>S0263436820300895</els_id><sourcerecordid>2438990278</sourcerecordid><originalsourceid>FETCH-LOGICAL-c400t-67c8285b358d8fd4db0a6245086ef5e13565d57c1bfcaa8da86be683545ea3033</originalsourceid><addsrcrecordid>eNp9UMtKxDAUDaLg-PgDFwHXHfNoMhkXggy-QFBQ1yFNbm1KH2PSCv6HH2xqFVy5OtzLedx7EDqhZEkJlWf10tehrdolI2xaCUb5DlqwBBlf09UuWhAmeZZzqfbRQYw1IUSuJV2gz8exiZAFeIcQAUMDdgj9tjGD715xX2Jbhb71Y4vLhPjJhFfoBlyYoYrn-K4rmxE6CxPTdL3zFg--TWOHt9VH9NY0ae9-fW0F7fdumzIgDB7ipPyTCg5vwhHaK0066_gHD9HL9dXz5ja7f7i521zeZzYnZMjkyiqmRMGFcqp0uSuIkSwXREkoBVAupHBiZWlRWmOUM0oWIBUXuQDDCeeH6HT2Tee8jRAHXfdj6FKkZjlX6zVhK5VY-cyyoY8xQKm3wbcmfGhK9NS_rvXcv57613P_SXYxyyB98O4h6Gj91JXzIb2rXe__N_gCCyCTYg</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2438990278</pqid></control><display><type>article</type><title>Pulse-reverse electroplating of chromium from Sargent baths: Influence of anodic time on physical and electrochemical properties of electroplated Cr</title><source>Elsevier ScienceDirect Journals Complete</source><creator>Lim, Dongwook ; Ku, Bonil ; Seo, Dongjo ; Lim, Chaewon ; Oh, Euntaek ; Shim, Sang Eun ; Baeck, Sung-Hyeon</creator><creatorcontrib>Lim, Dongwook ; Ku, Bonil ; Seo, Dongjo ; Lim, Chaewon ; Oh, Euntaek ; Shim, Sang Eun ; Baeck, Sung-Hyeon</creatorcontrib><description>Herein, chromium film was successfully synthesized by pulse-reverse (PR) electrodeposition using various anodic current time in a Sargent bath which is mainly composed of hexavalent chromium (Cr6+) and sulfuric acid (H2SO4). The correlation between anodic time during electroplating and various physical properties was investigated. The crack density, hardness, and thickness of electrodeposited chromium was decreased with an increase in anodic time for PR electroplating. The chromium prepared by PR electroplating showed higher corrosion resistance than that prepared by direct current (DC) electroplating owing to low crack density. Consequently, the optimal anodic time for PR electroplating was found to be 0.001 s based on the crack density, hardness, current efficiency, and film thickness. The results obtained suggest that this optimized process is a promising route for electroplating chromium film with low crack density and high corrosion resistance. [Display omitted] •Chromium film was prepared by pulse-reverse (PR) electrodeposition of hexavalent chromium using various anodic current time.•The crack density, hardness, and thickness was decreased with an increase in anodic time for PR electroplating.•The optimal anodic time for PR electroplating was found to be 0.001 s based on physical properties.</description><identifier>ISSN: 0263-4368</identifier><identifier>EISSN: 2213-3917</identifier><identifier>DOI: 10.1016/j.ijrmhm.2020.105213</identifier><language>eng</language><publisher>Shrewsbury: Elsevier Ltd</publisher><subject>Anodic current ; Chromium ; Corrosion resistance ; Current efficiency ; Density ; Direct current ; Electrochemical analysis ; Electroplating ; Film thickness ; Hardness ; Hexavalent chromium ; Physical properties ; Plating baths ; Pulse-reverse ; Sulfuric acid</subject><ispartof>International journal of refractory metals &amp; hard materials, 2020-06, Vol.89, p.105213, Article 105213</ispartof><rights>2020 Elsevier Ltd</rights><rights>Copyright Elsevier BV Jun 2020</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c400t-67c8285b358d8fd4db0a6245086ef5e13565d57c1bfcaa8da86be683545ea3033</citedby><cites>FETCH-LOGICAL-c400t-67c8285b358d8fd4db0a6245086ef5e13565d57c1bfcaa8da86be683545ea3033</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/j.ijrmhm.2020.105213$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,780,784,3550,27924,27925,45995</link.rule.ids></links><search><creatorcontrib>Lim, Dongwook</creatorcontrib><creatorcontrib>Ku, Bonil</creatorcontrib><creatorcontrib>Seo, Dongjo</creatorcontrib><creatorcontrib>Lim, Chaewon</creatorcontrib><creatorcontrib>Oh, Euntaek</creatorcontrib><creatorcontrib>Shim, Sang