Ferroelectric and dielectric properties of Ca2+-doped and Ca2+–Ti4+ co-doped K0.5Na0.5NbO3 thin films

Chemical solution deposition (CSD) of K0.5Na0.5NbO3 (KNN) thin films on silicon-based substrates is an interesting technology for fabrication of lead-free ferroelectric thin films. Here, we report on improved ferroelectric and dielectric properties of KNN thin films prepared by CSD through Ca2+-dopi...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Journal of materials chemistry. C, Materials for optical and electronic devices Materials for optical and electronic devices, 2020-01, Vol.8 (15), p.5102-5111
Hauptverfasser:	Nikolai Helth Gaukås, Glaum, Julia, Mari-Ann Einarsrud, Grande, Tor
Format:	Artikel
Sprache:	eng
Schlagworte:	Calcium ions Dielectric properties Doped films Doping Ferroelectric materials Ferroelectricity Grain size Lead free Leakage current Silicon Silicon substrates Solid solutions Thin films
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!