Metal-ion subplantation: A game changer for controlling nanostructure and phase formation during film growth by physical vapor deposition
Up until recently, thin film growth by magnetron sputtering relied on enhancing adatom mobility in the surface region by gas-ion irradiation to obtain dense layers at low deposition temperatures. However, an inherently low degree of ionization in the sputtered material flux during direct-current mag...
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Veröffentlicht in: | Journal of applied physics 2020-05, Vol.127 (18) |
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Hauptverfasser: | , , , |
Format: | Artikel |
Sprache: | eng |
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Online-Zugang: | Volltext |
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