Eun</creatorcontrib><creatorcontrib>Baeck, Sung-Hyeon</creatorcontrib><title>Pulse-reverse electroplating of chromium from Sargent baths: Influence of anodic time on physical and electrochemical properties of electroplated Cr</title><title>International journal of refractory metals &amp; hard materials</title><description>Herein, chromium film was successfully synthesized by pulse-reverse (PR) electrodeposition using various anodic current time in a Sargent bath which is mainly composed of hexavalent chromium (Cr6+) and sulfuric acid (H2SO4). The correlation between anodic time during electroplating and various physical properties was investigated. The crack density, hardness, and thickness of electrodeposited chromium was decreased with an increase in anodic time for PR electroplating. The chromium prepared by PR electroplating showed higher corrosion resistance than that prepared by direct current (DC) electroplating owing to low crack density. Consequently, the optimal anodic time for PR electroplating was found to be 0.001 s based on the crack density, hardness, current efficiency, and film thickness. The results obtained suggest that this optimized process is a promising route for electroplating chromium film with low crack density and high corrosion resistance. [Display omitted] •Chromium film was prepared by pulse-reverse (PR) electrodeposition of hexavalent chromium using various anodic current time.•The crack density, hardness, and thickness was decreased with an increase in anodic time for PR electroplating.•The optimal anodic time for PR electroplating was found to be 0.001 s based on physical properties.</description><subject>Anodic current</subject><subject>Chromium</subject><subject>Corrosion resistance</subject><subject>Current efficiency</subject><subject>Density</subject><subject>Direct current</subject><subject>Electrochemical analysis</subject><subject>Electroplating</subject><subject>Film thickness</subject><subject>Hardness</subject><subject>Hexavalent chromium</subject><subject>Physical properties</subject><subject>Plating baths</subject><subject>Pulse-reverse</subject><subject>Sulfuric acid</subject><issn>0263-4368</issn><issn>2213-3917</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2020</creationdate><recordtype>article</recordtype><recordid>eNp9UMtKxDAUDaLg-PgDFwHXHfNoMhkXggy-QFBQ1yFNbm1KH2PSCv6HH2xqFVy5OtzLedx7EDqhZEkJlWf10tehrdolI2xaCUb5DlqwBBlf09UuWhAmeZZzqfbRQYw1IUSuJV2gz8exiZAFeIcQAUMDdgj9tjGD715xX2Jbhb71Y4vLhPjJhFfoBlyYoYrn-K4rmxE6CxPTdL3zFg--TWOHt9VH9NY0ae9-fW0F7fdumzIgDB7ipPyTCg5vwhHaK0066_gHD9HL9dXz5ja7f7i521zeZzYnZMjkyiqmRMGFcqp0uSuIkSwXREkoBVAupHBiZWlRWmOUM0oWIBUXuQDDCeeH6HT2Tee8jRAHXfdj6FKkZjlX6zVhK5VY-cyyoY8xQKm3wbcmfGhK9NS_rvXcv57613P_SXYxyyB98O4h6Gj91JXzIb2rXe__N_gCCyCTYg</recordid><startdate>202006</startdate><enddate>202006</enddate><creator>Lim, Dongwook</creator><creator>Ku, Bonil</creator><creator>Seo, Dongjo</creator><creator>Lim, Chaewon</creator><creator>Oh, Euntaek</creator><creator>Shim, Sang Eun</creator><creator>Baeck, Sung-Hyeon</creator><general>Elsevier Ltd</general><general>Elsevier BV</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7QQ</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>202006</creationdate><title>Pulse-reverse electroplating of chromium from Sargent baths: Influence of anodic time on physical and electrochemical properties of electroplated Cr</title><author>Lim, Dongwook ; Ku, Bonil ; Seo, Dongjo ; Lim, Chaewon ; Oh, Euntaek ; Shim, Sang Eun ; Baeck, Sung-Hyeon</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c400t-67c8285b358d8fd4db0a6245086ef5e13565d57c1bfcaa8da86be683545ea3033</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2020</creationdate><topic>Anodic current</topic><topic>Chromium</topic><topic>Corrosion resistance</topic><topic>Current efficiency</topic><topic>Density</topic><topic>Direct current</topic><topic>Electrochemical analysis</topic><topic>Electroplating</topic><topic>Film thickness</topic><topic>Hardness</topic><topic>Hexavalent