NOTE FROM GUEST EDITORS

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Chemical product and process modeling 2020-03, Vol.15 (2)
Hauptverfasser: A, Venu Vinod, Seepana, Murali Mohan
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue 2
container_start_page
container_title Chemical product and process modeling
container_volume 15
creator A, Venu Vinod
Seepana, Murali Mohan
description
doi_str_mv 10.1515/cppm-2019-0131
format Article
fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_journals_2418879870</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>2418879870</sourcerecordid><originalsourceid>FETCH-LOGICAL-c202t-5d68b9bfce85d7a347a249d23db8726cb12cf39d7bd630f11d3204d77511a233</originalsourceid><addsrcrecordid>eNptj8FLwzAUxoMoWKdXvRY8Z-a9JE1zlNnNwbSw1XNom1Qcm61pi-y_t6WCF0_vO3y_7_Ej5BbYHCTIh7JpjhQZaMqAwxkJQHNBMZL6nAQIWtAIpL4kV227Z0xiJHRA7l7TLAmX2_QlXL0luyxMntZZut1dk4sqP7Tu5vfOSLZMssUz3aSr9eJxQ0tk2FFpo7jQRVW6WFqVc6FyFNoit0WsMCoLwLLi2qrCRpxVAJYjE1YpCZAj5zNyP802vv7qXduZfd37z-GjQQFxrHSs2NCaT63S123rXWUa_3HM_ckAM6O7Gd3N6G5G9wHQE_CdHzrnrXv3_WkIf-v_gyCR_wBQK1uH</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2418879870</pqid></control><display><type>article</type><title>NOTE FROM GUEST EDITORS</title><source>De Gruyter journals</source><creator>A, Venu Vinod ; Seepana, Murali Mohan</creator><creatorcontrib>A, Venu Vinod ; Seepana, Murali Mohan</creatorcontrib><identifier>ISSN: 2194-6159</identifier><identifier>EISSN: 1934-2659</identifier><identifier>DOI: 10.1515/cppm-2019-0131</identifier><language>eng</language><publisher>Berlin: De Gruyter</publisher><ispartof>Chemical product and process modeling, 2020-03, Vol.15 (2)</ispartof><rights>2020 Walter de Gruyter GmbH, Berlin/Boston</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://www.degruyter.com/document/doi/10.1515/cppm-2019-0131/pdf$$EPDF$$P50$$Gwalterdegruyter$$H</linktopdf><linktohtml>$$Uhttps://www.degruyter.com/document/doi/10.1515/cppm-2019-0131/html$$EHTML$$P50$$Gwalterdegruyter$$H</linktohtml><link.rule.ids>314,778,782,27907,27908,66505,68289</link.rule.ids></links><search><creatorcontrib>A, Venu Vinod</creatorcontrib><creatorcontrib>Seepana, Murali Mohan</creatorcontrib><title>NOTE FROM GUEST EDITORS</title><title>Chemical product and process modeling</title><issn>2194-6159</issn><issn>1934-2659</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2020</creationdate><recordtype>article</recordtype><recordid>eNptj8FLwzAUxoMoWKdXvRY8Z-a9JE1zlNnNwbSw1XNom1Qcm61pi-y_t6WCF0_vO3y_7_Ej5BbYHCTIh7JpjhQZaMqAwxkJQHNBMZL6nAQIWtAIpL4kV227Z0xiJHRA7l7TLAmX2_QlXL0luyxMntZZut1dk4sqP7Tu5vfOSLZMssUz3aSr9eJxQ0tk2FFpo7jQRVW6WFqVc6FyFNoit0WsMCoLwLLi2qrCRpxVAJYjE1YpCZAj5zNyP802vv7qXduZfd37z-GjQQFxrHSs2NCaT63S123rXWUa_3HM_ckAM6O7Gd3N6G5G9wHQE_CdHzrnrXv3_WkIf-v_gyCR_wBQK1uH</recordid><startdate>20200319</startdate><enddate>20200319</enddate><creator>A, Venu Vinod</creator><creator>Seepana, Murali Mohan</creator><general>De Gruyter</general><general>Walter de Gruyter GmbH</general><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20200319</creationdate><title>NOTE FROM GUEST EDITORS</title><author>A, Venu Vinod ; Seepana, Murali Mohan</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c202t-5d68b9bfce85d7a347a249d23db8726cb12cf39d7bd630f11d3204d77511a233</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2020</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>A, Venu Vinod</creatorcontrib><creatorcontrib>Seepana, Murali Mohan</creatorcontrib><collection>CrossRef</collection><jtitle>Chemical product and process modeling</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>A, Venu Vinod</au><au>Seepana, Murali Mohan</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>NOTE FROM GUEST EDITORS</atitle><jtitle>Chemical product and process modeling</jtitle><date>2020-03-19</date><risdate>2020</risdate><volume>15</volume><issue>2</issue><issn>2194-6159</issn><eissn>1934-2659</eissn><cop>Berlin</cop><pub>De Gruyter</pub><doi>10.1515/cppm-2019-0131</doi><tpages>1</tpages></addata></record>
fulltext fulltext
identifier ISSN: 2194-6159
ispartof Chemical product and process modeling, 2020-03, Vol.15 (2)
issn 2194-6159
1934-2659
language eng
recordid cdi_proquest_journals_2418879870
source De Gruyter journals
title NOTE FROM GUEST EDITORS
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-16T14%3A52%3A56IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=NOTE%20FROM%20GUEST%20EDITORS&rft.jtitle=Chemical%20product%20and%20process%20modeling&rft.au=A,%20Venu%20Vinod&rft.date=2020-03-19&rft.volume=15&rft.issue=2&rft.issn=2194-6159&rft.eissn=1934-2659&rft_id=info:doi/10.1515/cppm-2019-0131&rft_dat=%3Cproquest_cross%3E2418879870%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=2418879870&rft_id=info:pmid/&rfr_iscdi=true