Update of Development Progress of the High Power LPP-EUV Light Source Using a Magnetic Field
Gigaphoton Inc. has been developing a CO2-Sn-LPP (LPP: Laser Produced Plasma) extreme ultraviolet (EUV) light source system for high-volume manufacturing (HVM) semiconductor lithography. Key components of the source include a high-power CO2 laser with 15 ns pulse duration and 100 kHz repetition freq...
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| Veröffentlicht in: | Journal of Photopolymer Science and Technology 2020/07/01, Vol.33(1), pp.37-44 |
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| container_title | Journal of Photopolymer Science and Technology |
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| creator | Kouge, Kouichiro Nagai, Shinji Hori, Tsukasa Ueno, Yoshifumi Yanagida, Tatsuya Miyao, Kenichi Hayashi, Hideyuki Watanabe, Yukio Abe, Tamotsu Nakarai, Hiroaki Saito, Takashi Mizoguchi, Hakaru |
| description | Gigaphoton Inc. has been developing a CO2-Sn-LPP (LPP: Laser Produced Plasma) extreme ultraviolet (EUV) light source system for high-volume manufacturing (HVM) semiconductor lithography. Key components of the source include a high-power CO2 laser with 15 ns pulse duration and 100 kHz repetition frequency, a solid-state pre-pulse laser with 10 ps pulse duration, a high speed Sn-droplet generator, a high-speed and high accuracy shooting system, and a magnetic field debris mitigation system. To achieve an in-band power of 330 W with long collector mirror lifetime and stable output, we improved the performance of key system components. We achieved an in-band power of 250 W under DC operation and demonstrated a power scalability up to 330 W. This paper presents the key technology update of our EUV light source. |
| doi_str_mv | 10.2494/photopolymer.33.37 |
| format | Article |
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Key components of the source include a high-power CO2 laser with 15 ns pulse duration and 100 kHz repetition frequency, a solid-state pre-pulse laser with 10 ps pulse duration, a high speed Sn-droplet generator, a high-speed and high accuracy shooting system, and a magnetic field debris mitigation system. To achieve an in-band power of 330 W with long collector mirror lifetime and stable output, we improved the performance of key system components. We achieved an in-band power of 250 W under DC operation and demonstrated a power scalability up to 330 W. This paper presents the key technology update of our EUV light source.</description><identifier>ISSN: 0914-9244</identifier><identifier>EISSN: 1349-6336</identifier><identifier>DOI: 10.2494/photopolymer.33.37</identifier><language>eng</language><publisher>Hiratsuka: The Society of Photopolymer Science and Technology(SPST)</publisher><subject>Carbon dioxide ; Carbon dioxide lasers ; Debris mitigation ; EUV light source ; EUV lithography ; Laser produced plasma ; Lasers ; Light sources ; Magnetic fields ; Pulse duration ; Upgrading</subject><ispartof>Journal of Photopolymer Science and Technology, 2020/07/01, Vol.33(1), pp.37-44</ispartof><rights>2020 The Society of Photopolymer Science and Technology (SPST)</rights><rights>Copyright Japan Science and Technology Agency 2020</rights><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c531t-e8dcd3bf7341628190e059bd733a1e75df908c86715fe0f75e83f1c8e6ecec323</citedby><cites>FETCH-LOGICAL-c531t-e8dcd3bf7341628190e059bd733a1e75df908c86715fe0f75e83f1c8e6ecec323</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,1883,27924,27925</link.rule.ids></links><search><creatorcontrib>Kouge, Kouichiro</creatorcontrib><creatorcontrib>Nagai, Shinji</creatorcontrib><creatorcontrib>Hori, Tsukasa</creatorcontrib><creatorcontrib>Ueno, Yoshifumi</creatorcontrib><creatorcontrib>Yanagida, Tatsuya</creatorcontrib><creatorcontrib>Miyao, Kenichi</creatorcontrib><creatorcontrib>Hayashi, Hideyuki</creatorcontrib><creatorcontrib>Watanabe, Yukio</creatorcontrib><creatorcontrib>Abe, Tamotsu</creatorcontrib><creatorcontrib>Nakarai, Hiroaki</creatorcontrib><creatorcontrib>Saito, Takashi</creatorcontrib><creatorcontrib>Mizoguchi, Hakaru</creatorcontrib><title>Update of Development Progress of the High Power LPP-EUV Light Source Using a Magnetic Field</title><title>Journal of Photopolymer Science and Technology</title><addtitle>J. Photopol. Sci. Technol.</addtitle><description>Gigaphoton Inc. has been developing a CO2-Sn-LPP (LPP: Laser Produced Plasma) extreme ultraviolet (EUV) light source system for high-volume manufacturing (HVM) semiconductor lithography. Key components of the source include a high-power CO2 laser with 15 ns pulse duration and 100 kHz repetition frequency, a solid-state pre-pulse laser with 10 ps pulse duration, a high speed Sn-droplet generator, a high-speed and high accuracy shooting system, and a magnetic field debris mitigation system. To achieve an in-band power of 330 W with long collector mirror lifetime and stable output, we improved the performance of key system components. We achieved an in-band power of 250 W under DC operation and demonstrated a power scalability up to 330 W. 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Photopol. Sci. Technol.</addtitle><date>2020-07-01</date><risdate>2020</risdate><volume>33</volume><issue>1</issue><spage>37</spage><epage>44</epage><pages>37-44</pages><issn>0914-9244</issn><eissn>1349-6336</eissn><abstract>Gigaphoton Inc. has been developing a CO2-Sn-LPP (LPP: Laser Produced Plasma) extreme ultraviolet (EUV) light source system for high-volume manufacturing (HVM) semiconductor lithography. Key components of the source include a high-power CO2 laser with 15 ns pulse duration and 100 kHz repetition frequency, a solid-state pre-pulse laser with 10 ps pulse duration, a high speed Sn-droplet generator, a high-speed and high accuracy shooting system, and a magnetic field debris mitigation system. To achieve an in-band power of 330 W with long collector mirror lifetime and stable output, we improved the performance of key system components. We achieved an in-band power of 250 W under DC operation and demonstrated a power scalability up to 330 W. 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| language | eng |
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| source | J-STAGE Free; EZB-FREE-00999 freely available EZB journals; Free Full-Text Journals in Chemistry |
| subjects | Carbon dioxide Carbon dioxide lasers Debris mitigation EUV light source EUV lithography Laser produced plasma Lasers Light sources Magnetic fields Pulse duration Upgrading |
| title | Update of Development Progress of the High Power LPP-EUV Light Source Using a Magnetic Field |
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