chromium</topic><topic>Physical properties</topic><topic>Plating baths</topic><topic>Pulse-reverse</topic><topic>Sulfuric acid</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Lim, Dongwook</creatorcontrib><creatorcontrib>Ku, Bonil</creatorcontrib><creatorcontrib>Seo, Dongjo</creatorcontrib><creatorcontrib>Lim, Chaewon</creatorcontrib><creatorcontrib>Oh, Euntaek</creatorcontrib><creatorcontrib>Shim, Sang Eun</creatorcontrib><creatorcontrib>Baeck, Sung-Hyeon</creatorcontrib><collection>CrossRef</collection><collection>Ceramic Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>International journal of refractory metals &amp; hard materials</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Lim, Dongwook</au><au>Ku, Bonil</au><au>Seo, Dongjo</au><au>Lim, Chaewon</au><au>Oh, Euntaek</au><au>Shim, Sang Eun</au><au>Baeck, Sung-Hyeon</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Pulse-reverse electroplating of chromium from Sargent baths: Influence of anodic time on physical and electrochemical properties of electroplated Cr</atitle><jtitle>International journal of refractory metals &amp; hard materials</jtitle><date>2020-06</date><risdate>2020</risdate><volume>89</volume><spage>105213</spage><pages>105213-</pages><artnum>105213</artnum><issn>0263-4368</issn><eissn>2213-3917</eissn><abstract>Herein, chromium film was successfully synthesized by pulse-reverse (PR) electrodeposition using various anodic current time in a Sargent bath which is mainly composed of hexavalent chromium (Cr6+) and sulfuric acid (H2SO4). The correlation between anodic time during electroplating and various physical properties was investigated. The crack density, hardness, and thickness of electrodeposited chromium was decreased with an increase in anodic time for PR electroplating. The chromium prepared by PR electroplating showed higher corrosion resistance than that prepared by direct current (DC) electroplating owing to low crack density. Consequently, the optimal anodic time for PR electroplating was found to be 0.001 s based on the crack density, hardness, current efficiency, and film thickness. The results obtained suggest that this optimized process is a promising route for electroplating chromium film with low crack density and high corrosion resistance. [Display omitted] •Chromium film was prepared by pulse-reverse (PR) electrodeposition of hexavalent chromium using various anodic current time.•The crack density, hardness, and thickness was decreased with an increase in anodic time for PR electroplating.•The optimal anodic time for PR electroplating was found to be 0.001 s based on physical properties.</abstract><cop>Shrewsbury</cop><pub>Elsevier Ltd</pub><doi>10.1016/j.ijrmhm.2020.105213</doi></addata></record>
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subjects Anodic current
Chromium
Corrosion resistance
Current efficiency
Density
Direct current
Electrochemical analysis
Electroplating
Film thickness
Hardness
Hexavalent chromium
Physical properties
Plating baths
Pulse-reverse
Sulfuric acid
title Pulse-reverse electroplating of chromium from Sargent baths: Influence of anodic time on physical and electrochemical properties of electroplated Cr
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-25T10%3A19%3A29IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Pulse-reverse%20electroplating%20of%20chromium%20from%20Sargent%20baths:%20Influence%20of%20anodic%20time%20on%20physical%20and%20electrochemical%20properties%20of%20electroplated%20Cr&rft.jtitle=International%20journal%20of%20refractory%20metals%20&%20hard%20materials&rft.au=Lim,%20Dongwook&rft.date=2020-06&rft.volume=89&rft.spage=105213&rft.pages=105213-&rft.artnum=105213&rft.issn=0263-4368&rft.eissn=2213-3917&rft_id=info:doi/10.1016/j.ijrmhm.2020.105213&rft_dat=%3Cproquest_cross%3E2438990278%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=2438990278&rft_id=info:pmid/&rft_els_id=S0263436820300895&rfr_iscdi=true